Inventor · disambiguated record
Vijayakumar C. Venugopal
Also filed as: VENUGOPAL VIJAYAKUMAR · VENUGOPAL VIJAYAKUMAR C
23 granted patents·1 pending application·198 citations·filing 2002–2019
95Inventor score
Top patents by PatentIndex Score
24 records- 0195US8271121B2Methods and arrangements for in-situ process monitoring and control for plasma processing toolsVENUGOPAL VIJAYAKUMAR C·Filed 2010·Granted Sep 18, 2012·36 cites·20 claims
- 0293US8358416B2Methods and apparatus for normalizing optical emission spectraLAM RES CORP·Filed 2012·Granted Jan 22, 2013·11 cites·19 claims
- 0388US6979578B2Process endpoint detection method using broadband reflectometryLAM RES CORP·Filed 2003·Granted Dec 27, 2005·35 cites·19 claims
- 0487US7531369B2Process endpoint detection method using broadband reflectometryLAM RES CORP·Filed 2005·Granted May 12, 2009·11 cites·17 claims
- 0586US10460960B2Gas panel apparatus and method for reducing exhaust requirementsAPPLIED MATERIALS INC·Filed 2016·Granted Oct 29, 2019·6 cites·10 claims
- 0686US8144328B2Methods and apparatus for normalizing optical emission spectraVENUGOPAL VIJAYAKUMAR C·Filed 2009·Granted Mar 27, 2012·15 cites·19 claims
- 0783US8473089B2Methods and apparatus for predictive preventive maintenance of processing chambersALBAREDE LUC·Filed 2010·Granted Jun 25, 2013·8 cites·18 claims
- 0882US10607815B2Methods and apparatuses for plasma chamber matching and fault identificationAPPLIED MATERIALS INC·Filed 2018·Granted Mar 31, 2020·3 cites·20 claims
- 0978US8989888B2Automatic fault detection and classification in a plasma processing system and methods thereofYUN GUNSU·Filed 2010·Granted Mar 24, 2015·7 cites·25 claims
- 1076US7019844B2Method for in-situ monitoring of patterned substrate processing using reflectometry.LAM RES CORP·Filed 2002·Granted Mar 28, 2006·21 cites·22 claims
- 1175US6939811B2Apparatus and method for controlling etch depthLAM RES CORP·Filed 2002·Granted Sep 6, 2005·17 cites·16 claims
- 1271US8538572B2Methods for constructing an optimal endpoint algorithmWANG JIANGXIN·Filed 2010·Granted Sep 17, 2013·4 cites·15 claims
- 1369US10942507B2Eco-efficiency characterization toolAPPLIED MATERIALS INC·Filed 2019·Granted Mar 9, 2021·1 cites·20 claims
- 1466US7399711B2Method for controlling a recess etch processLAM RES CORP·Filed 2002·Granted Jul 15, 2008·13 cites·21 claims
- 1565US8650002B2Determining plasma processing system readiness without generating plasmaCHOI BRIAN·Filed 2009·Granted Feb 11, 2014·3 cites·17 claims
- 1665US8618807B2Arrangement for identifying uncontrolled events at the process module level and methods thereofALBAREDE LUC·Filed 2010·Granted Dec 31, 2013·2 cites·10 claims
- 1761US8295966B2Methods and apparatus to predict etch rate uniformity for qualification of a plasma chamberCHOI BRIAN D·Filed 2010·Granted Oct 23, 2012·2 cites·19 claims
- 1860US10553397B2Processing chamber hardware fault detection using spectral radio frequency analysisAPPLIED MATERIALS INC·Filed 2019·Granted Feb 4, 2020·0 cites·20 claims
- 1956US8983631B2Arrangement for identifying uncontrolled events at the process module level and methods thereofHUANG CHUNG HO·Filed 2009·Granted Mar 17, 2015·2 cites·20 claims
- 2056US7907260B2Collimator arrangements including multiple collimators and implementation methods thereofLAM RES CORP·Filed 2007·Granted Mar 15, 2011·1 cites·35 claims
- 2153US9589769B2Apparatus and method for efficient materials use during substrate processingVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2014·Granted Mar 7, 2017·0 cites·13 claims
- 2252US10283320B2Processing chamber hardware fault detection using spectral radio frequency analysisAPPLIED MATERIALS INC·Filed 2016·Granted May 7, 2019·0 cites·20 claims
- 2350US10185313B2Eco-efficiency characterization toolAPPLIED MATERIALS INC·Filed 2016·Granted Jan 22, 2019·0 cites·19 claims
- 2445US2010332010A1Seasoning plasma processing systemsCHOI BRIAN·Filed 2009·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →