Inventor · disambiguated record
Jozef Kudela
Also filed as: KUDELA JOZEF
27 granted patents·19 pending applications·427 citations·filing 2006–2023
96Inventor score
Top patents by PatentIndex Score
46 records- 0198US9397380B2Guided wave applicator with non-gaseous dielectric for plasma chamberKUDELA JOZEF·Filed 2012·Granted Jul 19, 2016·191 cites·26 claims
- 0298US8992723B2RF bus and RF return bus for plasma chamber electrodeSORENSEN CARL A·Filed 2010·Granted Mar 31, 2015·157 cites·7 claims
- 0391US8343592B2Asymmetrical RF drive for electrode of plasma chamberAPPLIED MATERIALS INC·Filed 2008·Granted Jan 1, 2013·13 cites·13 claims
- 0490US8883269B2Thin film deposition using microwave plasmaWON TAE KYUNG·Filed 2011·Granted Nov 11, 2014·6 cites·5 claims
- 0590US8438990B2Multi-electrode PECVD sourceKUDELA JOZEF·Filed 2009·Granted May 14, 2013·10 cites·11 claims
- 0687US10304607B2RF choke for gas delivery to an RF driven electrode in a plasma processing apparatusAPPLIED MATERIALS INC·Filed 2017·Granted May 28, 2019·2 cites·7 claims
- 0787US8906813B2SiOx process chemistry development using microwave plasma CVDWON TAE KYUNG·Filed 2013·Granted Dec 9, 2014·8 cites·13 claims
- 0887US8728586B2RF choke for gas delivery to an RF driven electrode in a plasma processing apparatusKUDELA JOZEF·Filed 2008·Granted May 20, 2014·5 cites·19 claims
- 0986US9068262B2Tightly fitted ceramic insulator on large area electrodeKUDELA JOZEF·Filed 2011·Granted Jun 30, 2015·6 cites·16 claims
- 1084US9922854B2Vertical inline CVD systemKURITA SHINICHI·Filed 2011·Granted Mar 20, 2018·7 cites·10 claims
- 1181US10184179B2Atomic layer deposition processing chamber permitting low-pressure tool replacementAPPLIED MATERIALS INC·Filed 2015·Granted Jan 22, 2019·3 cites·20 claims
- 1281US9761365B2RF choke for gas delivery to an RF driven electrode in a plasma processing apparatusAPPLIED MATERIALS INC·Filed 2014·Granted Sep 12, 2017·3 cites·11 claims
- 1379US11823871B2Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing toolAPPLIED MATERIALS INC·Filed 2019·Granted Nov 21, 2023·2 cites·20 claims
- 1476US9048518B2Transmission line RF applicator for plasma chamberKUDELA JOZEF·Filed 2012·Granted Jun 2, 2015·5 cites·20 claims
- 1575US11532418B2RF choke for gas delivery to an RF driven electrode in a plasma processing apparatusAPPLIED MATERIALS INC·Filed 2020·Granted Dec 20, 2022·0 cites·20 claims
- 1675US9818580B2Transmission line RF applicator for plasma chamberAPPLIED MATERIALS INC·Filed 2015·Granted Nov 14, 2017·2 cites·19 claims
- 1773US2019198217A1Rf choke for gas delivery to an rf driven electrode in a plasma processing apparatusAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 1872US10903048B2Substrate processing method and apparatus for controlling phase angles of harmonic signalsAPPLIED MATERIALS INC·Filed 2018·Granted Jan 26, 2021·2 cites·20 claims
- 1970US10886053B2RF choke for gas delivery to an RF driven electrode in a plasma processing apparatusAPPLIED MATERIALS INC·Filed 2019·Granted Jan 5, 2021·0 cites·10 claims
- 2070US9425026B2Systems and methods for improved radio frequency matching networksAPPLIED MATERIALS INC·Filed 2015·Granted Aug 23, 2016·1 cites·20 claims
- 2168US8691047B2Large area plasma processing chamber with at-electrode RF matchingSORENSEN CARL A·Filed 2010·Granted Apr 8, 2014·2 cites·5 claims
- 2267US2023272530A1Large-area high-density plasma processing chamber for flat panel displaysANWAR SUHAIL·Filed 2023·Application pending·0 cites
- 2366US8872428B2Plasma source with vertical gradientKUDELA JOZEF·Filed 2012·Granted Oct 28, 2014·2 cites·19 claims
- 2463US2013068161A1Gas delivery and distribution for uniform process in linear-type large-area plasma reactorWHITE JOHN M·Filed 2012·Application pending·0 cites
- 2561US2016208380A1Gas delivery and distribution for uniform process in linear-type large-area plasma reactorAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
- 2660US12224156B2Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing toolAPPLIED MATERIALS INC·Filed 2021·Granted Feb 11, 2025·0 cites·20 claims
- 2758US2010186671A1Arrangement for working substrates by means of plasmaAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 2858US2010089319A1Rf return path for large plasma processing chamberAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 2956US9827578B2Tightly fitted ceramic insulator on large area electrodeAPPLIED MATERIALS INC·Filed 2015·Granted Nov 28, 2017·0 cites·18 claims
- 3056US2025210305A1Spatially tunable inductively coupled plasma antennaLAM RES CORP·Filed 2023·Application pending·0 cites
- 3156US2018277351A1Asymmetrical RF Drive for Electrode of Plasma ChamberAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
- 3255US12312689B2Large-area high-density plasma processing chamber for flat panel displaysAPPLIED MATERIALS INC·Filed 2019·Granted May 27, 2025·0 cites·18 claims
- 3354US8075734B2Remote inductively coupled plasma source for CVD chamber cleaningSORENSEN CARL A·Filed 2008·Granted Dec 13, 2011·0 cites·5 claims
- 3454US2010104771A1Electrode and power coupling scheme for uniform process in a large-area pecvd chamberAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 3554US2010104772A1Electrode and power coupling scheme for uniform process in a large-area pecvd chamberAPPLIED MATERIALS INC·Filed 2009·Application pending·0 cites
- 3653US2009197015A1Method and apparatus for controlling plasma uniformityAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 3753US2013186859A1Asymmetrical RF Drive for Electrode of Plasma ChamberAPPLIED MATERIALS INC A CORP OF THE STATE OF DELAWARE U S A·Filed 2012·Application pending·0 cites
- 3853US2009151636A1Rpsc and rf feedthroughAPPLIED MATERIALS INC·Filed 2008·Application pending·0 cites
- 3952US2013206068A1Linear pecvd apparatusKUDELA JOZEF·Filed 2013·Application pending·0 cites
- 4051US10043638B2Compact configurable modular radio frequency matching network assembly for plasma processing systemsAPPLIED MATERIALS INC·Filed 2015·Granted Aug 7, 2018·0 cites·20 claims
- 4150US2019311886A1Microwave Plasma Source With Split WindowAPPLIED MATERIALS INC·Filed 2019·Application pending·0 cites
- 4248US2008035169A1Cleaning means for large area pecvd devices using a remote plasma sourceOC OERLIKON BALZERS AG·Filed 2006·Application pending·0 cites
- 4346US9324597B2Vertical inline CVD systemKURITA SHINICHI·Filed 2011·Granted Apr 26, 2016·0 cites·20 claims
- 4440US2012326592A1Transmission Line RF Applicator for Plasma ChamberKUDELA JOZEF·Filed 2011·Application pending·0 cites
- 4539US2011192349A1Phase-Modulated RF Power for Plasma Chamber ElectrodeHAMMOND IV EDWARD P·Filed 2011·Application pending·0 cites
- 4637US2017178867A1Gas diffuser having grooved hollow cathodesAPPLIED MATERIALS INC·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →