Inventor · disambiguated record
Halbert Chong
Also filed as: CHONG HALBERT
8 granted patents·4 pending applications·7 citations·filing 2019–2022
76Inventor score
Files withAPPLIED MATERIALS INC12
Top patents by PatentIndex Score
12 records- 0192US11289312B2Physical vapor deposition (PVD) chamber with in situ chamber cleaning capabilityAPPLIED MATERIALS INC·Filed 2019·Granted Mar 29, 2022·4 cites·18 claims
- 0289US11898236B2Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2021·Granted Feb 13, 2024·1 cites·17 claims
- 0389US11473189B2Method for particle removal from wafers through plasma modification in pulsed PVDAPPLIED MATERIALS INC·Filed 2020·Granted Oct 18, 2022·2 cites·12 claims
- 0478US2022310363A1Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 0576US11932934B2Method for particle removal from wafers through plasma modification in pulsed PVDAPPLIED MATERIALS INC·Filed 2022·Granted Mar 19, 2024·0 cites·17 claims
- 0674US2022310364A1Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 0770US2021319989A1Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2020·Application pending·0 cites
- 0868US12338527B2Shutter disk for physical vapor deposition (PVD) chamberAPPLIED MATERIALS INC·Filed 2022·Granted Jun 24, 2025·0 cites·18 claims
- 0963US11249390B2Extreme ultraviolet mask absorber materialsAPPLIED MATERIALS INC·Filed 2020·Granted Feb 15, 2022·0 cites·20 claims
- 1058US11251024B2Coating for chamber particle reductionAPPLIED MATERIALS INC·Filed 2020·Granted Feb 15, 2022·0 cites·17 claims
- 1146US2023377892A1Methods and apparatus for processing a substrateAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1242US11661652B2Wet cleaning inside of gasline of semiconductor process equipmentAPPLIED MATERIALS INC·Filed 2019·Granted May 30, 2023·0 cites·19 claims
Join the waitlist — get patent alerts
Get an alert when Halbert Chong files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →