Inventor · disambiguated record
Rolf Freimann
Also filed as: FREIMANN ROLF
41 granted patents·12 pending applications·410 citations·filing 2002–2024
97Inventor score
Top patents by PatentIndex Score
53 records- 0198US7382540B2Refractive projection objectiveZEISS CARL SMT AG·Filed 2007·Granted Jun 3, 2008·105 cites·3 claims
- 0298US7190527B2Refractive projection objectiveZEISS CARL SMT AG·Filed 2004·Granted Mar 13, 2007·161 cites·57 claims
- 0391US8908149B2Projection exposure system and use thereofFREIMANN ROLF·Filed 2008·Granted Dec 9, 2014·15 cites·20 claims
- 0485US8345262B2Method and apparatus for determining a deviation of an actual shape from a desired shape of an optical surfaceZEISS CARL SMT GMBH·Filed 2012·Granted Jan 1, 2013·8 cites·19 claims
- 0584US10101667B2Method for aligning a mirror of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Oct 16, 2018·2 cites·19 claims
- 0682US7643149B2Method of aligning an optical systemZEISS CARL SMT AG·Filed 2006·Granted Jan 5, 2010·16 cites·18 claims
- 0779US7050175B1Method for calibrating an interferometer apparatus, for qualifying an optical surface, and for manufacturing a substrate having an optical surfaceZEISS CARL SMT AG·Filed 2003·Granted May 23, 2006·24 cites·38 claims
- 0878US8537333B2Optical imaging device with image defect determinationFREIMANN ROLF·Filed 2011·Granted Sep 17, 2013·2 cites·23 claims
- 0978US8089634B2Optical element and method of calibrating a measuring apparatus comprising a wave shaping structureHETZLER JOCHEN·Filed 2010·Granted Jan 3, 2012·4 cites·20 claims
- 1077US10386733B2Optical systemZEISS CARL SMT GMBH·Filed 2017·Granted Aug 20, 2019·1 cites·21 claims
- 1177US9377694B2Projection arrangementZEISS CARL SMT GMBH·Filed 2013·Granted Jun 28, 2016·2 cites·33 claims
- 1276US12346033B2Optical systemZEISS CARL SMT GMBH·Filed 2022·Granted Jul 1, 2025·0 cites·21 claims
- 1376US8228485B2Projection illumination systemFREIMANN ROLF·Filed 2008·Granted Jul 24, 2012·7 cites·32 claims
- 1475US7508488B2Projection exposure system and method of manufacturing a miniaturized deviceZEISS CARL SMT AG·Filed 2005·Granted Mar 24, 2009·5 cites·19 claims
- 1574US9720329B2Projection objective of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Aug 1, 2017·1 cites·19 claims
- 1672US9575224B2Mirror, projection objective with such mirror, and projection exposure apparatus for microlithography with such projection objectiveZEISS CARL SMT GMBH·Filed 2013·Granted Feb 21, 2017·3 cites·22 claims
- 1771US9568394B2Optical deviceZEISS CARL SMT GMBH·Filed 2013·Granted Feb 14, 2017·1 cites·13 claims
- 1871US9001304B2Projection exposure system for microlithography with a measurement deviceMUELLER ULRICH·Filed 2010·Granted Apr 7, 2015·1 cites·44 claims
- 1971US6940607B2Method for absolute calibration of an interferometerZEISS CARL SMT AG·Filed 2002·Granted Sep 6, 2005·19 cites·24 claims
- 2067US7403290B1Method and means for determining the shape of a rough surface of an objectZEISS CARL SMT AG·Filed 2006·Granted Jul 22, 2008·5 cites·38 claims
- 2165US11892283B2Measuring apparatus for interferometrically determining a surface shapeZEISS CARL SMT GMBH·Filed 2022·Granted Feb 6, 2024·0 cites·11 claims
- 2264US8104905B2Method and apparatus for determining a deviation of an actual shape from a desired shape of an optical surfaceSCHILLKE FRANK·Filed 2008·Granted Jan 31, 2012·5 cites·7 claims
- 2364US2024416461A1Method for producing a temperature-controlling hollow structure in a substrate using a processing light beamZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 2463US8593642B2Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring deviceFREIMANN ROLF·Filed 2012·Granted Nov 26, 2013·2 cites·13 claims
- 2562US2019129318A1Projection exposure system for microlithography with a measurement deviceZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 2662US2019354025A1Optical systemZEISS CARL SMT GMBH·Filed 2019·Application pending·0 cites
- 2761US10948833B2Wafer holding device and projection microlithography systemZEISS CARL SMT GMBH·Filed 2020·Granted Mar 16, 2021·0 cites·16 claims
- 2861US10359703B2Method for aligning a mirror of a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Granted Jul 23, 2019·0 cites·18 claims
- 2961US10042271B2Projection exposure system for microlithography with a measurement deviceZEISS CARL SMT GMBH·Filed 2017·Granted Aug 7, 2018·0 cites·13 claims
- 3060US9235131B2Optical imaging device with image defect determinationZEISS CARL SMT GMBH·Filed 2013·Granted Jan 12, 2016·0 cites·28 claims
- 3160US8822942B2Projection exposure tool for microlithography with a radiation detector detecting radiation with high resolution over a two-dimensional areaZEISS CARL SMT GMBH·Filed 2013·Granted Sep 2, 2014·0 cites·17 claims
- 3259US9996014B2Optical imaging device with image defect determinationZEISS CARL SMT GMBH·Filed 2016·Granted Jun 12, 2018·0 cites·23 claims
- 3359US8537332B2Projection exposure tool for microlithography with a measuring apparatus and method for measuring an irradiation strength distributionFREIMANN ROLF·Filed 2009·Granted Sep 17, 2013·2 cites·21 claims
- 3457US8541752B2Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography maskZEISS CARL SMT GMBH·Filed 2012·Granted Sep 24, 2013·0 cites·21 claims
- 3556US9696639B2Projection exposure system for microlithography with a measurement deviceZEISS CARL SMT GMBH·Filed 2015·Granted Jul 4, 2017·0 cites·10 claims
- 3656US2022043358A1Method for producing or setting a projection exposure apparatusZEISS CARL SMT GMBH·Filed 2021·Application pending·0 cites
- 3755US7342667B1Method of processing an optical element using an interferometer having an aspherical lens that transforms a first spherical beam type into a second spherical beam typeZEISS CARL SMT AG·Filed 2003·Granted Mar 11, 2008·6 cites·24 claims
- 3855US7133225B1Method of manufacturing an optical systemZEISS CARL SMT AG·Filed 2004·Granted Nov 7, 2006·7 cites·16 claims
- 3954US8654345B2Optical system, in particular in a microlithographic projection exposure apparatusHOF ALBRECHT·Filed 2012·Granted Feb 18, 2014·1 cites·20 claims
- 4053US11426067B2Method and assembly for analysing the wavefront effect of an optical systemZEISS CARL SMT GMBH·Filed 2020·Granted Aug 30, 2022·0 cites·20 claims
- 4153US10345547B2Method for producing a lens for a lithography apparatus, and measurement systemZEISS CARL SMT GMBH·Filed 2017·Granted Jul 9, 2019·0 cites·28 claims
- 4253US2013242278A1Projection objective of a microlithographic projection exposure apparatus designed for EUV and a method of optically adjusting a projection objectiveZEISS CARL SMT GMBH·Filed 2013·Application pending·0 cites
- 4349US2014078513A1Method of measuring a shape of an optical surface based on computationally combined surface region measurements and interferometric measuring deviceZEISS CARL SMT GMBH·Filed 2013·Application pending·0 cites
- 4448US7154612B2Method for calibrating a radius test benchZEISS CARL SMT AG·Filed 2003·Granted Dec 26, 2006·3 cites·13 claims
- 4548US2008094600A1Illumination device and mask for microlithography projection exposure system, and related methodsZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
- 4647US9482968B2Measuring systemZEISS CARL SMT GMBH·Filed 2013·Granted Nov 1, 2016·0 cites·18 claims
- 4745US10754132B2Imaging optical system for microlithographyZEISS CARL SMT GMBH·Filed 2013·Granted Aug 25, 2020·0 cites·31 claims
- 4845US7581305B2Method of manufacturing an optical componentZEISS CARL SMT AG·Filed 2004·Granted Sep 1, 2009·2 cites·24 claims
- 4945US2017284893A1Optical deviceZEISS CARL SMT GMBH·Filed 2017·Application pending·0 cites
- 5037US2004174531A1System for interferometric fit testingZEISS CARL SMT AG·Filed 2003·Application pending·0 cites
Showing the top 50 of 53 patent records by PatentIndex Score.
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