Inventor · disambiguated record
Manish Hemkar
Also filed as: HEMKAR MANISH
7 granted patents·6 pending applications·22 citations·filing 2004–2024
79Inventor score
Top patents by PatentIndex Score
13 records- 0186US7262116B2Low temperature epitaxial growth of silicon-containing films using close proximity UV radiationAPPLIED MATERIALS INC·Filed 2006·Granted Aug 28, 2007·9 cites·27 claims
- 0280US10269614B2Susceptor design to reduce edge thermal peakAPPLIED MATERIALS INC·Filed 2015·Granted Apr 23, 2019·3 cites·15 claims
- 0373US2024318351A1Multi-thermal cvd chambers with shared gas delivery and exhaust systemAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0472US7718225B2Method to control semiconductor film deposition characteristicsAPPLIED MATERIALS INC·Filed 2005·Granted May 18, 2010·3 cites·18 claims
- 0564US7396743B2Low temperature epitaxial growth of silicon-containing films using UV radiationSINGH KAUSHAL K·Filed 2004·Granted Jul 8, 2008·7 cites·21 claims
- 0663US12037701B2Multi-thermal CVD chambers with shared gas delivery and exhaust systemAPPLIED MATERIALS INC·Filed 2021·Granted Jul 16, 2024·0 cites·16 claims
- 0761US2025366224A1Nanopillar structure of image sensor device and method of formingAPPLIED MATERIALS INC·Filed 2024·Application pending·0 cites
- 0853US2007232031A1UV assisted low temperature epitaxial growth of silicon-containing filmsAPPLIED MATERIALS INC·Filed 2007·Application pending·0 cites
- 0953US2024290644A1Two level vacuum wafer transfer system with robots on each levelAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 1051US2024145230A1Semiconductor cleaning using plasma-free precursorsAPPLIED MATERIALS INC·Filed 2022·Application pending·0 cites
- 1149US8991332B2Apparatus to control semiconductor film deposition characteristicsKUPPURAO SATHEESH·Filed 2009·Granted Mar 31, 2015·0 cites·16 claims
- 1237US8728944B2Method of removing contaminants and native oxides from a substrate surfaceKUPPURAO SATHEESH·Filed 2011·Granted May 20, 2014·0 cites·18 claims
- 1335US2011061810A1Apparatus and Methods for Cyclical Oxidation and EtchingAPPLIED MATERIALS INC·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →