Inventor · disambiguated record
Wonlae Kim
Also filed as: KIM WONLAE
6 granted patents·6 pending applications·0 citations·filing 2014–2025
65Inventor score
Files withENTEGRIS INC12
Top patents by PatentIndex Score
12 records- 0168US2025019590A1Nitride etchant composition and methodENTEGRIS INC·Filed 2024·Application pending·0 cites
- 0263US12152187B2Nitride etchant composition and methodENTEGRIS INC·Filed 2021·Granted Nov 26, 2024·0 cites·5 claims
- 0363US2023030323A1Method and composition for etching molybdenumENTEGRIS INC·Filed 2022·Application pending·0 cites
- 0459US2025368893A1Selective silicon nitride etching compositions and related systems and related methodsENTEGRIS INC·Filed 2025·Application pending·0 cites
- 0558US11492709B2Method and composition for etching molybdenumENTEGRIS INC·Filed 2021·Granted Nov 8, 2022·0 cites·17 claims
- 0654US2023383185A1Etchant composition and methodENTEGRIS INC·Filed 2023·Application pending·0 cites
- 0753US12272560B2Selective removal of metal oxide hard masksENTEGRIS INC·Filed 2021·Granted Apr 8, 2025·0 cites·11 claims
- 0853US2016322232A1Use of non-oxidizing strong acids for the removal of ion-implanted resistENTEGRIS INC·Filed 2014·Application pending·0 cites
- 0951US10347504B2Use of non-oxidizing strong acids for the removal of ion-implanted resistENTEGRIS INC·Filed 2018·Granted Jul 9, 2019·0 cites·10 claims
- 1049US2024309272A1Composition and method for selectively etching silicon nitrideENTEGRIS INC·Filed 2024·Application pending·0 cites
- 1148US10577567B2Cleaning compositions for removing post etch residueENTEGRIS INC·Filed 2017·Granted Mar 3, 2020·0 cites·19 claims
- 1247US10790187B2Post-etch residue removal for advanced node beol processingENTEGRIS INC·Filed 2018·Granted Sep 29, 2020·0 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →