Optical device

Abstract

A device including an imaging optical unit ( 9 ) imaging an object field ( 5 ) in an image field ( 10 ), a structured mask ( 7 ), arranged in the region of the object field ( 5 ) via reticle holder ( 8 ) displaceable in a reticle scanning direction ( 21 ), and a sensor apparatus ( 25 ), arranged in the region of the image field ( 10 ) via a substrate holder ( 13 ) displaceable in a substrate scanning direction ( 22 ). The mask ( 7 ) has at least one measurement structure ( 27; 33 ) to be imaged on the sensor apparatus ( 25 ), wherein the sensor apparatus ( 25 ) includes at least one sensor row ( 28 ) with a multiplicity of sensor elements ( 29 ), and affords the possibility of testing the imaging optical unit ( 9 ) during the displacement of the substrate holder ( 13 ) for exposing a substrate ( 12 ) arranged on the substrate holder.

1 - 2 . (canceled) 
     
     
         3 . Optical device comprising
 a. an imaging optical unit for imaging an object field in an image field,   b. a structured mask, which is arranged in the region of an object plane of the imaging optical unit by means of a reticle holder that can be displaced in a reticle scanning direction, and   c. a sensor apparatus, which is arranged in the region of an image plane of the imaging optical unit by means of a substrate holder that can be displaced in a substrate scanning direction,   d. wherein the mask has at least one measurement structure to be imaged on the sensor apparatus,   e. wherein the measurement structure is embodied such that a plurality of channels are formed for a channel-resolved test of the imaging optical unit.   
     
     
         4 . Device according to  claim 3 , wherein the measurement structure has a diffraction structure with at least two diffraction directions. 
     
     
         5 . Device according to  claim 3 , wherein the sensor apparatus comprises at least one interferometric apparatus. 
     
     
         6 . Device according to  claim 3 , wherein the sensor elements have a clock frequency of at least 1 kHz. 
     
     
         7 . Device according to  claim 3 , wherein the sensor apparatus comprises at least two sensor rows with a multiplicity of sensor elements. 
     
     
         8 . Device according to  claim 3 , wherein the sensor apparatus comprises at least two sensor rows per light channel. 
     
     
         9 . Device according to  claim 8 , wherein a specific region of the sensor apparatus with at least one sensor row with a multiplicity of sensor elements is associated with each of the channels. 
     
     
         10 . Device according to  claim 8 , wherein the channels are distributed over the image field. 
     
     
         11 . Projection exposure apparatus with
 an illumination system and   a device according to  claim 3 .   
     
     
         12 . Method for producing a microstructured or nanostructured component, comprising the following steps:
 providing a mask,   providing a wafer with a light-sensitive coating,   providing a sensor apparatus,   projecting at least one section of the mask onto the wafer with the aid of the projection exposure apparatus according to  claim 11 ,   developing the light-sensitive coating on the wafer.   
     
     
         13 . Component produced according to a method according to  claim 12 . 
     
     
         14 . Method for testing an imaging optical unit, comprising the following steps:
 providing an imaging optical unit with at least one optical element for imaging an object field in an image field,   providing a mask with structures to be imaged,   providing a sensor apparatus with a multiplicity of sensor elements,
 wherein the sensor rows are embodied as separate, spatially separated components, 
   arranging the mask in an object plane of the imaging optical unit by means of a reticle holder that can be displaced in a reticle scanning direction,   arranging the substrate in an image plane of the imaging optical unit by means of a substrate holder that can be displaced in a substrate scanning direction,   arranging the sensor apparatus in the region of the image plane by means of the substrate holder,   imaging at least a first part of the structures to be imaged on the substrate by means of the imaging optical unit,   imaging a second part of the structures of the mask to be imaged on the sensor apparatus by means of the imaging optical unit.   
     
     
         15 . Method according to  claim 14 , wherein the imaging optical unit is tested in a channel-resolved manner. 
     
     
         16 . Method according to  claim 14 , wherein the substrate holder is displaced with constant scanning speed in the substrate scanning direction for the purpose of imaging the first part and the second part of the structures to be imaged 
     
     
         17 . Method according to  claim 14 , wherein the scanning speed is at least 100 mm/s. 
     
     
         18 . Method according to  claim 14 , wherein the reticle holder and the substrate holder are displaced in a synchronized fashion for the purpose of imaging the structures to be imaged. 
     
     
         19 . Method according to  claim 14 , wherein radiation used to image the object field into the image field is split into beams.