Inventor · disambiguated record
Vaibhav Soni
Also filed as: SONI VAIBHAV
10 granted patents·3 pending applications·9 citations·filing 2017–2022
80Inventor score
Top patents by PatentIndex Score
13 records- 0192US11289312B2Physical vapor deposition (PVD) chamber with in situ chamber cleaning capabilityAPPLIED MATERIALS INC·Filed 2019·Granted Mar 29, 2022·4 cites·18 claims
- 0290US11049701B2Biased cover ring for a substrate processing systemAPPLIED MATERIALS INC·Filed 2017·Granted Jun 29, 2021·3 cites·19 claims
- 0389US11473189B2Method for particle removal from wafers through plasma modification in pulsed PVDAPPLIED MATERIALS INC·Filed 2020·Granted Oct 18, 2022·2 cites·12 claims
- 0476US11932934B2Method for particle removal from wafers through plasma modification in pulsed PVDAPPLIED MATERIALS INC·Filed 2022·Granted Mar 19, 2024·0 cites·17 claims
- 0555US11347846B2Real-time monitoring and policy enforcement of active applications and servicesDELL PRODUCTS LP·Filed 2020·Granted May 31, 2022·0 cites·19 claims
- 0652US11568091B2Method and system for integrity protected distributed ledger for component certificate attestationDELL PRODUCTS LP·Filed 2021·Granted Jan 31, 2023·0 cites·20 claims
- 0752US2023131027A1Managing virtual break sessionsDELL PRODUCTS LP·Filed 2021·Application pending·0 cites
- 0851US11663147B2System and method for managing peripheral devices at an information handling systemDELL PRODUCTS LP·Filed 2021·Granted May 30, 2023·0 cites·20 claims
- 0948US11914683B2Systems and methods to transfer software entitlements between information handling systemsDELL PRODUCTS LP·Filed 2021·Granted Feb 27, 2024·0 cites·26 claims
- 1048US11645394B2Systems and methods for associating attested information handling systems to end user accountsDELL PRODUCTS LP·Filed 2021·Granted May 9, 2023·0 cites·23 claims
- 1147US12135809B2Systems and methods for transferring information handling systemsDELL PRODUCTS LP·Filed 2021·Granted Nov 5, 2024·0 cites·21 claims
- 1240US2020203144A1Methods of cleaning an oxide layer in a film stack to eliminate arcing during downstream processingAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 1335US2019127842A1Pulsed dc source for high power impulse magnetron sputtering physical vapor deposition of dielectric films and methods of applicationAPPLIED MATERIALS INC·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →