Inventor · disambiguated record
Jang Fung Chen
Also filed as: CHEN JANG F · CHEN JANG FUNG
94 granted patents·16 pending applications·2,735 citations·filing 1992–2025
99Inventor score
Files withASML MASKTOOLS BV54APPLIED MATERIALS INC30CHEN JANG FUNG8MICROUNITY SYSTEMS ENG5HSU DUAN-FU STEPHEN4
Top patents by PatentIndex Score
110 records- 0199US5242770AMask for photolithographyMICROUNITY SYSTEMS ENG·Filed 1992·Granted Sep 7, 1993·482 cites·18 claims
- 0298US7175940B2Method of two dimensional feature model calibration and optimizationASML MASKTOOLS BV·Filed 2002·Granted Feb 13, 2007·365 cites·20 claims
- 0398US6792591B2Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programsASML MASKTOOLS BV·Filed 2002·Granted Sep 14, 2004·160 cites·26 claims
- 0498US5821014AOptical proximity correction method for intermediate-pitch features using sub-resolution scattering bars on a maskMICROUNITY SYSTEMS ENG·Filed 1997·Granted Oct 13, 1998·291 cites·25 claims
- 0598US5447810AMasks for improved lithographic patterning for off-axis illumination lithographyMICROUNITY SYSTEMS ENG·Filed 1994·Granted Sep 5, 1995·190 cites·24 claims
- 0697US6541167B2Optical proximity correctionASML MASKTOOLS BV·Filed 2001·Granted Apr 1, 2003·75 cites·14 claims
- 0796US9025136B2System and method for manufacturing three dimensional integrated circuitsCHEN JANG FUNG·Filed 2011·Granted May 5, 2015·15 cites·16 claims
- 0896US7242459B2Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated Eigen decomposition modelASML MASKTOOLS BV·Filed 2005·Granted Jul 10, 2007·31 cites·15 claims
- 0996US5340700AMethod for improved lithographic patterning in a semiconductor fabrication processMICROUNITY SYSTEMS ENG·Filed 1993·Granted Aug 23, 1994·120 cites·22 claims
- 1095US7620930B2Method, program product and apparatus for model based scattering bar placement for enhanced depth of focus in quarter-wavelength lithographyASML MASKTOOLS BV·Filed 2005·Granted Nov 17, 2009·20 cites·15 claims
- 1195US7342646B2Method of manufacturing reliability checking and verification for lithography process using a calibrated eigen decomposition modelASML MASKTOOLS BV·Filed 2005·Granted Mar 11, 2008·27 cites·12 claims
- 1295US5256505ALithographical mask for controlling the dimensions of resist patternsMICROUNITY SYSTEMS ENG·Filed 1992·Granted Oct 26, 1993·108 cites·10 claims
- 1393US7247574B2Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithographyASML MASKTOOLS BV·Filed 2004·Granted Jul 24, 2007·47 cites·22 claims
- 1492US8132130B2Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure processCHEN JANG FUNG·Filed 2006·Granted Mar 6, 2012·15 cites·19 claims
- 1592US6623895B2Hybrid phase-shift maskASML MASKTOOLS BV·Filed 2001·Granted Sep 23, 2003·38 cites·23 claims
- 1691US9507271B1System and method for manufacturing multiple light emitting diodes in parallelCHEN JANG FUNG·Filed 2011·Granted Nov 29, 2016·7 cites·14 claims
- 1791US8670106B2Optical imaging writer systemCHEN JANG FUNG·Filed 2009·Granted Mar 11, 2014·12 cites·24 claims
- 1891US8111921B2Method and apparatus for performing model-based OPC for pattern decomposed featuresHSU DUAN-FU STEPHEN·Filed 2007·Granted Feb 7, 2012·19 cites·16 claims
- 1991US7725872B2Orientation dependent shielding for use with dipole illumination techniquesASML MASKTOOLS BV·Filed 2007·Granted May 25, 2010·13 cites·18 claims
- 2091US7506299B2Feature optimization using interference mapping lithographyASML HOLDING NV·Filed 2004·Granted Mar 17, 2009·46 cites·30 claims
- 2191US6519760B2Method and apparatus for minimizing optical proximity effectsASML MASKTOOLS BV·Filed 2001·Granted Feb 11, 2003·61 cites·13 claims
- 2290US9250509B2Optical projection array exposure systemAPPLIED MATERIALS INC·Filed 2013·Granted Feb 2, 2016·6 cites·16 claims
- 2390US8253923B1Optical imaging writer systemCHEN JANG FUNG·Filed 2008·Granted Aug 28, 2012·11 cites·21 claims
- 2490US7981576B2Method and apparatus for performing dark field double dipole lithography (DDL)ASML MASKTOOLS BV·Filed 2010·Granted Jul 19, 2011·5 cites·7 claims
- 2590US7824826B2Method and apparatus for performing dark field double dipole lithography (DDL)ASML MASKTOOLS BV·Filed 2007·Granted Nov 2, 2010·9 cites·15 claims
- 2690US7820341B2Method of two dimensional feature model calibration and optimizationASML MASKTOOLS BV·Filed 2007·Granted Oct 26, 2010·12 cites·24 claims
- 2790US7652758B2Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systemsASML MASKTOOLS BV·Filed 2006·Granted Jan 26, 2010·11 cites·18 claims
- 2890US7138212B2Method and apparatus for performing model-based layout conversion for use with dipole illuminationASML MASKTOOLS BV·Filed 2003·Granted Nov 21, 2006·39 cites·21 claims
- 2989US8391605B2Method and apparatus for performing model-based OPC for pattern decomposed featuresHSU DUAN-FU STEPHEN·Filed 2012·Granted Mar 5, 2013·9 cites·22 claims
- 3089US7523438B2Method for improved lithographic patterning utilizing optimized illumination conditions and high transmission attenuated PSMASML MASKTOOLS BV·Filed 2005·Granted Apr 21, 2009·15 cites·10 claims
- 3189US7494753B2Method, program product and apparatus for improving calibration of resist models used in critical dimension calculationASML MASKTOOLS BV·Filed 2006·Granted Feb 24, 2009·14 cites·15 claims
- 3289US7246342B2Orientation dependent shielding for use with dipole illumination techniquesASML MASKTOOLS BV·Filed 2003·Granted Jul 17, 2007·33 cites·26 claims
- 3389US6851103B2Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithographyASML MASKTOOLS BV·Filed 2003·Granted Feb 1, 2005·44 cites·18 claims
- 3488US9519226B2Optical imaging writer systemAPPLIED MATERIALS INC·Filed 2014·Granted Dec 13, 2016·4 cites·3 claims
- 3588US8122391B2Method, program product and apparatus for performing double exposure lithographyCHEN JANG FUNG·Filed 2010·Granted Feb 21, 2012·4 cites·32 claims
- 3688US7681171B2Method, program product and apparatus for performing double exposure lithographyASML MASKTOOLS BV·Filed 2006·Granted Mar 16, 2010·14 cites·23 claims
- 3788US7666554B2Method and apparatus for performing model-based layout conversion for use with dipole illuminationASML MASKTOOLS BV·Filed 2006·Granted Feb 23, 2010·11 cites·18 claims
- 3888US7440082B2Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated eigen decomposition modelASML MASKTOOLS BV·Filed 2007·Granted Oct 21, 2008·8 cites·15 claims
- 3987US7774736B2Method and apparatus for providing optical proximity features to a reticle pattern for deep sub-wavelength optical lithographyASML MASKTOOLS BV·Filed 2007·Granted Aug 10, 2010·8 cites·20 claims
- 4087US7116411B2Method of performing resist process calibration/optimization and DOE optimization for providing OPE matching between different lithography systemsASML MASKTOOLS BV·Filed 2004·Granted Oct 3, 2006·27 cites·6 claims
- 4186US7550235B2Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithographyASML MASKTOOLS BV·Filed 2004·Granted Jun 23, 2009·25 cites·12 claims
- 4285US8910091B2Method, program product and apparatus for performing double exposure lithographyCHEN JANG FUNG·Filed 2012·Granted Dec 9, 2014·3 cites·13 claims
- 4385US6915505B2Method and apparatus for performing rule-based gate shrink utilizing dipole illuminationASML MASKTOOLS BV·Filed 2003·Granted Jul 5, 2005·34 cites·23 claims
- 4484US9158190B2Optical imaging writer systemCHEN JANG FUNG·Filed 2012·Granted Oct 13, 2015·3 cites·20 claims
- 4584US8644589B2Method and apparatus for performing model-based OPC for pattern decomposed featuresHSU DUAN-FU STEPHEN·Filed 2013·Granted Feb 4, 2014·8 cites·12 claims
- 4684US7639864B2Method, program product and apparatus for optimizing illumination for full-chip layerASML MASKTOOLS BV·Filed 2006·Granted Dec 29, 2009·7 cites·31 claims
- 4784US7617476B2Method for performing pattern pitch-split decomposition utilizing anchoring featuresASML MASKTOOLS BV·Filed 2007·Granted Nov 10, 2009·7 cites·20 claims
- 4883US9733573B2Optical projection array exposure systemAPPLIED MATERIALS INC·Filed 2016·Granted Aug 15, 2017·2 cites·15 claims
- 4983US7892707B2Scattering bar OPC application method for sub-half wavelength lithography patterningASML MASKTOOLS BV·Filed 2009·Granted Feb 22, 2011·4 cites·26 claims
- 5083USRE40084EOptical proximity correctionASML MASKTOOLS BV·Filed 2005·Granted Feb 19, 2008·6 cites·31 claims
Showing the top 50 of 110 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →