Inventor · disambiguated record
Alexei Marakhtanov
Also filed as: MARAKHTANOV ALEXEI · MARAKHTANOV ALEXEI M
100 granted patents·37 pending applications·1,314 citations·filing 2004–2025
99Inventor score
Top patents by PatentIndex Score
137 records- 0199US7758764B2Methods and apparatus for substrate processingLAM RES CORP·Filed 2007·Granted Jul 20, 2010·76 cites·28 claims
- 0298US10115568B2Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ringLAM RES CORP·Filed 2017·Granted Oct 30, 2018·57 cites·26 claims
- 0398US10026592B2Systems and methods for tailoring ion energy distribution function by odd harmonic mixingLAM RES CORP·Filed 2016·Granted Jul 17, 2018·37 cites·20 claims
- 0498US9852889B1Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ringLAM RES CORP·Filed 2016·Granted Dec 26, 2017·135 cites·21 claims
- 0598US9536749B2Ion energy control by RF pulse shapeLAM RES CORP·Filed 2014·Granted Jan 3, 2017·69 cites·21 claims
- 0698US8652298B2Triode reactor design with multiple radiofrequency powersDHINDSA RAJINDER·Filed 2011·Granted Feb 18, 2014·160 cites·20 claims
- 0797US11935726B2High speed synchronization of plasma source/bias power deliveryMKS INSTR INC·Filed 2021·Granted Mar 19, 2024·6 cites·31 claims
- 0897US11594400B2Multi zone gas injection upper electrode systemLAM RES CORP·Filed 2020·Granted Feb 28, 2023·6 cites·11 claims
- 0997US10504744B1Three or more states for achieving high aspect ratio dielectric etchLAM RES CORP·Filed 2018·Granted Dec 10, 2019·25 cites·12 claims
- 1097US9761414B2Uniformity control circuit for use within an impedance matching circuitLAM RES CORP·Filed 2015·Granted Sep 12, 2017·38 cites·23 claims
- 1197US9595424B2Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processesLAM RES CORP·Filed 2015·Granted Mar 14, 2017·50 cites·21 claims
- 1297US8211324B2Methods and arrangements for controlling plasma processing parametersDHINDSA RAJINDER·Filed 2010·Granted Jul 3, 2012·29 cites·22 claims
- 1397US6972524B1Plasma processing system controlLAM RES CORP·Filed 2004·Granted Dec 6, 2005·87 cites·41 claims
- 1496US12387909B2Low frequency RF generator and associated electrostatic chuckLAM RES CORP·Filed 2021·Granted Aug 12, 2025·3 cites·20 claims
- 1596US11908660B2Systems and methods for optimizing power delivery to an electrode of a plasma chamberLAM RES CORP·Filed 2022·Granted Feb 20, 2024·2 cites·20 claims
- 1696US10283330B2Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generatorsLAM RES CORP·Filed 2017·Granted May 7, 2019·14 cites·19 claims
- 1796US8563619B2Methods and arrangements for plasma processing system with tunable capacitanceDHINDSA RAJINDER·Filed 2007·Granted Oct 22, 2013·29 cites·20 claims
- 1896US8485128B2Movable ground ring for a plasma processing chamberKELLOGG MICHAEL C·Filed 2010·Granted Jul 16, 2013·38 cites·20 claims
- 1995US12165844B2Uniformity control circuit for impedance matchLAM RES CORP·Filed 2021·Granted Dec 10, 2024·3 cites·20 claims
- 2095US11651991B2Electrostatic Chuck design for cooling-gas light-up preventionLAM RES CORP·Filed 2021·Granted May 16, 2023·2 cites·15 claims
- 2195US10615003B2Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ringLAM RES CORP·Filed 2018·Granted Apr 7, 2020·9 cites·20 claims
- 2295US9984859B2Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processesLAM RES CORP·Filed 2017·Granted May 29, 2018·15 cites·18 claims
- 2395US9793126B2Ion to neutral control for wafer processing with dual plasma source reactorLAM RES CORP·Filed 2013·Granted Oct 17, 2017·18 cites·20 claims
- 2495US9620334B2Control of etch rate using modeling, feedback and impedance matchLAM RES CORP·Filed 2014·Granted Apr 11, 2017·20 cites·23 claims
- 2594US11158488B2High speed synchronization of plasma source/bias power deliveryMKS INSTR INC·Filed 2019·Granted Oct 26, 2021·13 cites·36 claims
- 2694US9401264B2Control of impedance of RF delivery pathLAM RES CORP·Filed 2013·Granted Jul 26, 2016·22 cites·28 claims
- 2794US9337000B2Control of impedance of RF return pathLAM RES CORP·Filed 2013·Granted May 10, 2016·32 cites·30 claims
- 2893US11195706B2Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generatorsLAM RES CORP·Filed 2019·Granted Dec 7, 2021·7 cites·21 claims
- 2993US10340122B2Systems and methods for tailoring ion energy distribution function by odd harmonic mixingLAM RES CORP·Filed 2018·Granted Jul 2, 2019·7 cites·15 claims
- 3093US10249476B2Control of impedance of RF return pathLAM RES CORP·Filed 2016·Granted Apr 2, 2019·12 cites·20 claims
- 3193US8898889B2Chuck assembly for plasma processingNAM SANG KI·Filed 2012·Granted Dec 2, 2014·16 cites·16 claims
- 3293US7994794B2Methods for measuring a set of electrical characteristics in a plasmaLAM RES CORP·Filed 2010·Granted Aug 9, 2011·15 cites·34 claims
- 3392US11335539B2Systems and methods for optimizing power delivery to an electrode of a plasma chamberLAM RES CORP·Filed 2018·Granted May 17, 2022·6 cites·29 claims
- 3492US10002746B1Multi regime plasma wafer processing to increase directionality of ionsLAM RES CORP·Filed 2017·Granted Jun 19, 2018·8 cites·26 claims
- 3592US8826855B2C-shaped confinement ring for a plasma processing chamberKELLOGG MICHAEL C·Filed 2010·Granted Sep 9, 2014·16 cites·15 claims
- 3692US7578301B2Methods and apparatus for determining the endpoint of a cleaning or conditioning process in a plasma processing systemLAM RES CORP·Filed 2005·Granted Aug 25, 2009·14 cites·4 claims
- 3792US7479207B2Adjustable height PIF probeLAM RES CORP·Filed 2006·Granted Jan 20, 2009·17 cites·20 claims
- 3891US11670486B2Pulsed plasma chamber in dual chamber configurationLAM RES CORP·Filed 2020·Granted Jun 6, 2023·2 cites·11 claims
- 3991US10825656B2Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ringLAM RES CORP·Filed 2020·Granted Nov 3, 2020·2 cites·20 claims
- 4090US10381201B2Control of etch rate using modeling, feedback and impedance matchLAM RES CORP·Filed 2017·Granted Aug 13, 2019·5 cites·18 claims
- 4190US10304662B2Multi regime plasma wafer processing to increase directionality of ionsLAM RES CORP·Filed 2018·Granted May 28, 2019·5 cites·26 claims
- 4289US10861708B2Three or more states for achieving high aspect ratio dielectric etchLAM RES CORP·Filed 2019·Granted Dec 8, 2020·4 cites·20 claims
- 4389US10157730B2Control of impedance of RF delivery pathLAM RES CORP·Filed 2016·Granted Dec 18, 2018·6 cites·19 claims
- 4489US9536711B2Method and apparatus for DC voltage control on RF-powered electrodeDHINDSA RAJINDER·Filed 2008·Granted Jan 3, 2017·14 cites·20 claims
- 4589US7837827B2Edge ring arrangements for substrate processingLAM RES CORP·Filed 2007·Granted Nov 23, 2010·12 cites·20 claims
- 4687US12308211B2Systems and methods for use of low frequency harmonics in bias radiofrequency supply to control uniformity of plasma process results across substrateLAM RES CORP·Filed 2021·Granted May 20, 2025·1 cites·28 claims
- 4787US12131886B2Systems and methods for extracting process control information from radiofrequency supply system of plasma processing systemLAM RES CORP·Filed 2021·Granted Oct 29, 2024·1 cites·17 claims
- 4887US8216418B2Electrode assembly and plasma processing chamber utilizing thermally conductive gasket and o-ringsPATRICK ROGER·Filed 2008·Granted Jul 10, 2012·13 cites·14 claims
- 4987US7837826B2Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereofLAM RES CORP·Filed 2006·Granted Nov 23, 2010·22 cites·28 claims
- 5087US7319316B2Apparatus for measuring a set of electrical characteristics in a plasmaLAM RES CORP·Filed 2005·Granted Jan 15, 2008·8 cites·22 claims
Showing the top 50 of 137 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →