Inventor · disambiguated record
Rempei Nakata
Also filed as: NAKATA REMPEI
38 granted patents·7 pending applications·1,179 citations·filing 1990–2018
98Inventor score
Top patents by PatentIndex Score
45 records- 0196US5429995AMethod of manufacturing silicon oxide film containing fluorineTOSHIBA KK·Filed 1993·Granted Jul 4, 1995·421 cites·10 claims
- 0292US5775980APolishing method and polishing apparatusTOSHIBA KK·Filed 1996·Granted Jul 7, 1998·105 cites·8 claims
- 0391US5607718APolishing method and polishing apparatusTOSHIBA KK·Filed 1994·Granted Mar 4, 1997·119 cites·29 claims
- 0487US5664989APolishing pad, polishing apparatus and polishing methodTOSHIBA KK·Filed 1996·Granted Sep 9, 1997·74 cites·30 claims
- 0582US6746969B2Method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2001·Granted Jun 8, 2004·27 cites·27 claims
- 0680US7785984B2Manufacturing method for semiconductor deviceTOSHIBA KK·Filed 2007·Granted Aug 31, 2010·7 cites·18 claims
- 0780US6534870B1Apparatus and method for manufacturing a semiconductor deviceTOSHIBA KK·Filed 2000·Granted Mar 18, 2003·32 cites·18 claims
- 0879US6059920ASemiconductor device polishing apparatus having improved polishing liquid supplying apparatus, and polishing liquid supplying methodTOSHIBA KK·Filed 1997·Granted May 9, 2000·59 cites·12 claims
- 0976US6800569B2Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatusTOSHIBA KK·Filed 2003·Granted Oct 5, 2004·12 cites·13 claims
- 1075US7052971B2Method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2002·Granted May 30, 2006·18 cites·16 claims
- 1175US6558747B2Method of forming insulating film and process for producing semiconductor deviceTOSHIBA KK·Filed 2001·Granted May 6, 2003·19 cites·20 claims
- 1275US6224464B1Polishing method and polisher used in the methodTOSHIBA KK·Filed 1996·Granted May 1, 2001·39 cites·19 claims
- 1374US6419557B2Polishing method and polisher used in the methodTOSHIBA KK·Filed 2001·Granted Jul 16, 2002·14 cites·3 claims
- 1473US6703302B2Method of making a low dielectric insulation layerTOSHIBA KK·Filed 2002·Granted Mar 9, 2004·19 cites·16 claims
- 1572US5119761ASubstrate heating apparatus for forming thin films on substrate surfaceTOSHIBA KK·Filed 1990·Granted Jun 9, 1992·30 cites·19 claims
- 1669US6938638B2Gas circulating-processing apparatusTOSHIBA KK·Filed 2001·Granted Sep 6, 2005·13 cites·20 claims
- 1767US7604832B2Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatusTOSHIBA KK·Filed 2004·Granted Oct 20, 2009·7 cites·5 claims
- 1867US5632868AMethod and apparatus for generating ozone and methods of its useEBARA CORP·Filed 1995·Granted May 27, 1997·24 cites·1 claims
- 1966US6645881B2Method of forming coating film, method of manufacturing semiconductor device and coating solutionTOSHIBA KK·Filed 2002·Granted Nov 11, 2003·10 cites·16 claims
- 2065US7312018B2Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatusTOSHIBA KK·Filed 2004·Granted Dec 25, 2007·6 cites·7 claims
- 2160US6566261B2Semiconductor device and method of manufacturing the sameTOSHIBA KK·Filed 2001·Granted May 20, 2003·8 cites·17 claims
- 2259US6962870B2Method of manufacturing semiconductor device and semiconductor deviceTOSHIBA KK·Filed 2004·Granted Nov 8, 2005·9 cites·16 claims
- 2358US5641581ASemiconductor deviceTOSHIBA KK·Filed 1995·Granted Jun 24, 1997·20 cites·4 claims
- 2457US8071157B2Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatusITO SHINICHI·Filed 2007·Granted Dec 6, 2011·0 cites·10 claims
- 2557US7094681B2Semiconductor device fabrication methodTOSHIBA KK·Filed 2003·Granted Aug 22, 2006·5 cites·16 claims
- 2657US6436849B1Method for manufacturing semiconductor device having low dielectric constant insulating film, wafer processing equipment and wafer storing box used in this methodTOSHIBA KK·Filed 2001·Granted Aug 20, 2002·5 cites·9 claims
- 2756US5792326AMethod and apparatus for generating ozone and methods of its useFiled 1997·Granted Aug 11, 1998·14 cites·5 claims
- 2855US5620925AMethod of manufacturing semiconductor device using a hagolen plasma treatment stepTOSHIBA KK·Filed 1994·Granted Apr 15, 1997·22 cites·18 claims
- 2954US6828684B2Semiconductor device and method of manufacturing the sameTOSHIBA KK·Filed 2003·Granted Dec 7, 2004·5 cites·7 claims
- 3054US6458713B1Method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2000·Granted Oct 1, 2002·5 cites·18 claims
- 3153US2019291040A1Film forming apparatus and gas-liquid separating apparatusTOSHIBA KK·Filed 2018·Application pending·0 cites
- 3252US2011008545A1Film forming method, film forming apparatus, pattern forming method, and manufacturing method of semiconductor apparatusTOSHIBA KK·Filed 2010·Application pending·0 cites
- 3352US2019083918A1Manufacturing apparatus and exhaust gas treatment apparatusTOSHIBA KK·Filed 2018·Application pending·0 cites
- 3450US6784092B2Method of forming insulating film and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2002·Granted Aug 31, 2004·2 cites·21 claims
- 3545US2008009143A1Method of forming silicon oxide layerYAMADA NOBUHIDE·Filed 2007·Application pending·0 cites
- 3644US5702673AOzone generating apparatusEBARA CORP·Filed 1996·Granted Dec 30, 1997·8 cites·4 claims
- 3744US5071789AMethod for forming a metal electrical connector to a surface of a semiconductor device adjacent a sidewall of insulation material with metal creep-up extending up that sidewall, and related deviceTOSHIBA KK·Filed 1990·Granted Dec 10, 1991·14 cites·14 claims
- 3842US7534717B2Method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2005·Granted May 19, 2009·0 cites·1 claims
- 3942US2014067141A1Power control equipment, power control system, and power control methodTOSHIBA KK·Filed 2013·Application pending·0 cites
- 4041US7446061B2Method of forming insulating film, method of manufacturing semiconductor device and their controlling computer programKABUSHIKI KAIHSA TOSHIBA·Filed 2006·Granted Nov 4, 2008·0 cites·20 claims
- 4138US6096631AMethod of manufacturing semiconductor deviceTOSHIBA KK·Filed 1998·Granted Aug 1, 2000·6 cites·22 claims
- 4238US2003143847A1Method of forming low dielectric constant insulating layer and method of manufacturing semiconductor deviceFiled 2002·Application pending·0 cites
- 4332US9698034B2Substrate storage container and substrate storage container mounting tableTOSHIBA KK·Filed 2015·Granted Jul 4, 2017·0 cites·7 claims
- 4432US2016348238A1Film forming apparatusTOSHIBA KK·Filed 2016·Application pending·0 cites
- 4531US5794114AOzonizerEBARA CORP·Filed 1995·Granted Aug 11, 1998·1 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →