Inventor · disambiguated record
Goichi Yoshidome
Also filed as: YOSHIDOME GOICHI
21 granted patents·12 pending applications·492 citations·filing 2004–2025
94Inventor score
Top patents by PatentIndex Score
33 records- 0197USD934315SDeposition ring for a substrate processing chamberAPPLIED MATERIALS INC·Filed 2020·Granted Oct 26, 2021·35 cites·1 claims
- 0295US9127362B2Process kit and target for substrate processing chamberSCHEIBLE KATHLEEN·Filed 2006·Granted Sep 8, 2015·376 cites·25 claims
- 0393USD941372SProcess shield for a substrate processing chamberAPPLIED MATERIALS INC·Filed 2020·Granted Jan 18, 2022·19 cites·1 claims
- 0491USD941371SProcess shield for a substrate processing chamberAPPLIED MATERIALS INC·Filed 2020·Granted Jan 18, 2022·17 cites·1 claims
- 0589US10347475B2Holding assembly for substrate processing chamberAPPLIED MATERIALS INC·Filed 2015·Granted Jul 9, 2019·7 cites·19 claims
- 0685US9096927B2Cooling ring for physical vapor deposition chamber targetWEST BRIAN·Filed 2012·Granted Aug 4, 2015·8 cites·20 claims
- 0784US8500963B2Sputtering of thermally resistive materials including metal chalcogenidesYE MENGQI·Filed 2007·Granted Aug 6, 2013·7 cites·17 claims
- 0882US11658016B2Shield for a substrate processing chamberAPPLIED MATERIALS INC·Filed 2019·Granted May 23, 2023·2 cites·20 claims
- 0982US10563304B2Methods and apparatus for dynamically treating atomic layer deposition films in physical vapor deposition chambersAPPLIED MATERIALS INC·Filed 2017·Granted Feb 18, 2020·1 cites·19 claims
- 1080US9472443B2Selectively groundable cover ring for substrate process chambersAPPLIED MATERIALS INC·Filed 2013·Granted Oct 18, 2016·4 cites·19 claims
- 1175US9534286B2PVD target for self-centering process shieldAPPLIED MATERIALS INC·Filed 2013·Granted Jan 3, 2017·4 cites·18 claims
- 1271US7674360B2Mechanism for varying the spacing between sputter magnetron and targetAPPLIED MATERIALS INC·Filed 2004·Granted Mar 9, 2010·12 cites·22 claims
- 1366US12136544B2Etch uniformity improvement for single turn internal coil PVD chamberAPPLIED MATERIALS INC·Filed 2022·Granted Nov 5, 2024·0 cites·20 claims
- 1463US11339466B2Heated shield for physical vapor deposition chamberAPPLIED MATERIALS INC·Filed 2020·Granted May 24, 2022·0 cites·20 claims
- 1562US2024218498A1Methods and Apparatus for Processing a SubstrateAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1661US9831075B2Source magnet for improved resputtering uniformity in direct current (DC) physical vapor deposition (PVD) processesAPPLIED MATERIALS INC·Filed 2014·Granted Nov 28, 2017·0 cites·20 claims
- 1761US2008116067A1Physical vapor deposition chamber having an adjustable targetLAVITSKY ILYA·Filed 2007·Application pending·0 cites
- 1861US2025290193A1Molybdenum physical vapor deposition targetAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1959US11569069B23D printed chamber components configured for lower film stress and lower operating temperatureAPPLIED MATERIALS INC·Filed 2020·Granted Jan 31, 2023·0 cites·14 claims
- 2058US2012175245A1Gap fill improvement methods for phase-change materialsYE MENGQI·Filed 2012·Application pending·0 cites
- 2157US2010096255A1Gap fill improvement methods for phase-change materialsAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 2255US12203163B2Methods for shaping magnetic fields during semiconductor processingAPPLIED MATERIALS INC·Filed 2021·Granted Jan 21, 2025·0 cites·18 claims
- 2355US2009107834A1Chalcogenide target and methodAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 2453US10697057B2Collimator for use in a physical vapor deposition chamberAPPLIED MATERIALS INC·Filed 2017·Granted Jun 30, 2020·0 cites·20 claims
- 2553US2022293392A1Coil for improved process chamber deposition and etch uniformityAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 2652US12027352B2Apparatus for generating magnetic fields on substrates during semiconductor processingAPPLIED MATERIALS INC·Filed 2021·Granted Jul 2, 2024·0 cites·16 claims
- 2751US10777391B23D printed chamber components configured for lower film stress and lower operating temperatureAPPLIED MATERIALS INC·Filed 2016·Granted Sep 15, 2020·0 cites·21 claims
- 2849US2022384194A1Apparatus for generating magnetic fields on substrates during semiconductor processingAPPLIED MATERIALS INC·Filed 2021·Application pending·0 cites
- 2949US2006096851A1Physical vapor deposition chamber having an adjustable targetLAVITSKY ILYA·Filed 2004·Application pending·0 cites
- 3046US9644262B2Self-centering process shieldAPPLIED MATERIALS INC·Filed 2014·Granted May 9, 2017·0 cites·18 claims
- 3144US2019385908A1Treatment And Doping Of Barrier LayersAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 3240US2006096857A1Physical vapor deposition chamber having a rotatable substrate pedestalLAVITSKY ILYA·Filed 2004·Application pending·0 cites
- 3336US2012258280A1Extended life textured chamber components and method for fabricating sameJACKSON MICHAEL·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →