Inventor · disambiguated record
Tetsuo Yaegashi
Also filed as: YAEGASHI TETSUO
11 granted patents·1 pending application·50 citations·filing 2004–2011
88Inventor score
Top patents by PatentIndex Score
12 records- 0187US7232764B1Semiconductor device fabrication methodFUJITSU LTD·Filed 2006·Granted Jun 19, 2007·14 cites·18 claims
- 0282US7405025B2Reticle and method of fabricating semiconductor deviceFUJITSU LTD·Filed 2005·Granted Jul 29, 2008·6 cites·6 claims
- 0381US7915172B2Semiconductor substrate and method of fabricating semiconductor deviceFUJITSU SEMICONDUCTOR LTD·Filed 2006·Granted Mar 29, 2011·8 cites·8 claims
- 0473US7598522B2Semiconductor substrate and production process thereofFUJITSU MICROELECTRONICS LTD·Filed 2006·Granted Oct 6, 2009·5 cites·6 claims
- 0569US7642103B2Method of fabricating semiconductor deviceFUJITSU MICROELECTRONICS LTD·Filed 2008·Granted Jan 5, 2010·2 cites·8 claims
- 0668US7115994B2Semiconductor substrate and method of fabricating semiconductor deviceFUJITSU LTD·Filed 2004·Granted Oct 3, 2006·11 cites·11 claims
- 0765US8513130B2Semiconductor substrate and method of fabricating semiconductor deviceYAEGASHI TETSUO·Filed 2011·Granted Aug 20, 2013·2 cites·6 claims
- 0861US7652377B2Semiconductor device and manufacturing method of the sameFUJITSU MICROELECTRONICS LTD·Filed 2006·Granted Jan 26, 2010·2 cites·19 claims
- 0949US8581249B2Film thickness monitoring structure for semiconductor substrateYAEGASHI TETSUO·Filed 2009·Granted Nov 12, 2013·0 cites·2 claims
- 1043US7160737B2Method for fabricating semiconductor deviceFUJITSU LTD·Filed 2005·Granted Jan 9, 2007·0 cites·10 claims
- 1142US2007202446A1Semiconductor device fabrication method having step of removing photo-resist film or the like, and photo-resist film removal deviceFUJITSU LTD·Filed 2006·Application pending·0 cites
- 1238US7332357B2Method for fabricating semiconductor deviceFUJITSU LTD·Filed 2005·Granted Feb 19, 2008·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →