Inventor · disambiguated record
Andrew G. Haerle
Also filed as: HAERLE ANDREW · HAERLE ANDREW G
21 granted patents·4 pending applications·293 citations·filing 1995–2018
95Inventor score
Files withSAINT GOBAIN CERAMICS15HAERLE ANDREW G2WANG JUN2CABOT MICROELECTRONICS CORP1DOW CHEMICAL CO1
Top patents by PatentIndex Score
25 records- 0190US9343321B2Chemical mechanical planarization using nanodiamondSAINT GOBAIN CERAMICS·Filed 2015·Granted May 17, 2016·6 cites·20 claims
- 0288US6565667B2Process for cleaning ceramic articlesSAINT GOBAIN CERAMICS·Filed 2001·Granted May 20, 2003·41 cites·4 claims
- 0388US6296716B1Process for cleaning ceramic articlesSAINT GOBAIN CERAMICS·Filed 1999·Granted Oct 2, 2001·84 cites·15 claims
- 0486US9120200B2Polishing slurry including zirconia particles and a method of using the polishing slurryHAERLE ANDREW G·Filed 2011·Granted Sep 1, 2015·10 cites·16 claims
- 0585US6162543AHigh purity siliconized silicon carbide having high thermal shock resistanceSAINT GOBAIN NORTON IND CERAMI·Filed 1998·Granted Dec 19, 2000·44 cites·11 claims
- 0682US8980113B2Chemical mechanical planarization using nanodiamondWANG JUN·Filed 2010·Granted Mar 17, 2015·5 cites·17 claims
- 0778US6554909B1Process for cleaning components using cleaning mediaSAINT GOBAIN CERAMICS·Filed 2001·Granted Apr 29, 2003·22 cites·34 claims
- 0877US7993420B2Ceria material and method of forming sameSAINT GOBAIN CERAMICS·Filed 2009·Granted Aug 9, 2011·4 cites·11 claims
- 0976US6403155B2High purity, siliconized silicon carbide having high thermal shock resistanceSAINT GOBAIN CERAMICS·Filed 2000·Granted Jun 11, 2002·16 cites·9 claims
- 1075US6723437B2Semiconductor processing component having low surface contaminant concentrationSAINT GOBAIN CERAMICS·Filed 2002·Granted Apr 20, 2004·15 cites·13 claims
- 1172US6881262B1Methods for forming high purity components and components formed therebySAINT GOBAIN CERAMICS·Filed 2002·Granted Apr 19, 2005·11 cites·35 claims
- 1271US8685123B2Abrasive particulate material, and method of planarizing a workpiece using the abrasive particulate materialWANG JUN·Filed 2005·Granted Apr 1, 2014·3 cites·22 claims
- 1369US7727919B2High resistivity silicon carbideSAINT GOBAIN CERAMICS·Filed 2007·Granted Jun 1, 2010·2 cites·8 claims
- 1469US7053411B2Method for treating semiconductor processing components and components formed therebySAINT GOBAIN CERAMICS·Filed 2004·Granted May 30, 2006·9 cites·6 claims
- 1567US8216328B2Ceria material and method of forming sameHAERLE ANDREW G·Filed 2011·Granted Jul 10, 2012·1 cites·8 claims
- 1667US8105135B2Polishing slurriesLACONTO RONALD W·Filed 2006·Granted Jan 31, 2012·3 cites·19 claims
- 1767US6825123B2Method for treating semiconductor processing components and components formed therebySAINT GOBAN CERAMICS & PLASTIC·Filed 2003·Granted Nov 30, 2004·10 cites·28 claims
- 1865US9410063B2Polishing slurry including zirconia particles and a method of using the polishing slurrySAINT-GOBAIN CERAM & PLASTICS INC·Filed 2015·Granted Aug 9, 2016·1 cites·11 claims
- 1956US8343415B2Ceramic particulate material and processes for forming sameSAINT GOBAIN CERAMICS·Filed 2012·Granted Jan 1, 2013·0 cites·27 claims
- 2050US2008176075A1Ceramic particulate material and processes for forming sameSAINT GOBAIN CERAMICS·Filed 2008·Application pending·0 cites
- 2149US10640680B2Chemical-mechanical processing slurry and methodsCABOT MICROELECTRONICS CORP·Filed 2018·Granted May 5, 2020·0 cites·10 claims
- 2247US2015113882A1Abrasive particulate material including superabrasive material having a coating of metalSAINT GOBAIN CERAMICS·Filed 2012·Application pending·0 cites
- 2347US2015004890A1Nickel coated diamond particles and method of making said particlesSAINT GOBAIN CERAMICS·Filed 2014·Application pending·0 cites
- 2436US2004188319A1Wafer carrier having improved processing characteristicsSAINT GOBAIN CERAMICS·Filed 2003·Application pending·0 cites
- 2534US5599407AMethod for estimating inclusion content of metals using reflectanceDOW CHEMICAL CO·Filed 1995·Granted Feb 4, 1997·6 cites·17 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →