USRE44162EExpiredUtility

Phosphor and phosphor film for electron beam excitation and color display apparatus using the same

54
Assignee: GOTOH MASAHIROPriority: Aug 2, 2004Filed: May 4, 2011Granted: Apr 23, 2013
Est. expiryAug 2, 2024(expired)· nominal 20-yr term from priority
Inventors:Masahiro GotohAkira NagatomiKenji SakaneShuji Yamashita
C09K 11/77348C04B 2235/3873H01J 2329/00C04B 35/6262C04B 2235/3852C04B 35/584C04B 35/581C04B 2235/5436C09K 11/0883C04B 2235/3224H01J 29/20C04B 2235/3865C09K 11/66C09K 11/64H01J 1/62C09K 11/08
54
PatentIndex Score
0
Cited by
103
References
14
Claims

Abstract

To provide a phosphor for an electron beam excitation with a small deterioration in an emission efficiency and capable of maintaining a high luminance, even when an excitation density of an electron beam for a phosphor excitation is increased. As raw materials, Ca 3 N 2 (2N), AlN(3N), Si 3 N 4 (3N), and Eu 2 O 3 (3N) are prepared, and the raw materials thus prepared are measured and mixed, so that a molar ratio of each element becomes (Ca+Eu):Al:Si=1:1:1. Then, the mixture thus obtained is maintained and fired for at 1500° C. for 3 hours, and thereafter crushed, to manufacture the phosphor having a composition formula Ca 0.985 SiAlN 3 :Eu 0.015 .

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
       1. A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein element M is at least one or more kind of element having bivalent valency, element A is at least one or more kind of element having tervalent valency, element B is at least one or more kind of element having tetravalent valency, O is oxygen, N is nitrogen, element Z is the element acting as an activator in the phosphor, satisfying o≧0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a film thickness is 65 μm or less. 
     
     
       2. A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein the element M is at least one or more kind of element selected from the group consisting of Mg, Ca, Sr, Ba, and Zn, the element A is at least one or more kind of element selected from the group consisting of B (boron), Al and Ga, the element B is Si and/or Ge, and the element Z is at least one or more kind of element selected from rare earth elements or transitional metal elements, satisfying o≧0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a film thickness is 65 μm or less. 
     
     
       3. A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a general formula CaAlSiN 3 :Eu, wherein a film thickness is 65 μm or less. 
     
     
       4. A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein element M is at least one or more kind of element having bivalent valency, element A is at least one or more kind of element having tervalent valency, element B is at least one or more kind of element having tetravalent valency, O is oxygen, N is nitrogen, element Z is the element acting as an activator in the phosphor, satisfying o≧0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a phosphor coating amount is 7.0 mg/cm 2  or less per unit area. 
     
     
       5. A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein the element M is at least one or more kind of element selected from the group consisting of Mg, Ca, Sr, Ba, and Zn, the element A is at least one or more kind of element selected from the group consisting of B (boron), Al and Ga, the element B is Si and/or Ge, and the element Z is at least one or more kind of element selected from rare earth elements or transitional metal elements, satisfying o≧0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a phosphor coating amount is 7.0 mg/cm 2  or less per unit area. 
     
     
       6. A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a general formula CaAlSiN 3 :Eu, wherein a phosphor coating amount is 7.0 mg/cm 2  or less per unit area. 
     
     
       7. A color display apparatus, using the phosphor film according to  claim 1 . 
     
     
       8. A color display apparatus, using the phosphor film according to  claim 4 . 
     
     
       9. A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein element M is at least one or more kind of element having bivalent valency, element A is at least one or more kind of element having tervalent valency, element B is at least one or more kind of element having tetravalent valency, O is oxygen, N is nitrogen, element Z is the element acting as an activator in the phosphor, satisfying o>0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a film thickness is 65 μm or less. 
     
     
       10. A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein the element M is at least one or more kind of element selected from the group consisting of Mg, Ca, Sr, Ba, and Zn, the element A is at least one or more kind of element selected from the group consisting of B (boron), Al and Ga, the element B is Si and/or Ge, and the element Z is at least one or more kind of element selected from rare earth elements or transitional metal elements, satisfying o>0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a film thickness is 65 μm or less. 
     
     
       11. A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein element M is at least one or more kind of element having bivalent valency, element A is at least one or more kind of element having tervalent valency, element B is at least one or more kind of element having tetravalent valency, O is oxygen, N is nitrogen, element Z is the element acting as an activator in the phosphor, satisfying o>0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a phosphor coating amount is 7.0 mg/cm 2  or less per unit area. 
     
     
       12. A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein the element M is at least one or more kind of element selected from the group consisting of Mg, Ca, Sr, Ba, and Zn, the element A is at least one or more kind of element selected from the group consisting of B (boron), Al and Ga, the element B is Si and/or Ge, and the element Z is at least one or more kind of element selected from rare earth elements or transitional metal elements, satisfying o>0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a phosphor coating amount is 7.0 mg/cm 2  or less per unit area. 
     
     
       13. A color display apparatus, using the phosphor film according to claim 9. 
     
     
       14. A color display apparatus, using the phosphor film according to claim 11.

Join the waitlist — get patent alerts

Track USRE44162E — get alerts on status changes and closely related new filings.

We store only your email — no account needed. See our privacy policy.