Inventor · disambiguated record
John Maltabes
Also filed as: MALTABES JOHN · MALTABES JOHN G · MALTABES JOHN GEORGE
16 granted patents·7 pending applications·300 citations·filing 1995–2018
94Inventor score
Top patents by PatentIndex Score
23 records- 0190US6313567B1Lithography chuck having piezoelectric elements, and methodMOTOROLA INC·Filed 2000·Granted Nov 6, 2001·59 cites·23 claims
- 0289US6650135B1Measurement chuck having piezoelectric elements and methodMOTOROLA INC·Filed 2000·Granted Nov 18, 2003·51 cites·17 claims
- 0380US5637912AThree-dimensional monolithic electronic module having stacked planar arrays of integrated circuit chipsIBM·Filed 1996·Granted Jun 10, 1997·56 cites·12 claims
- 0475US6589099B2Method for chemical mechanical polishing (CMP) with altering the concentration of oxidizing agent in slurryMOTOROLA INC·Filed 2001·Granted Jul 8, 2003·19 cites·18 claims
- 0572US6737205B2Arrangement and method for transferring a pattern from a mask to a waferMOTOROLA INC·Filed 2002·Granted May 18, 2004·11 cites·18 claims
- 0672US6491451B1Wafer processing equipment and method for processing wafersMOTOROLA INC·Filed 2000·Granted Dec 10, 2002·18 cites·17 claims
- 0771US5786237AMethod for forming a monolithic electronic module by stacking planar arrays of integrated circuit chipsIBM·Filed 1995·Granted Jul 28, 1998·36 cites·14 claims
- 0868US6686254B2Semiconductor structure and method for reducing charge damageMOTOROLA INC·Filed 2001·Granted Feb 3, 2004·14 cites·3 claims
- 0966US6902986B2Method for defining alignment marks in a semiconductor waferFREESCALE SEMICONDUCTOR INC·Filed 2002·Granted Jun 7, 2005·9 cites·16 claims
- 1064US6495802B1Temperature-controlled chuck and method for controlling the temperature of a substantially flat objectMOTOROLA INC·Filed 2001·Granted Dec 17, 2002·9 cites·13 claims
- 1155US6895294B2Assembly comprising a plurality of mask containers, manufacturing system for manufacturing semiconductor devices, and methodINFINEON TECHNOLOGIES AG·Filed 2000·Granted May 17, 2005·6 cites·19 claims
- 1251US6620563B2Lithography method for forming semiconductor devices on a wafer utilizing atomic force microscopyMOTOROLA INC·Filed 2001·Granted Sep 16, 2003·3 cites·13 claims
- 1349US2021341834A1Method of manufacturing a stamp for imprint lithography, stamp for imprint lithography, imprint roller and roll-to-roll substrate processing apparatusDEGENHARDT JENS·Filed 2018·Application pending·0 cites
- 1448US6817602B2Manufacturing system method for processing a lithography mask containerFREESCALE SEMICONDUCTOR INC·Filed 2001·Granted Nov 16, 2004·2 cites·20 claims
- 1548US6744494B2Continuously adjustable neutral density area filterMOTOROLA INC·Filed 2001·Granted Jun 1, 2004·2 cites·8 claims
- 1645US6486049B2Method of fabricating semiconductor devices with contact studs formed without major polishing defectsMOTOROLA INC·Filed 2001·Granted Nov 26, 2002·4 cites·8 claims
- 1745US6420247B1Method of forming structures on a semiconductor including doping profiles using thickness of photoresistMOTOROLA INC·Filed 2000·Granted Jul 16, 2002·1 cites·6 claims
- 1840US2021029830A1Method for producing a flexible device, flexible electronic device and flexible arrangement of a plurality of electronic devicesAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 1937US2002127865A1Lithography method for forming semiconductor devices with sub-micron structures on a wafer and apparatusMOTOROLA INC·Filed 2001·Application pending·0 cites
- 2035US2002127747A1Lithography method and apparatus with simplified reticlesMOTOROLA INC·Filed 2001·Application pending·0 cites
- 2135US2002051567A1Method of adjusting a lithographic toolFiled 2001·Application pending·0 cites
- 2233US2003082838A1Method and system for monitoring a semiconductor wafer plasma etch processFiled 2001·Application pending·0 cites
- 2329US2003082857A1Method of processing a semiconductor wafer and preprocessed semiconductor waferFiled 2001·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when John Maltabes files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →