Inventor · disambiguated record
Hideto Gotoh
Also filed as: GOTOH HIDETO
8 granted patents·2 pending applications·476 citations·filing 1995–2004
90Inventor score
Technology areasH10P
Files withTEXAS INSTRUMENTS INC3TOKYO ELECTRON LTD3MITSUBISHI GAS CHEMICAL CO1MITSUBISHI GAS CHEMICALS CO IN1
Top patents by PatentIndex Score
10 records- 0194US5972862ACleaning liquid for semiconductor devicesMITSUBISHI GAS CHEMICAL CO·Filed 1997·Granted Oct 26, 1999·234 cites·33 claims
- 0287US6514352B2Cleaning method using an oxidizing agent, chelating agent and fluorine compoundTOKYO ELECTRON LTD·Filed 2001·Granted Feb 4, 2003·43 cites·18 claims
- 0387US6478035B1Cleaning device, cleaning system, treating device and cleaning methodTOKYO ELECTRON LTD·Filed 2000·Granted Nov 12, 2002·46 cites·14 claims
- 0480US6265309B1Cleaning agent for use in producing semiconductor devices and process for producing semiconductor devices using the sameMITSUBISHI GAS CHEMICALS CO IN·Filed 1999·Granted Jul 24, 2001·78 cites·24 claims
- 0566US5650041ASemiconductor device fabrication methodTEXAS INSTRUMENTS INC·Filed 1995·Granted Jul 22, 1997·43 cites·3 claims
- 0657US6875288B2Cleaning agent and cleaning methodTOKYO ELECTRON LTD·Filed 2001·Granted Apr 5, 2005·6 cites·18 claims
- 0749US6462005B1Cleaning agent for a semiconductor device and a method of manufacturing a semiconductor deviceTEXAS INSTRUMENTS INC·Filed 1995·Granted Oct 8, 2002·16 cites·15 claims
- 0841US5885901ARinsing solution after resist stripping process and method for manufacturing semiconductor deviceTEXAS INSTRUMENTS INC·Filed 1996·Granted Mar 23, 1999·10 cites·10 claims
- 0939US2005028929A1Substrate processing apparatus and method thereofFiled 2004·Application pending·0 cites
- 1030US2003191551A1Substrate processing system and methodFiled 2003·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →