Inventor · disambiguated record
Robertus Johannes Marinus De Jongh
Also filed as: DE JONGH ROBERTUS JOHANNES MAR · DE JONGH ROBERTUS JOHANNES MARINUS
11 granted patents·5 pending applications·30 citations·filing 2003–2023
86Inventor score
Files withASML NETHERLANDS BV9BUTLER HANS2AMSL NETHERLANDS B V1GROENEVELD ROGIER HERMAN MATHIJS1LOOPSTRA ERIK ROELOF1
Top patents by PatentIndex Score
16 records- 0187US9304404B2Arrangement for actuating an element in a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Apr 5, 2016·5 cites·53 claims
- 0281US8144310B2Positioning system, lithographic apparatus and device manufacturing methodBUTLER HANS·Filed 2009·Granted Mar 27, 2012·5 cites·17 claims
- 0372US9857698B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2015·Granted Jan 2, 2018·2 cites·20 claims
- 0469US9164401B2Projection system and lithographic apparatusLOOPSTRA ERIK ROELOF·Filed 2009·Granted Oct 20, 2015·2 cites·23 claims
- 0569US9122173B2Positioning system, lithographic apparatus and device manufacturing methodBUTLER HANS·Filed 2012·Granted Sep 1, 2015·1 cites·16 claims
- 0665US8908144B2Lithographic apparatus and device manufacturing methodGROENEVELD ROGIER HERMAN MATHIJS·Filed 2006·Granted Dec 9, 2014·3 cites·11 claims
- 0763US10248027B2Projection systemASML NETHERLANDS BV·Filed 2015·Granted Apr 2, 2019·1 cites·21 claims
- 0861US2025053102A1Method of reducing cyclic error effects in a lithographic process, projection system and lithographic apparatus comprising a projection systemASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 0960US7307262B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Dec 11, 2007·6 cites·20 claims
- 1057US2025291260A1Method of determining a parasitic force of an actuator of an optical component, control method for an actuator, optical system, projection system and lithographic apparatus.ASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 1156US6992752B2Lithographic projection apparatus, computer program for control thereof, and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted Jan 31, 2006·5 cites·22 claims
- 1252US11550227B2Projection system and lithographic apparatus comprising said projection systemASML NETHERLANDS BV·Filed 2019·Granted Jan 10, 2023·0 cites·19 claims
- 1347US2011194088A1Projection System, Lithographic Apparatus, Method of Projecting a Beam of Radiation onto a Target and Device Manufacturing MethodAMSL NETHERLANDS B V·Filed 2009·Application pending·0 cites
- 1445US2014293251A1Projection System, Lithographic Apparatus, Method of Projecting a Beam of Radiation onto a Target and Device Manufacturing MethodASML NETHERLANDS BV·Filed 2014·Application pending·0 cites
- 1536US2012044471A1Lithographic Apparatus and MethodSTREEFKERK BOB·Filed 2010·Application pending·0 cites
- 1633US7224428B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted May 29, 2007·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →