Inventor · disambiguated record
Tomohiro Iijima
Also filed as: IIJIMA TOMOHIRO
15 granted patents·1 pending application·171 citations·filing 1999–2018
93Inventor score
Top patents by PatentIndex Score
16 records- 0191US7740991B2Beam dose computing method and writing method and record carrier body and writing apparatus for determining an optimal dose of a charged particle beamNUFLARE TECHNOLOGY INC·Filed 2006·Granted Jun 22, 2010·19 cites·18 claims
- 0291US7511290B2Charged particle beam writing method and apparatusNUFLARE TECHNOLOGY INC·Filed 2007·Granted Mar 31, 2009·16 cites·19 claims
- 0390US8352889B2Beam dose computing method and writing method and record carrier body and writing apparatusNUFLARE TECHNOLOGY INC·Filed 2011·Granted Jan 8, 2013·5 cites·5 claims
- 0486US8309283B2Method and apparatus for writingKATO YASUO·Filed 2009·Granted Nov 13, 2012·13 cites·9 claims
- 0586US7657863B2Pattern area value calculating method, proximity effect correcting method, and charged particle beam writing method and apparatusNUFLARE TECHNOLOGY INC·Filed 2007·Granted Feb 2, 2010·11 cites·18 claims
- 0686US7619230B2Charged particle beam writing method and apparatus and readable storage mediumNUFLARE TECHNOLOGY INC·Filed 2006·Granted Nov 17, 2009·10 cites·15 claims
- 0786US6313476B1Charged beam lithography systemTOSHIBA KK·Filed 1999·Granted Nov 6, 2001·56 cites·12 claims
- 0885US9202673B2Multi charged particle beam writing method and multi charged particle beam writing apparatusNUFLARE TECHNOLOGY INC·Filed 2013·Granted Dec 1, 2015·4 cites·2 claims
- 0984US7608845B2Charged particle beam writing apparatus and method thereof, and method for resizing dimension variation due to loading effectNUFLARE TECHNOLOGY INC·Filed 2007·Granted Oct 27, 2009·11 cites·9 claims
- 1082US7872745B2Pattern inspection apparatus and pattern inspection methodNUFLARE TECHNOLOGY INC·Filed 2008·Granted Jan 18, 2011·9 cites·8 claims
- 1175US6346354B1Pattern writing methodTOSHIBA KK·Filed 2000·Granted Feb 12, 2002·12 cites·10 claims
- 1271US7476881B2Charged beam drawing apparatus and charged beam drawing methodNUFLARE TECHNOLOGY INC·Filed 2006·Granted Jan 13, 2009·3 cites·16 claims
- 1362US2018261421A1Multi charged particle beam writing method and multi charged particle beam writing apparatusNUFLARE TECHNOLOGY INC·Filed 2018·Application pending·0 cites
- 1461US10020159B2Multi charged particle beam writing method and multi charged particle beam writing apparatusNUFLARE TECHNOLOGY INC·Filed 2016·Granted Jul 10, 2018·0 cites·3 claims
- 1561US8423921B2Data verification method and charged particle beam writing apparatusHANDA YUJIN·Filed 2009·Granted Apr 16, 2013·2 cites·12 claims
- 1658US9570267B2Multi charged particle beam writing method and multi charged particle beam writing apparatusNUFLARE TECHNOLOGY INC·Filed 2015·Granted Feb 14, 2017·0 cites·2 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →