Inventor · disambiguated record
Daimian Wang
Also filed as: WANG DAIMIAN
12 granted patents·1 pending application·31 citations·filing 2012–2021
86Inventor score
Top patents by PatentIndex Score
13 records- 0191US8916831B2EUV actinic reticle inspection system using imaging sensor with thin film spectral purity filter coatingWANG DAIMIAN·Filed 2012·Granted Dec 23, 2014·15 cites·25 claims
- 0286US12353211B1System for movement outside of sensor field of view by an autonomous mobile deviceAMAZON TECH INC·Filed 2021·Granted Jul 8, 2025·2 cites·20 claims
- 0385US10782616B2Automatic selection of metrology target measurement recipesASML NETHERLANDS BV·Filed 2017·Granted Sep 22, 2020·4 cites·20 claims
- 0483US11989026B1Speed control system for an autonomous mobile deviceAMAZON TECH INC·Filed 2021·Granted May 21, 2024·1 cites·20 claims
- 0579US10691029B2Substrate measurement recipe configuration to improve device matchingASML NETHERLANDS BV·Filed 2017·Granted Jun 23, 2020·2 cites·20 claims
- 0673US9453801B2Photoemission monitoring of EUV mirror and mask surface contamination in actinic EUV systemsKLA TENCOR CORP·Filed 2013·Granted Sep 27, 2016·1 cites·18 claims
- 0773US9348214B2Spectral purity filter and light monitor for an EUV reticle inspection systemKLA TENCOR CORP·Filed 2014·Granted May 24, 2016·2 cites·13 claims
- 0869US9151881B2Phase grating for mask inspection systemKLA TENCOR CORP·Filed 2013·Granted Oct 6, 2015·1 cites·37 claims
- 0964US9625810B2Source multiplexing illumination for mask inspectionWANG DAIMIAN·Filed 2012·Granted Apr 18, 2017·1 cites·17 claims
- 1058US8917432B2Multiplexing EUV sources in reticle inspectionWACK DANIEL·Filed 2012·Granted Dec 23, 2014·2 cites·19 claims
- 1151US9151718B2Illumination system with time multiplexed sources for reticle inspectionKLA TENCOR CORP·Filed 2013·Granted Oct 6, 2015·0 cites·32 claims
- 1247US11960288B1System for path planning in areas outside of sensor field of view by an autonomous mobile deviceAMAZON TECH INC·Filed 2021·Granted Apr 16, 2024·0 cites·20 claims
- 1344US2014151580A1Methods of using polished silicon wafer strips for euv homogenizerKLA TENCOR CORP·Filed 2013·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →