Inventor · disambiguated record
Radko G. Bankras
Also filed as: BANKRAS RADKO · BANKRAS RADKO G · BANKRAS RADKO GERARD
7 granted patents·4 pending applications·77 citations·filing 2000–2024
84Inventor score
Top patents by PatentIndex Score
11 records- 0189US7732350B2Chemical vapor deposition of TiN films in a batch reactorASM INT·Filed 2006·Granted Jun 8, 2010·17 cites·20 claims
- 0284US7966969B2Deposition of TiN films in a batch reactorASM INT·Filed 2005·Granted Jun 28, 2011·11 cites·10 claims
- 0381US6549458B1Non-volatile memory array using gate breakdown structuresXILINX INC·Filed 2001·Granted Apr 15, 2003·25 cites·23 claims
- 0480US10343907B2Method and system for delivering hydrogen peroxide to a semiconductor processing chamberASM IP HOLDING BV·Filed 2015·Granted Jul 9, 2019·3 cites·11 claims
- 0576US6522582B1Non-volatile memory array using gate breakdown structuresXILINX INC·Filed 2000·Granted Feb 18, 2003·20 cites·39 claims
- 0668US9431238B2Reactive curing process for semiconductor substratesASM IP HOLDING BV·Filed 2015·Granted Aug 30, 2016·1 cites·31 claims
- 0759US2024167157A1Gas injectorASM IP HOLDING BV·Filed 2023·Application pending·0 cites
- 0858US2025069911A1Apparatus constructed and arranged to process a plurality of substratesASM IP HOLDING BV·Filed 2024·Application pending·0 cites
- 0949US9410244B2Semiconductor processing apparatus including a plurality of reactors, and method for providing the same with process gasOOSTERLAKEN THEODORUS G M·Filed 2012·Granted Aug 9, 2016·0 cites·14 claims
- 1048US2017011910A1Reactive curing process for semiconductor substratesASM IP HOLDING BV·Filed 2016·Application pending·0 cites
- 1133US2016240373A1Method for forming oxide layer by oxidizing semiconductor substrate with hydrogen peroxideASM IP HOLDING BV·Filed 2015·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →