Inventor · disambiguated record
Robert Robertson
Also filed as: ROBERTSON JR ROBERT · ROBERTSON ROBERT · ROBERTSON ROBERT M · ROBERTSON ROBERT MCCORMICK
27 granted patents·2 pending applications·2,093 citations·filing 1975–2018
98Inventor score
Files withAPPLIED MATERIALS INC14APPLIED KOMATSU TECHNOLOGY INC9ALLIED SIGNAL INC1APPLIED TECHNOLOGY INC1IMV IMAGING UK LTD1
Top patents by PatentIndex Score
29 records- 0198US5366585AMethod and apparatus for protection of conductive surfaces in a plasma processing reactorAPPLIED MATERIALS INC·Filed 1993·Granted Nov 22, 1994·462 cites·29 claims
- 0295US6055927AApparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technologyAPPLIED KOMATSU TECHNOLOGY INC·Filed 1997·Granted May 2, 2000·129 cites·15 claims
- 0395US6024044ADual frequency excitation of plasma for film depositionAPPLIED KOMATSU TECHNOLOGY INC·Filed 1997·Granted Feb 15, 2000·184 cites·7 claims
- 0493US5399387APlasma CVD of silicon nitride thin films on large area glass substrates at high deposition ratesAPPLIED MATERIALS INC·Filed 1994·Granted Mar 21, 1995·127 cites·7 claims
- 0592US5271972AMethod for depositing ozone/TEOS silicon oxide films of reduced surface sensitivityAPPLIED MATERIALS INC·Filed 1992·Granted Dec 21, 1993·428 cites·5 claims
- 0692US4068938AElectrostatic color printing utilizing discrete potentialsRANK XEROX LTD·Filed 1975·Granted Jan 17, 1978·37 cites·11 claims
- 0791US6355108B1Film deposition using a finger type shadow frameAPPLIED KOMATSU TECHNOLOGY INC·Filed 1999·Granted Mar 12, 2002·90 cites·27 claims
- 0890US5589233ASingle chamber CVD process for thin film transistorsAPPLIED MATERIALS INC·Filed 1995·Granted Dec 31, 1996·124 cites·17 claims
- 0984US6902682B2Method and apparatus for electrostatically maintaining substrate flatnessAPPLIED MATERIALS INC·Filed 2002·Granted Jun 7, 2005·21 cites·15 claims
- 1084US5380566AMethod of limiting sticking of body to susceptor in a deposition treatmentAPPLIED MATERIALS INC·Filed 1993·Granted Jan 10, 1995·55 cites·19 claims
- 1179US6500265B1Apparatus for electrostatically maintaining subtrate flatnessAPPLIED MATERIALS INC·Filed 2000·Granted Dec 31, 2002·16 cites·23 claims
- 1278US6468601B1Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technologyAPPLIED KOMATSU TECHNOLOGY INC·Filed 2000·Granted Oct 22, 2002·14 cites·14 claims
- 1378US5359445AFiber optic sensorALLIED SIGNAL INC·Filed 1987·Granted Oct 25, 1994·30 cites·17 claims
- 1477US6338874B1Method for multilayer CVD processing in a single chamberAPPLIED MATERIALS INC·Filed 1995·Granted Jan 15, 2002·59 cites·24 claims
- 1576US5902650AMethod of depositing amorphous silicon based films having controlled conductivityAPPLIED KOMATSU TECHNOLOGY INC·Filed 1995·Granted May 11, 1999·44 cites·21 claims
- 1675US5851602ADeposition of high quality conformal silicon oxide thin films for the manufacture of thin film transistorsAPPLIED MATERIALS INC·Filed 1996·Granted Dec 22, 1998·44 cites·5 claims
- 1774US7438228B2Systems and methods for managing electronic prescriptionsROBERTSON SCOTT·Filed 2006·Granted Oct 21, 2008·17 cites·16 claims
- 1874US5861197ADeposition of high quality conformal silicon oxide thin films on glass substratesAPPLIED MATERIALS INC·Filed 1996·Granted Jan 19, 1999·40 cites·2 claims
- 1971US6444277B1Method for depositing amorphous silicon thin films onto large area glass substrates by chemical vapor deposition at high deposition ratesAPPLIED MATERIALS INC·Filed 1994·Granted Sep 3, 2002·50 cites·11 claims
- 2070US5441768AMulti-step chemical vapor deposition method for thin film transistorsAPPLIED MATERIALS INC·Filed 1994·Granted Aug 15, 1995·28 cites·17 claims
- 2168US6610374B2Method of annealing large area glass substratesAPPLIED MATERIALS INC·Filed 2001·Granted Aug 26, 2003·11 cites·14 claims
- 2263US6177023B1Method and apparatus for electrostatically maintaining substrate flatnessAPPLIED KOMATSU TECHNOLOGY INC·Filed 1997·Granted Jan 23, 2001·19 cites·16 claims
- 2356US6172322B1Annealing an amorphous film using microwave energyAPPLIED TECHNOLOGY INC·Filed 1997·Granted Jan 9, 2001·25 cites·3 claims
- 2454US6294219B1Method of annealing large area glass substratesAPPLIED KOMATSU TECHNOLOGY INC·Filed 1998·Granted Sep 25, 2001·17 cites·7 claims
- 2550US2005272273A1Method and apparatus for electrostatically maintaining substrate flatnessSHANG QUANYUAN·Filed 2005·Application pending·0 cites
- 2647US6352910B1Method of depositing amorphous silicon based films having controlled conductivityAPPLIED KOMATSU TECHNOLOGY INC·Filed 1999·Granted Mar 5, 2002·13 cites·61 claims
- 2746US5567476AMulti-step chemical vapor deposition method for thin film transistorsAPPLIED KOMATSU TECHNOLOGY INC·Filed 1995·Granted Oct 22, 1996·9 cites·4 claims
- 2839US2002115269A1Method of depositing amorphous silicon based films having controlled conductivityAPPLIED MATERIALS INC·Filed 2001·Application pending·0 cites
- 2938US11026663B2Ultrasound imaging apparatus and methodsIMV IMAGING UK LTD·Filed 2018·Granted Jun 8, 2021·0 cites·20 claims
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