Inventor · disambiguated record
James P. Buonodono
Also filed as: BUONODONO JAMES · BUONODONO JAMES P · BUONODONO JAMES PAUL
19 granted patents·4 pending applications·55 citations·filing 2005–2024
92Inventor score
Files withVARIAN SEMICONDUCTOR EQUIPMENT8VARIAN SEMICONDUCTOR EQUIPMENT ASS INC8APPLIED MATERIALS INC5RENAU ANTHONY1RIORDON BENJAMIN B1
Top patents by PatentIndex Score
23 records- 0195US12106936B2Scanned angled etching apparatus and techniques providing separate co-linear radicals and ionsAPPLIED MATERIALS INC·Filed 2023·Granted Oct 1, 2024·2 cites·20 claims
- 0294US10468226B1Extraction apparatus and system for high throughput ion beam processingVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Nov 5, 2019·15 cites·19 claims
- 0393US9916966B1Apparatus and method for minimizing thermal distortion in electrodes used with ion sourcesVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2017·Granted Mar 13, 2018·9 cites·20 claims
- 0487US11127556B2Extraction apparatus and system for high throughput ion beam processingVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2019·Granted Sep 21, 2021·3 cites·17 claims
- 0586US11715621B2Scanned angled etching apparatus and techniques providing separate co-linear radicals and ionsAPPLIED MATERIALS INC·Filed 2019·Granted Aug 1, 2023·3 cites·20 claims
- 0684US8937004B2Apparatus and method for controllably implanting workpiecesVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Jan 20, 2015·5 cites·13 claims
- 0778US8816299B1Workpiece support structure with four degree of freedom air bearing for high vacuum systemsVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Aug 26, 2014·4 cites·20 claims
- 0874US8461030B2Apparatus and method for controllably implanting workpiecesRENAU ANTHONY·Filed 2010·Granted Jun 11, 2013·3 cites·19 claims
- 0973US7812325B2Implanting with improved uniformity and angle control on tilted wafersVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Granted Oct 12, 2010·4 cites·11 claims
- 1072US9190248B2Dynamic electrode plasma systemVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Nov 17, 2015·2 cites·12 claims
- 1171US9287085B2Processing apparatus and method of treating a substrateVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2014·Granted Mar 15, 2016·2 cites·17 claims
- 1270US7453069B2Bushing unit with integrated conductor in ion accelerating device and related methodVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Granted Nov 18, 2008·2 cites·20 claims
- 1362US8698108B1Ion beam measurement system and methodVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted Apr 15, 2014·1 cites·18 claims
- 1462US2025349494A1Thermally optimized arc chamberAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 1559US10062544B2Apparatus and method for minimizing thermal distortion in electrodes used with ion sourcesVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Aug 28, 2018·0 cites·20 claims
- 1656US2025144669A1Vibration reduction in ion implanters using embedded actuator forced attenuationAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1756US2024145206A1Temperature controlled electrode to limit deposition rates and distortionAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1853US9484183B2Linkage conduit for vacuum chamber applicationsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2014·Granted Nov 1, 2016·0 cites·18 claims
- 1949US9520312B2System and method for moving workpieces between multiple vacuum environmentsVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2014·Granted Dec 13, 2016·0 cites·20 claims
- 2046US9437392B2High-throughput ion implanterVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2012·Granted Sep 6, 2016·0 cites·17 claims
- 2143US11145496B2System for using O-rings to apply holding forcesVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Oct 12, 2021·0 cites·19 claims
- 2242US9337076B2Workpiece support structure with four degree of freedom air bearing for high vacuum systemsVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2013·Granted May 10, 2016·0 cites·20 claims
- 2337US2007081880A1Wafer-handling method, system, and apparatusRIORDON BENJAMIN B·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →