Inventor · disambiguated record
Alexander Borovik
Also filed as: BOROVIK ALEXANDER · BOROVIK ALEXANDER S · BOROVIK ALEXANDER SERGEEVICH
19 granted patents·9 pending applications·176 citations·filing 2001–2022
94Inventor score
Files withADVANCED TECH MATERIALS15BOROVIK ALEXANDER S4MOMENTIVE PERFORMANCE MAT INC4XU CHONGYING2BOROVIK ALEXANDER SERGEEVICH1
Top patents by PatentIndex Score
28 records- 0195US7399350B2Fluorine-free disiloxane surfactant compositions for use in coatings and printing ink compositionsMOMENTIVE PERFORMANCE MAT INC·Filed 2006·Granted Jul 15, 2008·25 cites·51 claims
- 0294US7241912B2Copper (I) compounds useful as deposition precursors of copper thin filmsADVANCED TECH MATERIALS·Filed 2005·Granted Jul 10, 2007·12 cites·10 claims
- 0391US7371880B2Copper (I) compounds useful as deposition precursors of copper thin filmsADVANCED TECH MATERIALS·Filed 2007·Granted May 13, 2008·7 cites·31 claims
- 0490US7875318B2Method of applying an anti-corrosion and/or adhesion promoting coating to a metal and resulting coated metalMOMENTIVE PERFORMANCE MAT INC·Filed 2007·Granted Jan 25, 2011·8 cites·20 claims
- 0590US7166732B2Copper (I) compounds useful as deposition precursors of copper thin filmsADVANCED TECH MATERIALS·Filed 2004·Granted Jan 23, 2007·18 cites·37 claims
- 0688US7108771B2Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin filmsADVANCED TECH MATERIALS·Filed 2001·Granted Sep 19, 2006·24 cites·17 claims
- 0783US7964032B2Fluorine-free trisiloxane surfactant compositions for use in coatings and printing ink compositionsMOMENTIVE PERFORMANCE MAT INC·Filed 2006·Granted Jun 21, 2011·6 cites·38 claims
- 0883US7011716B2Compositions and methods for drying patterned wafers during manufacture of integrated circuitry productsADVANCED TECH MATERIALS·Filed 2003·Granted Mar 14, 2006·26 cites·21 claims
- 0981US7531031B2Copper (I) compounds useful as deposition precursors of copper thin filmsADVANCED TECH MATERIALS·Filed 2008·Granted May 12, 2009·2 cites·20 claims
- 1078US7022864B2Ethyleneoxide-silane and bridged silane precursors for forming low k filmsADVANCED TECH MATERIALS·Filed 2003·Granted Apr 4, 2006·12 cites·29 claims
- 1174US7189571B1Method for trace water analysis in cyclic siloxanes useful as precursors for low dielectric constant thin filmsADVANCED TECH MATERIALS·Filed 2002·Granted Mar 13, 2007·6 cites·26 claims
- 1273US7342295B2Porogen materialADVANCED TECH MATERIALS·Filed 2005·Granted Mar 11, 2008·3 cites·9 claims
- 1373US7084080B2Silicon source reagent compositions, and method of making and using same for microelectronic device structureADVANCED TECH MATERIALS·Filed 2002·Granted Aug 1, 2006·16 cites·26 claims
- 1467US7989651B2Epoxysilanes, processes for their manufacture and curable compositions containing sameMOMENTIVE PERFORMANCE MAT INC·Filed 2007·Granted Aug 2, 2011·1 cites·38 claims
- 1565US2010133689A1Copper (i) compounds useful as deposition precursors of copper thin filmsADVANCED TECH MATERIALS·Filed 2009·Application pending·0 cites
- 1664US7423166B2Stabilized cyclosiloxanes for use as CVD precursors for low-dielectric constant thin filmsADVANCED TECH MATERIALS·Filed 2003·Granted Sep 9, 2008·8 cites·36 claims
- 1763US2008048148A1Ethyleneoxide-silane and bridged silane precursors for forming low k filmsADVANCED TECH MATERIALS·Filed 2007·Application pending·0 cites
- 1859US2024312586A1Systems, methods and computer-accessible medium facilitating deployment of antidepressants and other prescription drugsUNIV NEW YORK·Filed 2022·Application pending·0 cites
- 1958US2006235182A1Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin filmsXU CHONGYING·Filed 2006·Application pending·0 cites
- 2054US8501314B2Method of applying an anti-corrosion and/or adhesion promoting coating to a metal and resulting coated metalBOROVIK ALEXANDER S·Filed 2010·Granted Aug 6, 2013·1 cites·16 claims
- 2150US7439318B2Method for trace water analysis in cyclic siloxanes useful as precursors for low dielectric constant thin filmsADVANCED TECH MATERIALS·Filed 2007·Granted Oct 21, 2008·0 cites·20 claims
- 2249US2006134897A1Ethyleneoxide-silane and bridged silane precursors for forming low k filmsBOROVIK ALEXANDER S·Filed 2005·Application pending·0 cites
- 2348US7456488B2Porogen materialADVANCED TECH MATERIALS·Filed 2002·Granted Nov 25, 2008·1 cites·11 claims
- 2446US2006065294A1Compositions and methods for drying patterned wafers during manufacture of integrated circuitry productsXU CHONGYING·Filed 2005·Application pending·0 cites
- 2545US2006148271A1Silicon source reagent compositions, and method of making and using same for microelectronic device structureBOROVIK ALEXANDER S·Filed 2006·Application pending·0 cites
- 2639US2006099831A1Silicon source reagent compositions, and method of making and using same for microelectronic device structureBOROVIK ALEXANDER S·Filed 2005·Application pending·0 cites
- 2735US8575292B2Hydroxyl-functional carbamoyl organosilicon compounds of low VOC and HAP generating potential, anti-corrosion and/or adhesion promoting coating composition containing same, environmentally benign method of coating metal therewith and resulting coated metalSU SHIU-CHIN H·Filed 2007·Granted Nov 5, 2013·0 cites·34 claims
- 2833US2012189868A1Process for the preparation of a coated substrate, coated substrate, and use thereofBOROVIK ALEXANDER SERGEEVICH·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →