Inventor · disambiguated record
Yun-Yen Jack Yang
Also filed as: YANG YUN-YEN · YANG YUN-YEN JACK
5 granted patents·1 pending application·700 citations·filing 1996–2001
85Inventor score
Files withLAM RES CORP5
Top patents by PatentIndex Score
6 records- 0198US5968275AMethods and apparatus for passivating a substrate in a plasma reactorLAM RES CORP·Filed 1997·Granted Oct 19, 1999·593 cites·26 claims
- 0270US6221792B1Metal and metal silicide nitridization in a high density, low pressure plasma reactorLAM RES CORP·Filed 1997·Granted Apr 24, 2001·40 cites·24 claims
- 0367US6080680AMethod and composition for dry etching in semiconductor fabricationLAM RES CORP·Filed 1997·Granted Jun 27, 2000·34 cites·22 claims
- 0463US5904571AMethods and apparatus for reducing charging during plasma processingLAM RES CORP·Filed 1996·Granted May 18, 1999·19 cites·22 claims
- 0547US6209551B1Methods and compositions for post-etch layer stack treatment in semiconductor fabricationLAM RES CORP·Filed 1997·Granted Apr 3, 2001·14 cites·18 claims
- 0632US2001002326A1Metal and metal silicide nitridization in a high density, low pressure plasma reactorFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →