Inventor · disambiguated record
Noboru Takamure
Also filed as: TAKAMURE NOBORU
15 granted patents·2 pending applications·5,366 citations·filing 2007–2022
97Inventor score
Top patents by PatentIndex Score
17 records- 0199US9455138B1Method for forming dielectric film in trenches by PEALD using H-containing gasASM IP HOLDING BV·Filed 2015·Granted Sep 27, 2016·587 cites·20 claims
- 0299US9368352B2Methods for forming doped silicon oxide thin filmsASM INT·Filed 2014·Granted Jun 14, 2016·469 cites·19 claims
- 0399US9153441B2Methods for forming doped silicon oxide thin filmsASM INT·Filed 2014·Granted Oct 6, 2015·473 cites·17 claims
- 0499US8679958B2Methods for forming doped silicon oxide thin filmsASM INT·Filed 2012·Granted Mar 25, 2014·484 cites·26 claims
- 0599US7807566B2Method for forming dielectric SiOCH film having chemical stabilityASM JAPAN·Filed 2007·Granted Oct 5, 2010·464 cites·17 claims
- 0698US10147600B2Methods for forming doped silicon oxide thin filmsASM INT NV·Filed 2018·Granted Dec 4, 2018·417 cites·20 claims
- 0798US9875893B2Methods for forming doped silicon oxide thin filmsASM INT NV·Filed 2017·Granted Jan 23, 2018·419 cites·20 claims
- 0898US9564314B2Methods for forming doped silicon oxide thin filmsASM INT NV·Filed 2015·Granted Feb 7, 2017·465 cites·28 claims
- 0998US8912101B2Method for forming Si-containing film using two precursors by ALDASM IP HOLDING BV·Filed 2013·Granted Dec 16, 2014·522 cites·17 claims
- 1098US8329599B2Method of depositing dielectric film by ALD using precursor containing silicon, hydrocarbon, and halogenFUKAZAWA ATSUKI·Filed 2011·Granted Dec 11, 2012·575 cites·20 claims
- 1196US9556516B2Method for forming Ti-containing film by PEALD using TDMAT or TDEATASM IP HOLDING BV·Filed 2013·Granted Jan 31, 2017·483 cites·8 claims
- 1292US10510530B2Methods for forming doped silicon oxide thin filmsASM INT NV·Filed 2018·Granted Dec 17, 2019·3 cites·18 claims
- 1389US10784105B2Methods for forming doped silicon oxide thin filmsASM INT NV·Filed 2019·Granted Sep 22, 2020·2 cites·20 claims
- 1487US11302527B2Methods for forming doped silicon oxide thin filmsASM INT NV·Filed 2020·Granted Apr 12, 2022·1 cites·20 claims
- 1581US2023031720A1Methods for forming doped silicon oxide thin filmsASM INT NV·Filed 2022·Application pending·0 cites
- 1669US9673092B2Film forming apparatus, and method of manufacturing semiconductor deviceASM IP HOLDING BV·Filed 2014·Granted Jun 6, 2017·2 cites·6 claims
- 1740US2013224964A1Method for Forming Dielectric Film Containing Si-C bonds by Atomic Layer Deposition Using Precursor Containing Si-C-Si bondFUKAZAWA ATSUKI·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →