Inventor · disambiguated record
Bearrach Moest
Also filed as: MOEST BEARRACH
28 granted patents·7 pending applications·149 citations·filing 2004–2022
95Inventor score
Files withASML NETHERLANDS BV24VAN DE KERKHOF MARCUS ADRIANUS3NIHTIANOV STOYAN2STAALS FRANK2MOEST BEARRACH1
Top patents by PatentIndex Score
35 records- 0194US7586108B2Radiation detector, method of manufacturing a radiation detector and lithographic apparatus comprising a radiation detectorASML NETHERLANDS BV·Filed 2007·Granted Sep 8, 2009·56 cites·19 claims
- 0291US8138485B2Radiation detector, method of manufacturing a radiation detector, and lithographic apparatus comprising a radiation detectorNIHTIANOV STOYAN·Filed 2008·Granted Mar 20, 2012·35 cites·29 claims
- 0390US7675605B2Device and method for transmission image sensingASML NETHERLANDS BV·Filed 2008·Granted Mar 9, 2010·9 cites·12 claims
- 0489US7282701B2Sensor for use in a lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted Oct 16, 2007·12 cites·3 claims
- 0587US7525638B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Apr 28, 2009·9 cites·11 claims
- 0686US7453078B2Sensor for use in a lithographic apparatusASML NETHERLANDS BV·Filed 2007·Granted Nov 18, 2008·8 cites·3 claims
- 0781US8426831B2Radiation detector, method of manufacturing a radiation detector, and lithographic apparatus comprising a radiation detectorNIHTIANOV STOYAN·Filed 2012·Granted Apr 23, 2013·6 cites·26 claims
- 0881US7655367B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Feb 2, 2010·5 cites·14 claims
- 0976US7583359B2Reduction of fit error due to non-uniform sample distributionASML NETHERLANDS BV·Filed 2006·Granted Sep 1, 2009·4 cites·27 claims
- 1072US11599027B2Lithographic process and apparatus and inspection process and apparatusASML NETHERLANDS BV·Filed 2021·Granted Mar 7, 2023·0 cites·20 claims
- 1172US8773637B2Lithographic apparatus and device manufacturing method of applying a pattern to a substrate using sensor and alignment markVAN DE KERKHOF MARCUS ADRIANUS·Filed 2010·Granted Jul 8, 2014·2 cites·16 claims
- 1264US10705438B2Lithographic methodASML NETHERLANDS BV·Filed 2019·Granted Jul 7, 2020·0 cites·20 claims
- 1364US8975599B2Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatusSTAALS FRANK·Filed 2007·Granted Mar 10, 2015·1 cites·29 claims
- 1458US11199782B2Lithographic process and apparatus and inspection process and apparatusASML NETHERLANDS BV·Filed 2017·Granted Dec 14, 2021·0 cites·20 claims
- 1558US8436984B2Lithographic apparatus and method of irradiating at least two target portionsVAN WEERT CORNELIS LAMBERTUS MARIA·Filed 2009·Granted May 7, 2013·2 cites·20 claims
- 1658US2010091260A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2009·Application pending·0 cites
- 1756US10571814B2Lithographic methodASML NETHERLANDS BV·Filed 2017·Granted Feb 25, 2020·0 cites·11 claims
- 1854US9658541B2Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrateASML NETHERLANDS BV·Filed 2014·Granted May 23, 2017·0 cites·18 claims
- 1954US9329500B2Lithographic apparatus configured to reconstruct an aerial pattern and to compare the reconstructed aerial pattern with an aerial pattern detected by an image sensorSTAALS FRANK·Filed 2008·Granted May 3, 2016·0 cites·11 claims
- 2054US2009002656A1Device and method for transmission image detection, lithographic apparatus and mask for use in a lithographic apparatusASML NETHERLANDS BV·Filed 2007·Application pending·0 cites
- 2153US12443115B2Measurement system and method for characterizing a patterning deviceASML NETHERLANDS BV·Filed 2020·Granted Oct 14, 2025·0 cites·15 claims
- 2253US2023251583A1System and method for conditioning optical apparatusesASML NETHERLANDS BV·Filed 2021·Application pending·0 cites
- 2352US8896817B2Lithographic projection apparatus, device manufacturing methods and mask with sensor and diffuser for use in a device manufacturing methodVAN DE KERKHOF MARCUS ADRIANUS·Filed 2006·Granted Nov 25, 2014·0 cites·7 claims
- 2452US8629418B2Lithographic apparatus and sensor thereforVAN DE KERKHOF MARCUS ADRIANUS·Filed 2006·Granted Jan 14, 2014·0 cites·23 claims
- 2550US2025021017A1Methods and systems to calibrate reticle thermal effectsASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 2649US2007081138A1Lithographic projection apparatus, device manufacturing methods and mask for use in a device manufacturing methodASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 2748US11644755B2Lithographic methodASML NETHERLANDS BV·Filed 2019·Granted May 9, 2023·0 cites·20 claims
- 2845US9036130B2Device and method for transmission image sensingMOEST BEARRACH·Filed 2010·Granted May 19, 2015·0 cites·21 claims
- 2942US2007159622A1Method of measuring the magnification of a projection system, device manufacturing method and computer program productASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 3041US7145630B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Dec 5, 2006·0 cites·32 claims
- 3141US2007115452A1Method of measuring the magnification of a projection system, device manufacturing method and computer program productASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 3240US9116446B2Lithographic apparatus and methodVOOGD ROBBERT JAN·Filed 2011·Granted Aug 25, 2015·0 cites·18 claims
- 3335US11237490B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2017·Granted Feb 1, 2022·0 cites·17 claims
- 3435US9857694B2Estimating deformation of a patterning device and/or a change in its positionASML NETHERLANDS BV·Filed 2015·Granted Jan 2, 2018·0 cites·25 claims
- 3527US8860928B2Lithographic apparatus, computer program product and device manufacturing methodPOSTMA SYTSE·Filed 2011·Granted Oct 14, 2014·0 cites·16 claims
Join the waitlist — get patent alerts
Get an alert when Bearrach Moest files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →