Assignee
NAGASHIMA MAKOTO
JP·4 granted patents·12 pending applications·8 citations·filing 2004–2013
Top patents by PatentIndex Score
16 records- 0179US8454810B2Dual hexagonal shaped plasma sourceNAGASHIMA MAKOTO·Filed 2006·Granted Jun 4, 2013·3 cites·16 claims
- 0271US8395199B2Systems and methods for fabricating self-aligned memory cellNAGASHIMA MAKOTO·Filed 2006·Granted Mar 12, 2013·4 cites·20 claims
- 0365US8308915B2Systems and methods for magnetron depositionNAGASHIMA MAKOTO·Filed 2006·Granted Nov 13, 2012·1 cites·19 claims
- 0457US2007119705A1Back-biased face target sputtering based memory data sensing techniqueNAGASHIMA MAKOTO·Filed 2006·Application pending·0 cites
- 0557US2007007124A1Back-biased face target sputtering based memory with low oxygen flow rateNAGASHIMA MAKOTO·Filed 2006·Application pending·0 cites
- 0654US2005258027A1Back-biased face target sputtering based programmable logic deviceNAGASHIMA MAKOTO·Filed 2005·Application pending·0 cites
- 0753US8884401B2Systems and methods for fabricating self-aligned memory cellNAGASHIMA MAKOTO·Filed 2013·Granted Nov 11, 2014·0 cites·18 claims
- 0850US2006231384A1Back-biased face target sputteringNAGASHIMA MAKOTO·Filed 2005·Application pending·0 cites
- 0950US2007205096A1Magnetron based wafer processingNAGASHIMA MAKOTO·Filed 2006·Application pending·0 cites
- 1046US2008011603A1Ultra high vacuum deposition of PCMO materialNAGASHIMA MAKOTO·Filed 2006·Application pending·0 cites
- 1146US2006249370A1Back-biased face target sputtering based liquid crystal display deviceNAGASHIMA MAKOTO·Filed 2006·Application pending·0 cites
- 1245US2007131538A1Systems and methods for back-biased face target sputteringNAGASHIMA MAKOTO·Filed 2005·Application pending·0 cites
- 1342US2007084717A1Back-biased face target sputtering based high density non-volatile caching data storageNAGASHIMA MAKOTO·Filed 2006·Application pending·0 cites
- 1440US2006081467A1Systems and methods for magnetron depositionNAGASHIMA MAKOTO·Filed 2004·Application pending·0 cites
- 1540US2007084716A1Back-biased face target sputtering based high density non-volatile data storageNAGASHIMA MAKOTO·Filed 2005·Application pending·0 cites
- 1640US2006081466A1High uniformity 1-D multiple magnet magnetron sourceNAGASHIMA MAKOTO·Filed 2004·Application pending·0 cites
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →