Inventor · disambiguated record
Boren Luo
Also filed as: LUO BOREN
12 granted patents·366 citations·filing 2007–2014
91Inventor score
Top patents by PatentIndex Score
12 records- 0197US8764995B2Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereofCHANG CHING-HSU·Filed 2010·Granted Jul 1, 2014·305 cites·20 claims
- 0290US8431291B2Intensity selective exposure photomaskLIU GEORGE·Filed 2011·Granted Apr 30, 2013·5 cites·16 claims
- 0390US7954072B2Model import for electronic design automationTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted May 31, 2011·20 cites·20 claims
- 0488US8681326B2Method and apparatus for monitoring mask process impact on lithography performanceTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Mar 25, 2014·9 cites·17 claims
- 0587US8527918B2Target-based thermal design using dummy insertion for semiconductor devicesCHENG YING-CHOU·Filed 2011·Granted Sep 3, 2013·11 cites·20 claims
- 0680US9298083B2Extreme ultraviolet light (EUV) photomasks, and fabrication methods thereofTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Mar 29, 2016·2 cites·20 claims
- 0778US8219951B2Method of thermal density optimization for device and process enhancementCHENG YING-CHOU·Filed 2010·Granted Jul 10, 2012·5 cites·20 claims
- 0875US8352888B2Model import for electronic design automationTAIWAN SEMICONDUCTOR MFG·Filed 2011·Granted Jan 8, 2013·3 cites·8 claims
- 0974US8214772B2Model import for electronic design automationLIU RU-GUN·Filed 2011·Granted Jul 3, 2012·3 cites·20 claims
- 1072US9026957B2Method of defining an intensity selective exposure photomaskTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted May 5, 2015·1 cites·15 claims
- 1170US8673520B2Intensity selective exposure photomaskLIU GEORGE·Filed 2011·Granted Mar 18, 2014·1 cites·19 claims
- 1266US8477299B2Method and apparatus for monitoring mask process impact on lithography performanceWU PING CHIEH·Filed 2010·Granted Jul 2, 2013·1 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →