Inventor · disambiguated record
Yukio Nishimura
Also filed as: NISHIMURA YUKIO
52 granted patents·10 pending applications·590 citations·filing 1988–2021
98Inventor score
Top patents by PatentIndex Score
62 records- 0195US6908722B2Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin compositionJSR CORP·Filed 2002·Granted Jun 21, 2005·200 cites·21 claims
- 0289US6964840B2Radiation-sensitive resin compositionIBM·Filed 2004·Granted Nov 15, 2005·28 cites·6 claims
- 0388US8076053B2Upper layer-forming composition and photoresist patterning methodNAKAMURA ATSUSHI·Filed 2006·Granted Dec 13, 2011·10 cites·4 claims
- 0488US6753124B2Radiation-sensitive resin compositionJSR CORP·Filed 2001·Granted Jun 22, 2004·33 cites·19 claims
- 0586US7217492B2Onium salt compound and radiation-sensitive resin compositionJSR CORP·Filed 2003·Granted May 15, 2007·17 cites·15 claims
- 0685US6961761B2System and method for partitioning a computer system into domainsFUJITSU LTD·Filed 2001·Granted Nov 1, 2005·53 cites·23 claims
- 0784US8697343B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionNAKAGAWA HIROKI·Filed 2007·Granted Apr 15, 2014·7 cites·8 claims
- 0883US8507575B2Radiation-sensitive resin composition, polymer, and compoundMATSUMURA NOBUJI·Filed 2011·Granted Aug 13, 2013·7 cites·22 claims
- 0983US7213081B2Dynamic determination of memory mapped input output range granularity for multi-node computer systemFUJITSU LTD·Filed 2002·Granted May 1, 2007·40 cites·12 claims
- 1082US6677419B1Preparation of copolymersIBM·Filed 2002·Granted Jan 13, 2004·18 cites·21 claims
- 1181US6933094B2Radiation-sensitive resin compositionJSR CORP·Filed 2001·Granted Aug 23, 2005·17 cites·5 claims
- 1279US6800414B2Radiation-sensitive resin compositionJSR CORP·Filed 2001·Granted Oct 5, 2004·35 cites·20 claims
- 1378US11036133B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2019·Granted Jun 15, 2021·0 cites·18 claims
- 1477US8435718B2Upper layer-forming composition and photoresist patterning methodNAKAMURA ATSUSHI·Filed 2011·Granted May 7, 2013·2 cites·12 claims
- 1577US7202016B2Radiation-sensitive resin compositionJSR CORP·Filed 2005·Granted Apr 10, 2007·4 cites·17 claims
- 1676US11681222B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2021·Granted Jun 20, 2023·0 cites·20 claims
- 1775US8697344B2Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist patternJSR CORP·Filed 2013·Granted Apr 15, 2014·2 cites·6 claims
- 1872US8247165B2Upper layer film forming composition for liquid immersion and method of forming photoresist patternKIMURA TORU·Filed 2005·Granted Aug 21, 2012·2 cites·9 claims
- 1970US9182674B2Immersion upper layer film forming composition and method of forming photoresist patternKIMURA TORU·Filed 2012·Granted Nov 10, 2015·1 cites·16 claims
- 2070US8697331B2Compound, polymer, and radiation-sensitive compositionSAKAKIBARA HIROKAZU·Filed 2010·Granted Apr 15, 2014·2 cites·7 claims
- 2170US8572428B2Storage apparatus and control method for storage apparatusNISHITA SATORU·Filed 2011·Granted Oct 29, 2013·3 cites·5 claims
- 2268US8808974B2Method for forming patternJSR CORP·Filed 2013·Granted Aug 19, 2014·2 cites·4 claims
- 2368US7951524B2Self-topcoating photoresist for photolithographyIBM·Filed 2008·Granted May 31, 2011·3 cites·26 claims
- 2467US10620534B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2018·Granted Apr 14, 2020·0 cites·14 claims
- 2567US7691275B2Use of step and flash imprint lithography for direct imprinting of dielectric materials for dual damascene processingUNIV TEXAS·Filed 2006·Granted Apr 6, 2010·4 cites·27 claims
- 2665US6337171B1Radiation-sensitive resin compositionJSR CORP·Filed 1999·Granted Jan 8, 2002·24 cites·25 claims
- 2764US8791020B2Silicon-containing film, resin composition, and pattern formation methodMORI TAKASHI·Filed 2011·Granted Jul 29, 2014·1 cites·5 claims
- 2862US9261789B2Liquid immersion lithography upper-layer film-forming composition and photoresist pattern-forming methodHAYAMA TAKAHIRO·Filed 2011·Granted Feb 16, 2016·1 cites·13 claims
- 2962US6943826B1Apparatus for debugging imaging devices and method of testing imaging devicesAGILENT TECHNOLOGIES INC·Filed 2000·Granted Sep 13, 2005·6 cites·7 claims
- 3061US10082733B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2016·Granted Sep 25, 2018·0 cites·14 claims
- 3161US9213236B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2014·Granted Dec 15, 2015·0 cites·11 claims
- 3260US7087356B2193nm resist with improved post-exposure propertiesJSR CORP·Filed 2002·Granted Aug 8, 2006·17 cites·14 claims
- 3360US6838225B2Radiation-sensitive resin compositionJSR CORP·Filed 2002·Granted Jan 4, 2005·7 cites·14 claims
- 3460US6403288B1Resist pattern formation methodJSR CORP·Filed 2000·Granted Jun 11, 2002·5 cites·17 claims
- 3559US9500950B2Fluorine-containing polymer, purification method, and radiation-sensitive resin compositionJSR CORP·Filed 2015·Granted Nov 22, 2016·0 cites·13 claims
- 3659US8124314B2Radiation-sensitive compositionNISHIMURA YUKIO·Filed 2010·Granted Feb 28, 2012·4 cites·3 claims
- 3759US7521169B2Radiation-sensitive resin compositionJSR CORP·Filed 2003·Granted Apr 21, 2009·4 cites·9 claims
- 3858US7638261B2Radiation-sensitive resin compositionJSR CORP·Filed 2009·Granted Dec 29, 2009·0 cites·15 claims
- 3957US8431332B2Composition for forming upper layer film for immersion exposure, upper layer film for immersion exposure, and method of forming photoresist patternKOUNO DAITA·Filed 2008·Granted Apr 30, 2013·1 cites·6 claims
- 4057US8307141B2Multi-core processor, control method thereof, and information processing apparatusNISHITA SATORU·Filed 2009·Granted Nov 6, 2012·1 cites·9 claims
- 4156US8895229B2Composition for formation of upper layer film, and method for formation of photoresist patternNISHIMURA YUKIO·Filed 2007·Granted Nov 25, 2014·1 cites·5 claims
- 4256US6800419B2Radiation-sensitive resin compositionJSR CORP·Filed 2003·Granted Oct 5, 2004·14 cites·19 claims
- 4354US4928185ARotary head type recording/reproducing method and apparatus for recording and reproducing a digital audio signalHITACHI LTD·Filed 1988·Granted May 22, 1990·9 cites·10 claims
- 4449US2017160637A9Upper layer-forming composition and resist patterning methodJSR CORP·Filed 2015·Application pending·0 cites
- 4548US7076576B2Data transfer in multi-node computer systemFUJITSU LTD·Filed 2002·Granted Jul 11, 2006·3 cites·20 claims
- 4647US7531286B2Radiation-sensitive resin compositionJSR CORP·Filed 2003·Granted May 12, 2009·1 cites·10 claims
- 4747US2010068650A1Positive-working radiation-sensitive composition and method for resist pattern formation using the compositionNISHIMURA YUKIO·Filed 2008·Application pending·0 cites
- 4847US2012164586A1Patern forming methodNISHIMURA YUKIO·Filed 2012·Application pending·0 cites
- 4946US7452655B2Acrylic copolymer and radiation-sensitive resin compositionJSR CORP·Filed 2003·Granted Nov 18, 2008·1 cites·12 claims
- 5046US2010203452A1Radiation-sensitive compositionJSR CORP·Filed 2010·Application pending·0 cites
Showing the top 50 of 62 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →