Assignee
ZOND INC
US·17 granted patents·8 pending applications·976 citations·filing 2002–2016
Top patents by PatentIndex Score
25 records- 0199US7808184B2Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilitiesZOND INC·Filed 2006·Granted Oct 5, 2010·49 cites·20 claims
- 0298US6903511B2Generation of uniformly-distributed plasmaZOND INC·Filed 2003·Granted Jun 7, 2005·265 cites·50 claims
- 0397US6896775B2High-power pulsed magnetically enhanced plasma processingZOND INC·Filed 2002·Granted May 24, 2005·93 cites·37 claims
- 0497US6853142B2Methods and apparatus for generating high-density plasmaZOND INC·Filed 2002·Granted Feb 8, 2005·86 cites·43 claims
- 0597US6806651B1High-density plasma sourceZOND INC·Filed 2003·Granted Oct 19, 2004·84 cites·46 claims
- 0697US6805779B2Plasma generation using multi-step ionizationZOND INC·Filed 2003·Granted Oct 19, 2004·95 cites·46 claims
- 0796US7147759B2High-power pulsed magnetron sputteringZOND INC·Filed 2002·Granted Dec 12, 2006·81 cites·50 claims
- 0896US7095179B2Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilitiesZOND INC·Filed 2004·Granted Aug 22, 2006·46 cites·47 claims
- 0994US7898183B2Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilitiesZOND INC·Filed 2009·Granted Mar 1, 2011·21 cites·26 claims
- 1094US6896773B2High deposition rate sputteringZOND INC·Filed 2002·Granted May 24, 2005·53 cites·40 claims
- 1193US7345429B2Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilitiesZOND INC·Filed 2006·Granted Mar 18, 2008·11 cites·14 claims
- 1293US6806652B1High-density plasma source using excited atomsZOND INC·Filed 2003·Granted Oct 19, 2004·38 cites·35 claims
- 1392US7663319B2Methods and apparatus for generating strongly-ionized plasmas with ionizational instabilitiesZOND INC·Filed 2007·Granted Feb 16, 2010·14 cites·27 claims
- 1489US7811421B2High deposition rate sputteringZOND INC·Filed 2005·Granted Oct 12, 2010·10 cites·48 claims
- 1588US7750575B2High density plasma sourceZOND INC·Filed 2008·Granted Jul 6, 2010·10 cites·19 claims
- 1683US7446479B2High-density plasma sourceZOND INC·Filed 2004·Granted Nov 4, 2008·13 cites·27 claims
- 1769US7604716B2Methods and apparatus for generating high-density plasmaZOND INC·Filed 2004·Granted Oct 20, 2009·7 cites·33 claims
- 1863US2009321249A1Method of Hard Coating a BladeZOND INC·Filed 2009·Application pending·0 cites
- 1961US2007119701A1High-Power Pulsed Magnetron SputteringZOND INC·Filed 2006·Application pending·0 cites
- 2058US2017029936A1High power pulse ionized physical vapor depositionZOND INC·Filed 2016·Application pending·0 cites
- 2156US2017029937A1Method of coating high aspect ratio featuresZOND INC·Filed 2016·Application pending·0 cites
- 2255US2006066248A1Apparatus for generating high current electrical dischargesZOND INC·Filed 2005·Application pending·0 cites
- 2352US2010326815A1High Power Pulse Ionized Physical Vapor DepositionZOND INC·Filed 2010·Application pending·0 cites
- 2450US2010270144A1High Power Pulse Magnetron Sputtering For High Aspect-Ratio Features, Vias, and TrenchesZOND INC·Filed 2010·Application pending·0 cites
- 2546US2005103620A1Plasma source with segmented magnetron cathodeZOND INC·Filed 2004·Application pending·0 cites
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