Inventor · disambiguated record
Anne E. Sanderfer
Also filed as: SANDERFER ANNE · SANDERFER ANNE E
9 granted patents·3 pending applications·145 citations·filing 1998–2001
88Inventor score
Files withADVANCED MICRO DEVICES INC10
Top patents by PatentIndex Score
12 records- 0191US6387820B1BC13/AR chemistry for metal overetching on a high density plasma etcherADVANCED MICRO DEVICES INC·Filed 2000·Granted May 14, 2002·76 cites·6 claims
- 0260US6159863AInsitu hardmask and metal etch in a single etcherADVANCED MICRO DEVICES INC·Filed 1999·Granted Dec 12, 2000·30 cites·7 claims
- 0357US6642152B1Method for ultra thin resist linewidth reduction using implantationADVANCED MICRO DEVICES INC·Filed 2001·Granted Nov 4, 2003·6 cites·35 claims
- 0441US6274504B2Minimizing metal corrosion during post metal solvent cleanADVANCED MICRO DEVICES INC·Filed 1999·Granted Aug 14, 2001·8 cites·6 claims
- 0540US6333263B1Method of reducing stress corrosion induced voiding of patterned metal layersADVANCED MICRO DEVICES INC·Filed 1999·Granted Dec 25, 2001·7 cites·10 claims
- 0638US6174819B1Low temperature photoresist removal for rework during metal mask formationADVANCED MICRO DEVICES INC·Filed 1998·Granted Jan 16, 2001·7 cites·12 claims
- 0738US2001027017A1Minimizing metal corrosion during post metal solvent cleanFiled 2001·Application pending·0 cites
- 0837US2001007791A1Method of reducing stress corrosion induced voiding of patterned metal layersADVANCED MICRO DEVICES INC·Filed 2001·Application pending·0 cites
- 0935US6297065B1Method to rework device with faulty metal stack layerADVANCED MICRO DEVICES INC·Filed 1999·Granted Oct 2, 2001·6 cites·4 claims
- 1034US6251776B1Plasma treatment to reduce stress corrosion induced voiding of patterned metal layersADVANCED MICRO DEVICES INC·Filed 1999·Granted Jun 26, 2001·4 cites·15 claims
- 1130US6066546AMethod to minimize particulate induced clamping failuresADVANCED MICRO DEVICES INC·Filed 1999·Granted May 23, 2000·1 cites·2 claims
- 1228US2001045646A1Silicon oxynitride arc for metal patterningFiled 1999·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →