Inventor · disambiguated record
Jacques Bertrand
Also filed as: BERTRAND JACQUES · BERTRAND JACQUES J · BERTRAND JACQUES J J
20 granted patents·2 pending applications·610 citations·filing 1999–2004
96Inventor score
Files withADVANCED MICRO DEVICES INC20
Top patents by PatentIndex Score
22 records- 0195US6562718B1Process for forming fully silicided gatesADVANCED MICRO DEVICES INC·Filed 2000·Granted May 13, 2003·107 cites·18 claims
- 0294US6030901APhotoresist stripping without degrading low dielectric constant materialsADVANCED MICRO DEVICES INC·Filed 1999·Granted Feb 29, 2000·151 cites·18 claims
- 0389US6525391B1Nickel silicide process using starved silicon diffusion barrierADVANCED MICRO DEVICES INC·Filed 2001·Granted Feb 25, 2003·52 cites·15 claims
- 0486US6235453B1Low-k photoresist removal processADVANCED MICRO DEVICES INC·Filed 1999·Granted May 22, 2001·78 cites·7 claims
- 0582US6495460B1Dual layer silicide formation using a titanium barrier to reduce surface roughness at silicide/junction interfaceADVANCED MICRO DEVICES INC·Filed 2001·Granted Dec 17, 2002·30 cites·19 claims
- 0682US6432817B1Tungsten silicide barrier for nickel silicidation of a gate electrodeADVANCED MICRO DEVICES INC·Filed 2000·Granted Aug 13, 2002·29 cites·19 claims
- 0779US6468900B1Dual layer nickel deposition using a cobalt barrier to reduce surface roughness at silicide/junction interfaceADVANCED MICRO DEVICES INC·Filed 2000·Granted Oct 22, 2002·25 cites·18 claims
- 0873US6627504B1Stacked double sidewall spacer oxide over nitrideADVANCED MICRO DEVICES INC·Filed 2001·Granted Sep 30, 2003·18 cites·10 claims
- 0972US6362095B1Nickel silicide stripping after nickel silicide formationADVANCED MICRO DEVICES INC·Filed 2000·Granted Mar 26, 2002·17 cites·16 claims
- 1071US6605513B2Method of forming nickel silicide using a one-step rapid thermal anneal process and backend processingADVANCED MICRO DEVICES INC·Filed 2000·Granted Aug 12, 2003·16 cites·10 claims
- 1171US6507123B1Nickel silicide process using UDOX to prevent silicide shortingADVANCED MICRO DEVICES INC·Filed 2000·Granted Jan 14, 2003·16 cites·6 claims
- 1265US6841449B1Two-step process for nickel depositionADVANCED MICRO DEVICES INC·Filed 2002·Granted Jan 11, 2005·12 cites·11 claims
- 1365US6632740B1Two-step process for nickel depositionADVANCED MICRO DEVICES INC·Filed 2002·Granted Oct 14, 2003·12 cites·11 claims
- 1457US6541866B1Cobalt barrier for nickel silicidation of a gate electrodeADVANCED MICRO DEVICES INC·Filed 2001·Granted Apr 1, 2003·7 cites·6 claims
- 1556US6730587B1Titanium barrier for nickel silicidation of a gate electrodeADVANCED MICRO DEVICES INC·Filed 2000·Granted May 4, 2004·7 cites·11 claims
- 1656US6689687B1Two-step process for nickel depositionADVANCED MICRO DEVICES INC·Filed 2002·Granted Feb 10, 2004·7 cites·12 claims
- 1755US7023059B1Trenches to reduce lateral silicide growth in integrated circuit technologyADVANCED MICRO DEVICES INC·Filed 2004·Granted Apr 4, 2006·6 cites·8 claims
- 1855US6340395B1Salsa clean processADVANCED MICRO DEVICES INC·Filed 2000·Granted Jan 22, 2002·8 cites·6 claims
- 1953US6746973B1Effect of substrate surface treatment on 193 NM resist processingADVANCED MICRO DEVICES INC·Filed 2002·Granted Jun 8, 2004·4 cites·29 claims
- 2041US6274504B2Minimizing metal corrosion during post metal solvent cleanADVANCED MICRO DEVICES INC·Filed 1999·Granted Aug 14, 2001·8 cites·6 claims
- 2138US2001027017A1Minimizing metal corrosion during post metal solvent cleanFiled 2001·Application pending·0 cites
- 2233US2002068444A1Dual layer silicide formation using an aluminum barrier to reduce surface roughness at silicide/junction interfaceFiled 2000·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →