Inventor · disambiguated record
Hareesh Thridandam
Also filed as: THRIDANDAM HAREESH
9 granted patents·5 pending applications·133 citations·filing 2001–2025
88Inventor score
Top patents by PatentIndex Score
14 records- 0196US7875312B2Process for producing silicon oxide films for organoaminosilane precursorsAIR PROD & CHEM·Filed 2006·Granted Jan 25, 2011·48 cites·24 claims
- 0290US7678422B2Cyclic chemical vapor deposition of metal-silicon containing filmsAIR PROD & CHEM·Filed 2007·Granted Mar 16, 2010·12 cites·12 claims
- 0385US6576568B2Ionic additives for extreme low dielectric constant chemical formulationsAPPLIED MATERIALS INC·Filed 2001·Granted Jun 10, 2003·29 cites·15 claims
- 0483US8828505B2Plasma enhanced cyclic chemical vapor deposition of silicon-containing filmsTHRIDANDAM HAREESH·Filed 2012·Granted Sep 9, 2014·7 cites·6 claims
- 0583US7064224B1Organometallic complexes and their use as precursors to deposit metal filmsAIR PROD & CHEM·Filed 2005·Granted Jun 20, 2006·15 cites·20 claims
- 0682US2025289779A1High purity ethylenediamine for semiconductor applicationsVERSUM MAT US LLC·Filed 2025·Application pending·0 cites
- 0775US6896955B2Ionic additives for extreme low dielectric constant chemical formulationsAPPLIED MATERIALS INC·Filed 2002·Granted May 24, 2005·16 cites·20 claims
- 0873US12319637B2High purity ethylenediamine for semiconductor applicationsVERSUM MAT US LLC·Filed 2021·Granted Jun 3, 2025·0 cites·11 claims
- 0958US7265062B2Ionic additives for extreme low dielectric constant chemical formulationsAIR PROD & CHEM·Filed 2003·Granted Sep 4, 2007·6 cites·13 claims
- 1057US7582574B2Diethylsilane as a silicon source in the deposition of metal silicate filmsAIR PROD & CHEM·Filed 2007·Granted Sep 1, 2009·0 cites·16 claims
- 1153US2008207007A1Plasma Enhanced Cyclic Chemical Vapor Deposition of Silicon-Containing FilmsAIR PROD & CHEM·Filed 2008·Application pending·0 cites
- 1253US2018022691A1High Purity Ethylenediamine for Semiconductor ApplicationsVERSUM MAT US LLC·Filed 2017·Application pending·0 cites
- 1346US2008124946A1Organosilane compounds for modifying dielectrical properties of silicon oxide and silicon nitride filmsAIR PROD & CHEM·Filed 2007·Application pending·0 cites
- 1439US2006182885A1Preparation of metal silicon nitride films via cyclic depositionLEI XINJIAN·Filed 2005·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →