Inventor · disambiguated record
Atsushi Umekawa
Also filed as: UMEKAWA ATSUSHI
16 granted patents·4 pending applications·27 citations·filing 2011–2024
89Inventor score
Top patents by PatentIndex Score
20 records- 0194US12050138B2Substrate processing apparatus, and thermocoupleKOKUSAI ELECTRIC CORP·Filed 2021·Granted Jul 30, 2024·2 cites·20 claims
- 0287US11300456B2Substrate processing apparatus, and thermocoupleKOKUSAI ELECTRIC CORP·Filed 2019·Granted Apr 12, 2022·3 cites·20 claims
- 0386US10998205B2Substrate processing apparatus and manufacturing method of semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2019·Granted May 4, 2021·5 cites·14 claims
- 0483US2024222086A1Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2024·Application pending·0 cites
- 0582US10640872B2Substrate processing apparatus and method of manufacturing semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2018·Granted May 5, 2020·2 cites·12 claims
- 0676US12065741B2Substrate processing apparatus and method of manufacturing semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2022·Granted Aug 20, 2024·0 cites·20 claims
- 0771US10228291B2Substrate processing apparatus, and thermocoupleHITACHI INT ELECTRIC INC·Filed 2016·Granted Mar 12, 2019·1 cites·12 claims
- 0870US8486222B2Substrate processing apparatus and method of manufacturing a semiconductor deviceAKAO TOKUNOBU·Filed 2011·Granted Jul 16, 2013·3 cites·9 claims
- 0967US11365482B2Substrate processing apparatus and method of manufacturing semiconductor deviceKOKUSAI ELECTRIC CORP·Filed 2020·Granted Jun 21, 2022·0 cites·11 claims
- 1062US10684174B2Substrate processing apparatus, and thermocoupleHITACHI INT ELECTRIC INC·Filed 2018·Granted Jun 16, 2020·0 cites·16 claims
- 1162US9646862B2Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording mediumHITACHI INT ELECTRIC INC·Filed 2015·Granted May 9, 2017·1 cites·15 claims
- 1259US8987645B2Substrate processing apparatus having rotatable slot-type antenna and method of manufacturing semiconductor device using the sameOGAWA UNRYU·Filed 2011·Granted Mar 24, 2015·2 cites·4 claims
- 1358US8557720B2Substrate processing apparatus and method of manufacturing a semiconductor deviceAKAO TOKUNOBU·Filed 2011·Granted Oct 15, 2013·1 cites·12 claims
- 1456USD901406SInner tube of reactor for semiconductor fabricationKOKUSAI ELECTRIC CORP·Filed 2019·Granted Nov 10, 2020·6 cites·1 claims
- 1555US9171724B2Substrate processing apparatus and method for manufacturing semiconductor deviceYASHIMA SHINJI·Filed 2012·Granted Oct 27, 2015·1 cites·6 claims
- 1650US2016093476A1Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-Transitory Computer-Readable Recording MediumHITACHI INT ELECTRIC INC·Filed 2015·Application pending·0 cites
- 1738US11694907B2Substrate processing apparatus, recording medium, and fluid circulation mechanismHITACHI INT ELECTRIC INC·Filed 2017·Granted Jul 4, 2023·0 cites·17 claims
- 1836US2011233198A1Substrate processing apparatus and substrate processing methodHITACHI INT ELECTRIC INC·Filed 2011·Application pending·0 cites
- 1934US2016002789A1Substrate processing apparatus, method for manufacturing semiconductor device, and recording mediumHITACHI INT ELECTRIC INC·Filed 2015·Application pending·0 cites
- 2032US11198935B2Heating part, substrate processing apparatus, and method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2016·Granted Dec 14, 2021·0 cites·24 claims
Join the waitlist — get patent alerts
Get an alert when Atsushi Umekawa files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →