Inventor · disambiguated record
Masataka Nunomura
Also filed as: NUNOMURA MASATAKA
11 granted patents·1 pending application·110 citations·filing 1995–2010
90Inventor score
Top patents by PatentIndex Score
12 records- 0175US6232032B1Photosensitive polymer composition, method for forming relief patterns, and electronic partsHITACHI CHEM DUPONT MICROSYS·Filed 1999·Granted May 15, 2001·31 cites·11 claims
- 0274US7851128B2Photosensitive polymer composition, method of forming relief patterns, and electronic equipmentHITACHI CHEM DUPONT MICROSYS·Filed 2006·Granted Dec 14, 2010·3 cites·9 claims
- 0366US6514658B2Photosensitive polymer composition, method for forming relief patterns, and electronic partsHITACHI CHEM DUPONT MICROSYS·Filed 2001·Granted Feb 4, 2003·8 cites·34 claims
- 0463US5856059APhotosensitive resin compositionHITACHI CHEMICAL CO LTD·Filed 1996·Granted Jan 5, 1999·16 cites·28 claims
- 0562US8304149B2Photosensitive polymer composition, method of forming relief patterns, and electronic equipmentNUNOMURA MASATAKA·Filed 2010·Granted Nov 6, 2012·1 cites·16 claims
- 0658US7150947B2Photosensitive polymer composition, method of forming relief patterns, and electronic equipmentHITACHI CHEM DUPONT MICROSYS·Filed 2003·Granted Dec 19, 2006·12 cites·14 claims
- 0758US6329110B1Photosensitive polymer composition, method for forming relief patterns, and electronic partsHITACHI CHEM DUPONT MICROSYS·Filed 1999·Granted Dec 11, 2001·16 cites·21 claims
- 0853US6365306B2Photosensitive polymer composition, method for forming relief patterns, and electronic partsHITACHI CHEM DUPONT MICROSYS·Filed 2001·Granted Apr 2, 2002·3 cites·10 claims
- 0951US5811218APhotoinitiator compositions including amino acids, coumarin and titanocene and photosensitive materials using the sameHITACHI CHEMICAL CO LTD·Filed 1995·Granted Sep 22, 1998·17 cites·4 claims
- 1037US6194126B1Pattern-forming process using photosensitive resin compositionHITACHI CHEMICAL CO LTD·Filed 1998·Granted Feb 27, 2001·3 cites·20 claims
- 1133US7153631B2Pattern-forming process using photosensitive resin compositionHITACHI CHEMICAL CO LTD·Filed 2003·Granted Dec 26, 2006·0 cites·32 claims
- 1232US2002004177A1Photosensitive resin compositionFiled 2000·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →