Inventor · disambiguated record
Jin-Gi Hong
Also filed as: HONG JIN · HONG JIN-GI
19 granted patents·16 pending applications·161 citations·filing 1993–2015
94Inventor score
Top patents by PatentIndex Score
35 records- 0193US9450151B2Semiconductor light-emitting deviceSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Sep 20, 2016·12 cites·20 claims
- 0292US8399363B1Methods of forming oxide-filled trenches in substrates using multiple-temperature oxide deposition techniquesLEE JUNG-CHAN·Filed 2011·Granted Mar 19, 2013·16 cites·20 claims
- 0391US9065033B2Light emitting device packageSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Jun 23, 2015·14 cites·20 claims
- 0482US6489252B2Method of forming a spin-on-glass insulation layerSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Dec 3, 2002·28 cites·11 claims
- 0581US6635586B2Method of forming a spin-on-glass insulation layerSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Oct 21, 2003·27 cites·11 claims
- 0680US8536652B2Non-volatile memory devices including low-K dielectric gaps in substratesLEE BO-YOUNG·Filed 2011·Granted Sep 17, 2013·5 cites·6 claims
- 0780US7439192B2Method of forming a layer on a semiconductor substrateSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Oct 21, 2008·3 cites·11 claims
- 0876US6649503B2Methods of fabricating integrated circuit devices having spin on glass (SOG) insulating layers and integrated circuit devices fabricated therebySAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Nov 18, 2003·19 cites·25 claims
- 0974US7902090B2Method of forming a layer on a semiconductor substrateSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Mar 8, 2011·1 cites·7 claims
- 1070US8366827B2Chamber inserts and apparatuses for processing a substrateSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Feb 5, 2013·5 cites·5 claims
- 1163US9691957B2Light emitting device packageSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Jun 27, 2017·1 cites·20 claims
- 1254US7074671B2Gate electrode of a semiconductor device and method of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jul 11, 2006·4 cites·4 claims
- 1352US7311109B2Method for cleaning a processing chamber and method for manufacturing a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Dec 25, 2007·3 cites·16 claims
- 1449US7314702B2Composition for a bottom-layer resistSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jan 1, 2008·2 cites·10 claims
- 1549US5444026AMethod for manufacturing semiconductor device by forming insulator-layer to suppress bubble formationSAMSUNG ELECTRONICS CO LTD·Filed 1993·Granted Aug 22, 1995·21 cites·7 claims
- 1649US2007022953A1Source gas-supplying unit and chemical vapor deposition apparatus having the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 1747US9165817B2Method of grinding substrate and method of manufacturing semiconductor light emitting device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Oct 20, 2015·0 cites·20 claims
- 1847US2008048274A1Semiconductor device including a gate electrode of lower electrical resistance and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1946US7851125B2Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Dec 14, 2010·0 cites·17 claims
- 2046US2006096541A1Apparatus and method of forming a layer on a semiconductor substrateSEO JUNG-HUN·Filed 2005·Application pending·0 cites
- 2146US2006045970A1ALD thin film deposition apparatus and thin film deposition method using sameSEO JUNG-HUN·Filed 2005·Application pending·0 cites
- 2244US2005279282A1Method and apparatus for processing a semiconductor substratePARK KUN-SANG·Filed 2005·Application pending·0 cites
- 2343US8241837B2Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor deviceHAH JUNG-HWAN·Filed 2010·Granted Aug 14, 2012·0 cites·59 claims
- 2443US2011053329A1Semiconductor device including a gate electrode of lower electrial resistance and method of manufacturing the sameSEO JUNG-HUN·Filed 2010·Application pending·0 cites
- 2542US7820244B2Method of forming a layer and method of removing reaction by-productsSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Oct 26, 2010·0 cites·20 claims
- 2642US2006292810A1Method of manufacturing a capacitorSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 2741US2006021578A1Chemical vapor deposition apparatusSEO JUNG-HUN·Filed 2005·Application pending·0 cites
- 2841US2006024964A1Method and apparatus of forming thin film using atomic layer depositionSEO JUNG-HUN·Filed 2005·Application pending·0 cites
- 2940US2013309865A1Method of manufacturing substrate for mounting electronic deviceSAMSUNG ELECTRONICS CO LTD·Filed 2013·Application pending·0 cites
- 3040US2007042132A1Method of forming plasma and method of forming a layer using the sameSEO JUNG-HUN·Filed 2006·Application pending·0 cites
- 3139US2012007165A1Semiconductor devicesLEE MYOUNG-BUM·Filed 2011·Application pending·0 cites
- 3239US2006137607A1Combination of showerhead and temperature control means for controlling the temperature of the showerhead, and deposition apparatus having the sameSEO JUNG-HUN·Filed 2005·Application pending·0 cites
- 3338US2011003458A1Method of forming device isolation layer and method of fabricating semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2010·Application pending·0 cites
- 3438US2004200244A1Remote plasma enhanced cleaning apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2004·Application pending·0 cites
- 3538US2006128127A1Method of depositing a metal compound layer and apparatus for depositing a metal compound layerSEO JUNG-HUN·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →