Inventor · disambiguated record
Anchel Sheyner
Also filed as: SHEYNER ANCHEL
7 granted patents·4 pending applications·203 citations·filing 2007–2018
85Inventor score
Top patents by PatentIndex Score
11 records- 0196US8633423B2Methods and apparatus for controlling substrate temperature in a process chamberLIN XING·Filed 2011·Granted Jan 21, 2014·131 cites·17 claims
- 0295US9123762B2Substrate support with symmetrical feed structureLIN XING·Filed 2010·Granted Sep 1, 2015·40 cites·19 claims
- 0389US7879183B2Apparatus and method for front side protection during backside cleaningAPPLIED MATERIALS INC·Filed 2008·Granted Feb 1, 2011·13 cites·25 claims
- 0486US8329593B2Method and apparatus for removing polymer from the wafer backside and edgeYOUSIF IMAD·Filed 2007·Granted Dec 11, 2012·14 cites·17 claims
- 0580US8360003B2Plasma reactor with uniform process rate distribution by improved RF ground return pathAPPLIED MATERIALS INC·Filed 2009·Granted Jan 29, 2013·5 cites·4 claims
- 0661US10770328B2Substrate support with symmetrical feed structureAPPLIED MATERIALS INC·Filed 2018·Granted Sep 8, 2020·0 cites·20 claims
- 0754US10096494B2Substrate support with symmetrical feed structureAPPLIED MATERIALS INC·Filed 2015·Granted Oct 9, 2018·0 cites·20 claims
- 0847US2011265951A1Twin chamber processing systemAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
- 0946US2011120505A1Apparatus and method for front side protection during backside cleaningAPPLIED MATERIALS INC·Filed 2011·Application pending·0 cites
- 1045US2009293907A1Method of substrate polymer removalFUNG NANCY·Filed 2008·Application pending·0 cites
- 1137US2011269314A1Process chambers having shared resources and methods of use thereofAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →