Inventor · disambiguated record
Chung-Heon Lee
Also filed as: LEE CHUNG-HEON
15 granted patents·2 pending applications·31 citations·filing 2005–2017
88Inventor score
Top patents by PatentIndex Score
17 records- 0193US8741540B2Hard mask composition, method of forming a pattern, and semiconductor integrated circuit device including the patternKIM MIN-SOO·Filed 2011·Granted Jun 3, 2014·10 cites·14 claims
- 0283US9556094B2Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask compositionCHEIL IND INC·Filed 2013·Granted Jan 31, 2017·6 cites·15 claims
- 0381US8952373B2Hardmask composition and method of forming patterns and semiconductor integrated circuit device including the patternsCHOI YOO-JEONG·Filed 2013·Granted Feb 10, 2015·6 cites·15 claims
- 0476US9665003B2Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patternsCHOI YOO-JEONG·Filed 2014·Granted May 30, 2017·3 cites·18 claims
- 0571US10312074B2Method of producing layer structure, layer structure, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Jun 4, 2019·2 cites·31 claims
- 0671US9725389B2Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask compositionCHEIL IND INC·Filed 2012·Granted Aug 8, 2017·2 cites·12 claims
- 0766US9359276B2Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask compositionCHOI YOO-JEONG·Filed 2012·Granted Jun 7, 2016·1 cites·10 claims
- 0865US9529257B2Hard mask composition and method for forming pattern using sameCHEIL IND INC·Filed 2013·Granted Dec 27, 2016·1 cites·15 claims
- 0954US9683114B2Monomer for hardmask composition, hardmask composition including the monomer, and method of forming patterns using the hardmask compositionSAMSUNG SDI CO LTD·Filed 2015·Granted Jun 20, 2017·0 cites·8 claims
- 1049US2017327640A1Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask compositionSAMSUNG SDI CO LTD·Filed 2017·Application pending·0 cites
- 1148US9284245B2Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask compositionLEE SUNG-JAE·Filed 2013·Granted Mar 15, 2016·0 cites·16 claims
- 1242US2015187566A1Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patternsSAMSUNG SDI CO LTD·Filed 2014·Application pending·0 cites
- 1338US10345706B2Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask compositionSONG HYUN JI·Filed 2014·Granted Jul 9, 2019·0 cites·10 claims
- 1437US7385434B2Circuit for preventing latch-up in DC-DC converterMAGNACHIP SEMICONDUCTOR LTD·Filed 2005·Granted Jun 10, 2008·0 cites·10 claims
- 1536US8900997B2Method for forming a dual damascene structure of a semiconductor device, and a semiconductor device therewithMOON JOON-YOUNG·Filed 2013·Granted Dec 2, 2014·0 cites·8 claims
- 1634US9371444B2Hardmask composition and method of forming patterns using the hardmask compositionSAMSUNG SDI CO LTD·Filed 2015·Granted Jun 21, 2016·0 cites·14 claims
- 1732US10018914B2Hardmask composition and method of forming patterns using the hardmask compositionSAMSUNG SDI CO LTD·Filed 2015·Granted Jul 10, 2018·0 cites·5 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →