Projection exposure apparatus

Abstract

Constant speed drive of a reticle and a wafer in a relative scanning direction and positioning of the reticle and the wafer are simultaneously performed with high precision by a slit scanning exposure scheme. A reticle side scanning stage for scanning a reticle relative to a slit-like illumination area in the relative scanning direction is placed on a reticle side base. A reticle side fine adjustment stage for moving and rotating the reticle within a two-dimensional plane is placed on the reticle side scanning stage. The reticle is placed on the reticle side fine adjustment stage. Constant speed drive and positioning of the reticle and a wafer are performed by independently controlling the reticle side scanning stage and the reticle side fine adjustment stage.

1. An exposure apparatus for radiating exposure light on a predetermined illumination area on a mask on which a pattern to be transferred is formed, and exposing the pattern on a photosensitive substrate, comprising:
 a scanning system for synchronously scanning the mask and the photosensitive substrate in a predetermined first direction of the illumination area while maintaining a predetermined speed ratio; and  
 an illumination condition setting portion for setting the illumination area to be rectangular, and letting a light intensity distribution of the illumination area in a second direction substantially perpendicular to the first direction have a trapezoidal shape so that a middle portion of the distribution exhibits a substantially constant light intensity, and two side portions of the distribution exhibit a gradually decreasing light intensity.  
 
     
     
       2. An apparatus according to  claim 1 , wherein said scanning system scans the mask and the photosensitive substrate at least twice in the first direction, and further comprising a substrate moving system for moving the photosensitive substrate in the second direction while first and second scanning operations with respect to the mask and the photosensitive substrate are performed by said scanning system. 
     
     
       3. A apparatus according to  claim 2 , further comprising a mask moving system for moving the mask in the second direction while first and second scanning operations with respect to the mask and the photosensitive substrate are performed by said scanning system. 
     
     
       4. A apparatus according to  claim 2 , further comprising:
 storage portion for storing a relative positional difference between the mask and the photosensitive substrate when the mask and the photosensitive substrate are to be synchronously scanned in the first direction; and  
 a controller for controlling a position of at least of one of the mask and the photosensitive substrate such that the relative positional difference in the first scanning operation with respect to the mask and the photosensitive substrate coincides with that in the second scanning operation.  
 
     
     
       5. An apparatus according to  claim 2  wherein said illumination condition setting portion determines a length M of each of the side portions, of the illumination area, in which the light intensity gradually decreases, in the second direction so as to establish.
   M=(n·LP−LT)/(n+1)  
 
       where n is an integer of not less than one, LP is a length of an illumination area on the mask in the second direction, and LT is a width of a pattern area, formed on the mask, in the second direction. 
     
     
       6. An apparatus according to  claim 5 , further comprising a projection optical system for projecting an image of a pattern of the mask, irradiated with the exposure light, onto the photosensitive substrate at a projecting magnification β, and wherein a moving amount of the photosensitive substrate moved by said substrate moving system in the second direction is defined as
   n·(LP−M)/β 
 
     
     
       7. A projection exposure apparatus comprising:
 a pulse light source for pulse-emitting exposure light;  
 an illumination optical system for illuminating a predetermined illumination area on a mask, on which a pattern to be transferred is formed, with the exposure light;  
 a projection optical system for projecting an image of the pattern, irradiated with the exposure light, onto a photosensitive substrate;  
 a scanning system for synchronously scanning the mask and the photosensitive substrate at least twice in a predetermined first direction of the illumination area while maintaining a predetermined speed ratio;  
 a substrate moving system for moving the photosensitive substrate in a second direction substantially perpendicular to the first direction while first and second scanning operations with respect to the mask and the photosensitive substrate are performed by said scanning system; and  
 a controller for controlling at least one of said pulse light source and said scanning system such that a position of the photosensitive substrate in the first direction at the time when said pulse light source performs pulse emission in the first scanning operation with respect to the photosensitive substrate and the mask coincides with that in the second scanning operation.  
 
     
     
       8. An apparatus according to  claim 7 , wherein said controller includes a position storage portion for detecting a position of the photosensitive substrate in the first direction when said pulse light source performs pulse emission, and storing data indicating the position, and controls one of said pulse light source and said synchronous scanning means on the basis of the stored data indicating the position of the photosensitive substrate. 
     
     
       9. A scanning exposure apparatus comprising:
 a projection optical system for projecting a pattern image of a mask onto a photosensitive substrate; 
 a scanning system for synchronously scanning a the mask and a the photosensitive substrate for scanning exposure; and , wherein said scanning system includes a mask stage for scanning the mask in a direction perpendicular to an optical axis of said projection optical system and a substrate stage for scanning the substrate in the direction perpendicular to the optical axis, and causes the mask stage and the substrate stage to scan at a speed ratio corresponding to a projecting magnification of said projection optical system; and  
   a first measuring system for measuring a position of the mask within a plane perpendicular to said optical axis, wherein said first measuring system includes a rotational angle detecting device for detecting a rotational angle of the mask within the plane perpendicular to said optical axis;    
   a second measuring system for measuring a position of the substrate within a plane perpendicular to said optical axis; and   
 an adjusting system for moving the mask to decrease a positional deviation between the mask and the substrate, independently of scanning of the mask which is performed by said scanning system, during the scanning exposure, wherein said adjusting system includes a finely movable stage for relatively moving the mask on said mask stage, a driving member for finely driving said finely movable stage in the direction perpendicular to said optical axis, and a controller for controlling the driving member in accordance with signals from said first and second measuring systems. 
 
     
     
       10. An apparatus according to  claim 9 , further comprising:
 a projection optical system for projecting a pattern image of the mask onto the substrate; and wherein    said scanning system includes a mask stage for scanning the mask in a direction perpendicular to an optical axis of said projection optical system and a substrate stage for scanning the substrate in the direction perpendicular to the optical axis, and causes the mask stage and the substrate stage to scan at a speed ratio corresponding to a projecting magnification of said projection optical system.    
     
     
       11. An apparatus according to  claim 10 , wherein
 said adjusting system includes a finely movable stage for relatively moving the mask on said mask stage and a driving member for finely driving said finely movable stage in the direction perpendicular to said optical axis.    
     
     
       12. An apparatus according to  claim 11 , further comprising: p 1  a first measuring system for measuring a position of the mask within a plane perpendicular to said optical axis; and
 a second measuring system for measuring a position of the substrate within a plane perpendicular to said optical axis, and wherein    said adjusting system includes a controller for controlling the driving member in accordance with signals from said first and second measuring systems.    
     
     
       13. A apparatus according to  claim 12 , wherein
 said first measuring system includes a rotational angle detecting device for detecting a rotational angle of the mask within the plane perpendicular to said optical axis.    
     
     
       14. An apparatus according to claim  13   9 , wherein
 said finely movable stage includes a mirror having a reflecting surface substantially perpendicular to said plane, and  
 said first measuring system includes an interferometer for radiating a light beam onto said reflecting surface and receiving the light beam reflected by said reflecting surface.  
 
     
     
       15. A scanning exposure apparatus for projecting a pattern image of a mask onto a sensitive plate through a projection optical system in a scanning manner, the exposure apparatus comprising:
 (a) a plate stage for scanning the plate in at least one-dimensional direction under said projection optical system for the scanning exposure;  
 (b) a first mask stage for scanning the mask in at least said one-dimensional direction above said projection optical system for the scanning exposure;  
 (c) a second mask stage for finely moving the mask on said first mask stage in each of translational and rotational directions;  
 (d) a first driving system for synchronously driving said plate stage and said first mask stage with a predetermined velocity ratio for the scanning exposure, wherein said first driving system includes a mask driving unit for moving the first mask stage and a plate driving unit for moving said plate stage;  
 (e) a detecting system for detecting a positional deviation amount between the mask and the plate in a real time manner during the scanning exposure; and  
 (f) a second driving system for driving said second mask stage to decrease the detected deviation amount during the scanning exposure, while said plate stage and said first mask stage are moved by said first driving system.  
 
     
     
       16. The scanning exposure apparatus according to  claim 15 , wherein said detecting system includes a first measuring unit to detect a relative translational deviation amount between the mask and the plate and a second measuring unit to detect a relative rotational deviation amount between the mask and the plate. 
     
     
       17. The scanning exposure apparatus according to  claim 16 , wherein said second drive system includes a first actuator unit for finely moving said second mask stage in said one-dimensional scanning direction and in a cross direction of said scanning direction based on said translational deviation amount. 
     
     
       18. The scanning exposure apparatus according to  claim 16 , wherein, said second drive system includes a second actuator unit for finely rotating said second mask stage about a predetermined point on the mask based on said rotational deviation amount. 
     
     
       19. The scanning exposure apparatus according to  claim 18 , wherein said predetermined point on the mask is changed in said one-dimensional scanning direction according to the scanning position of the mask. 
     
     
       20. The scanning exposure apparatus according to  claim 16 , wherein said first and second measuring units include a mask side interferometer system for measuring a coordinate position and a rotational angle of the mask and a plate side interferometer system for measuring a coordinate position and a rotational angle of the plate. 
     
     
       21. The scanning exposure apparatus according to  claim 15 , wherein each of said plate stage and said first mask stage is linearly movable in said one-dimensional scanning direction by restraining of respective linear air-guide structures. 
     
     
       22. The scanning exposure apparatus according to  claim 21 , wherein said first driving system includes a mask side linear motor for driving said first mask stage guide by the corresponding linear air-guide structure and a plate side linear motor for driving said plate stage guided by the corresponding linear air-guide structure. 
     
     
       23. A scanning exposure apparatus for projecting a pattern image of a mask onto a sensitive plate through a projection optical system in a scanning manner, the exposure apparatus comprising:
 (a) a plate stage for moving the plate in at least one-dimensional direction under said projection optical system which has an imaging reduction ratio 1/β;  
 (b) a first mask stage for moving the mask in at least said one-dimensional direction above said projection optical system;  
 (c) a second mask stage for finely moving the mask on said first mask stage in each of translational and rotational directions;  
 (d) an illuminating system for irradiating the mask with a radiation having a slit shaped distribution elongated perpendicular to said one-dimensional direction and the mask in order to project a slit shaped partial pattern image of the mask onto the plate through said projection optical system;  
 (e) a first driving system for synchronously, relatively driving said plate stage and first mask stage with a velocity ratio B for the scanning exposure of the plate by said slit shaped partial pattern image of the mask;  
 (f) a detecting system for detecting a deviation amount from an ideal positional relation of the mask and the plate occurring at a term of the scanning exposure; and  
 (g) a second driving system for driving said second mask stage to correct the deviation during the scanning exposure when said detected deviation amount is out of a predetermined tolerance.  
 
     
     
       24. The scanning exposure apparatus according to  claim 23 , wherein said detecting system includes a first measuring system to detect a translational deviation amount from said ideal positional relation of the mask and the plate and a second measuring system to detect a rotational deviation amount from said ideal positional relation of the mask and the plate. 
     
     
       25. The scanning exposure apparatus according to  claim 24 , wherein said second drive system includes a first actuator system for finely moving said second mask stage in said one-dimensional scanning direction and a cross direction thereof based on said translational deviation amount. 
     
     
       26. The scanning exposure apparatus according to claim  24 , wherein said second drive system includes a second actuator system for finely rotating said second mask stage about a predetermined point on the mask based on said rotational deviation amount. 
     
     
       27. The scanning exposure apparatus according to  claim 26 , wherein said predetermined point on the mask is changed in said one-dimensional scanning direction according to the scanning position of the mask. 
     
     
       28. The scanning exposure apparatus according to  claim 23 , wherein said first driving system includes a mask side linear motor for driving said first mask stage supported by an air-guide structure and a plate side linear motor for driving said plate stage supported by an air-guide structure. 
     
     
       29. A scanning exposure apparatus for projecting a pattern image of a mask onto a sensitive plate through a projection system having a predetermined magnification ratio in a scanning manner, the apparatus comprising:
 (a) a scanning system for synchronously, relatively scanning the mask and the plate with respect to a projection field of said projection system at a velocity ratio corresponding to said magnification ratio during the scanning exposure, wherein the scanning system includes a mask driving unit and a plate driving unit, said wherein the mask and the plate are moved synchronously using the mask driving unit and the plate driving unit during the scanning exposure;  
 (b) a finely movable stage provided on said scanning system for finely moving the mask relative to said scanning system in each of translational and rotational directions;  
 (c) a detecting system for detecting a positional deviation amount between an ideal positional relation and an actual positional relation of the mask and the plate during the scanning exposure, wherein said detecting system includes a first interferometer system to measure positional information of the mask and a second interferometer system to measure positional information of the plate, and wherein said finely movable stage has a reflection surface, and said first interferometer system measures the positional information of the mask by applying a measuring beam to the reflection surface; and  
 (d) a control system for driving said finely movable stage based on said detected deviation amount in order to decrease the positional deviation of the mask and the plate.  
 
     
     
       30. A scanning exposure method in which a pattern area of a mask is transferred onto a sensitive plate through a projection optical system in a scanning manner, the method comprising the steps of :
 (a) irradiating the mask with a radiation having a slit shaped intensity distribution in order to project a slit image portion of said pattern area of the mask toward the plate through said projection optical system;  
 (b) synchrouously scanning each of the mask and the plate relative to said projection optical system in a scanning directional perpendicular to a longitudinal direction of said slit image portion at a predetermined velocity ratio by using a scanning mechanism for the scanning exposure, wherein the scanning mechanism includes a mask driving unit for moving the mask and a plate driving unit for moving the plate;  
 (c) detecting a deviation value between an ideal positional relation and an actual positional relation of the mask and the plate at a term of the scanning exposure by using a first measuring system to measure positional information of the mask and a second measuring system to measure positional information of the plate; and  
 (d) correcting a position of the mask determined by said scanning mechanism so as to decrease said detected deviation value by using a fine moving mechanism provided on said scanning mechanism at the term of the scanning exposure.  
 
     
     
       31. The scanning exposure method according to  claim 30 , wherein said detecting step includes detecting a relative rotational deviation between the mask and the plate and said fine moving mechanism finely rotates the mask to decrease said rotational deviation. 
     
     
       32. The scanning exposure method according to  claim 31 , wherein said relative rotational deviation is detected by using a mask side interferometer system and a plate side interferometer system. 
     
     
       33. A scanning exposure method in which a pattern area of a mask is transferred onto a sensitive plate through a projection system in a scanning manner, the method comprising the steps of :
 (a) irradiating the mask with a radiation in order to project an image portion of said pattern area of the mask onto the plate through said projection system;  
 (b) synchronously scanning each of the mask and the plate relative to said projection system in a scanning direction at a predetermined velocity ratio by using a scanning mechanism for the scanning exposure, wherein the scanning mechanism includes a mask driving unit for moving the mask and a plate driving unit for moving the plate, and wherein the mask and the plate are moved in accordance with an imaging reduction ratio of the projection system;  
 (c) detecting a deviation between the ideal positional relation and an actual positional relation of the mask and the plate at a term of the scanning exposure by using a first measuring system to measure positional information of the mask and a second measuring system to measure positional information of the plate; and  
 (d) correcting a position of the mask determined by said scanning mechanism for decreasing said detected deviation by using a fine moving mechanism provided on said scanning mechanism at the term of the scanning exposure.  
 
     
     
       34. A scanning exposure apparatus for projecting a pattern image of a mask onto a sensitive plate through a projection system in a scanning matter, the exposure apparatus comprising:
 (a) a plate stage for moving the plate under said projection system in an X direction for the scanning exposure and in a Y direction perpendicular to the X direction;  
 (b) a first mask stage for moving the mask in the X direction for the scanning exposure above said projection system;  
 (c) a second mask stage for finely moving the mask on said first mask stage in each of translational and rotational directions;  
 (d) first driving means for synchronously driving each of said plate stage and said first mask stage with a pre-determined velocity ratio in the X direction during the scanning exposure; and  
 (e) second driving means for driving said plate stage and said second mask stage to maintain a translational relation of the mask and plate in the Y direction and for driving said second mask stage to maintain a relative rotational relation of the mask and the plate, during the scanning exposure.  
 
     
     
       35. A scanning exposure apparatus for projecting a pattern image of a mask onto a sensitive plate through a projection system having a predetermined magnification ratio in a scanning manner, the apparatus comprising:
 ( a )  a scanning system which has a first driving system to move the mask and a second driving system to move the plate and which synchronously scans the mask and the plate with respect to a projection field of said projection system at a velocity ratio corresponding to said magnification ratio during a scanning exposure;      ( b )  a finely movable stage, connected to said scanning system, which moves the mask relative to said scanning system;      ( c )  a detector which detects a positional deviation amount between the mask and the plate during the scanning exposure; and      ( d )  a control system, connected to said finely movable stage and said detector, which drives said finely movable stage based on said detected deviation amount during the scanning exposure.     
     
     
       36. A scanning exposure method in which a pattern of a mask is transferred onto a sensitive plate through a projection system in a scanning manner, the method comprising:
 ( a )  irradiating the mask with a radiation in order to project an image of said pattern of the mask onto the plate through said projection system;      ( b )  synchronously scanning each of the mask and the plate relative to said projection system by using a scanning mechanism for a scanning exposure, wherein the scanning mechanism includes a mask driving unit for moving the mask and a plate driving unit for moving the plate, and wherein a scanning velocity of the mask is different from a scanning velocity of the plate;      ( c )  detecting a positional deviation amount between the mask and the plate at a term of the scanning exposure by using a first interferometer to measure positional information of the mask and a second interferometer to measure positional information of the plate; and      ( d )  correcting a position of the mask determined by said scanning mechanism for decreasing said detected deviation using a fine moving mechanism at the term of the scanning exposure.     
     
     
       37. A scanning exposure apparatus in which a first object is moved in a first direction and a second object is moved in a second direction for scanning exposure, the apparatus comprising:
   a projection system for the scanning exposure, which is disposed in an optical path of an exposure beam, the first object being provided on one side of the projection system and the second object being provided on the other side of the projection system;        a first driving system which moves the first object in the first direction, at least a part of the first driving system being on one side of the projection system;        a second driving system which moves the first object in a plane substantially parallel to the surface of the first object while the first object is moved by the first driving system, at least a part of the second driving system being on the one side of the projection system;        a third driving system which moves the second object in the second direction, at least a part of the third driving system being on the other side of the projection system;        a first movable member which is movable in the first direction; and        a second movable member which is movable relative to the first movable member and which holds the first object,        wherein the first object held by the second movable member is moved in the first direction by moving the first movable member using the first driving system, and the first object is moved relative to the first movable member by moving the second movable member using the second driving system, and        wherein the first object and the second object are synchronously moved by the first driving system and the third driving system.      
     
     
       38. An apparatus according to  claim 37 , wherein the first object includes a mask having a pattern area, and the second object includes a work- piece on which a pattern of the mask is transferred.   
     
     
       39. An apparatus according to  claim 38 , wherein said second driving system rotates said first object. 
     
     
       40. An apparatus according to  claim 37 , wherein said first driving system includes a linear motor. 
     
     
       41. An apparatus according to  claim 40 , wherein said third driving system includes a linear motor. 
     
     
       42. An apparatus according to  claim 37 , further comprising:
   a detecting system which detects a relative relationship between the first object and the second object, wherein the second driving system moves the second movable member based on the detected relationship.     
     
     
       43. An apparatus according to  claim 42 , wherein said detecting system includes an interferometer. 
     
     
       44. An apparatus according to  claim 37 , wherein at least a part of said second driving system is provided on said first movable member. 
     
     
       45. An apparatus according to  claim 37 , further comprising:
   a reflective surface disposed on the second movable member; and        an interferometer, optically connected to the reflective surface, which is used for detecting positional information of the first object.     
     
     
       46. An apparatus according to  claim 37 , wherein the second driving system moves the second movable member without a weight of the first movable member. 
     
     
       47. An apparatus according to  claim 37 , wherein the exposure beam irradiated onto said first object defines a rectangular illumination area on said first object, said first direction and said second direction are parallel and reverse to one another, said projection system has a reduction magnification, and a scanning speed of said first object is different from a scanning speed of said second object. 
     
     
       48. An apparatus according to  claim 37 , wherein said projection system includes a reflective and refractive optical system. 
     
     
       49. An apparatus according to  claim 38 , wherein said second driving system moves said mask before the pattern area of said mask begins to be illuminated with the exposure beam. 
     
     
       50. An apparatus according to  claim 37 , wherein:
   the second driving system operates to correct a positional relationship between the first object and the second object during a synchronous movement of the first object and the second object.     
     
     
       51. An apparatus according to  claim 39 , wherein during movement of said mask by said first driving system, said second driving system rotates said mask about a rotation axis passing through a predetermined point in an illumination region of said exposure beam irradiated to said mask. 
     
     
       52. An apparatus according to  claim 37 , further comprising:
   a first measuring device which detects positional information of the first object; and        a second measuring device which detects positional information of the second object; and        wherein the second driving system moves the second movable member based on the positional information detected by the first and second measuring devices.     
     
     
       53. An apparatus according to  claim 52 , wherein:
   said first measuring device includes a first interferometer system, and said second measuring device includes a second interferometer system.     
     
     
       54. An apparatus according to  claim 37 , further comprising:
   a fourth driving system which moves said second object in a plane which is substantially parallel to a surface of the second object and in a direction crossing said second direction, at least a part of the fourth driving system being disposed on the other side of the projection system.     
     
     
       55. A scanning exposure method in which a first object is moved in a first direction and a second object is moved in a second direction for a scanning exposure, the method comprising:
   moving a first object in the first direction by using a first driving system;        shifting the first object in a plane substantially parallel to a surface of the first object by using a second driving system while the first object is moved by the first driving system, wherein the first driving system moves a first movable member, the second driving system shifts a second movable member, which supports the first object, relative to the first movable member, and wherein the first object is moved in the first direction by moving the first movable member using the first driving system and is shifted by shifting the second movable member using the second driving system; and        moving a second object in the second direction by using a third driving system,        wherein the first object and the second object are synchronously moved by the first driving system and the third driving system.      
     
     
       56. A method according to  claim 55 , wherein the first object includes a mask having a pattern area, and the second object includes a work- piece on which a pattern of the mask is transferred.   
     
     
       57. A method according to  claim 56 , wherein said second driving system rotates said first object. 
     
     
       58. A method according to  claim 55 , wherein said first driving system includes a linear motor. 
     
     
       59. A method according to  claim 58 , wherein said third driving system includes a linear motor. 
     
     
       60. A method according to  claim 55 , further comprising:
   detecting a relative relationship between the first object and the second object.     
     
     
       61. A method according to  claim 60 , wherein said relative relationship is detected by an interferometer system including a first interferometer unit and a second interferometer unit which detect positional information of the first and second objects respectively. 
     
     
       62. A method according to  claim 55 , wherein at least a part of said second driving system is provided on said first movable member. 
     
     
       63. A method according to  claim 55 , wherein the second driving system shifts the first object without a weight of the first movable member. 
     
     
       64. A method according to  claim 55 , wherein an exposure beam irradiated onto said first object defines a rectangular illumination area on said first object, said first direction and said second direction are parallel and reverse to one another, a projection system for the scanning exposure has a reduction magnification, and a scanning speed of said first object is different from a scanning speed of said second object. 
     
     
       65. A method according to  claim 56 , wherein said second driving system shifts said mask before the pattern area of said mask begins to be illuminated with an exposure beam. 
     
     
       66. A method according to  claim 55 , wherein:
   the second driving system operates to correct a positional relationship between the first object and the second object during a synchronous movement of the first object and the second object.     
     
     
       67. A method of manufacturing a circuitry element with use of the method as defined in  claim 55 , wherein the circuitry element is formed on a substrate by projecting a pattern of a mask onto the substrate during the scanning exposure, the substrate is one of the first and second objects, and the mask is the other of the first and second objects. 
     
     
       68. A method according to  claim 57 , wherein during movement of said mask by said first driving system, said second driving system rotates said mask about a rotation axis passing through a predetermined point in an illumination region of an exposure beam irradiated to said mask. 
     
     
       69. A method according to  claim 55 , wherein said first driving system is capable of moving said first object by a longer distance than that moved by said second driving system. 
     
     
       70. A method according to  claim 55 , wherein during movement of said first object by said first driving system, at least a portion of said second driving system moves in said first direction in order to shift said first object. 
     
     
       71. A method according to  claim 60 , wherein said second driving system moves the first object based on the detected relative relationship. 
     
     
       72. A method according to  claim 55 , further comprising:
   measuring positional information of the first object; and        measuring positional information of the second object,        wherein said positional information of the first object includes positional information of said first object in a direction which crosses said first direction,        said positional information of the second object includes positional information of said second object in a direction which crosses said second direction, and        wherein said second driving system shifts the second movable member based on the measured positional information of the first and second objects.     
     
     
       73. A method according to  claim 55 , further comprising:
   measuring positional information of the first object; and        measuring positional information of the second object,        wherein said positional information of the first object includes information on rotation of the first object;        said positional information of the second object includes information on rotation of the second object, and        wherein said second driving system shifts the second movable member based on the measured positional information of the first and second objects.     
     
     
       74. A method according to  claim 55 , wherein during the scanning exposure, speed of said first object is controlled by using said first driving system and position of said first object is controlled by using said second driving system. 
     
     
       75. A method for making a scanning exposure apparatus in which a first object is moved in a first direction and a second object is moved in a second direction for a scanning exposure, the method comprising:
   providing a projection system for the scanning exposure, which is disposed in an optical path of an exposure beam, the first object being provided on one side of the projection system and the second object being provided on the other side of the projection system;        providing a first driving system which moves the first object in the first direction, at least a part of the first driving system being on the one side of the projection system;        providing a second driving system which moves the first object in a plane substantially parallel to a surface of the first object while the first object is moved by the first driving system, at least a part of the second driving system being on the one side of the projection system;        providing a third driving system which moves the second object in the second direction, at least a part of the third driving system being on the other side of the projection system;        providing a first movable member which is movable in the first direction; and        providing a second movable member which is movable relative to the first movable member and which holds the first object;        wherein the first object held by the second movable member is moved in the first direction by moving the first movable member using the first driving system, and the first object is moved relative to the first movable member by moving the second movable member using the second driving system, and        wherein the first object and the second object are synchronously moved by the first driving system and the third driving system.     
     
     
       76. A method according to  claim 75 , wherein the first object includes a mask having a pattern area, and the second object includes a work- piece on which a pattern of the mask is transferred.   
     
     
       77. A method according to  claim 76 , wherein said second driving system rotates said first object. 
     
     
       78. A method according to  claim 75 , wherein said first driving system includes a linear motor. 
     
     
       79. A method according to  claim 78 , wherein said third driving system includes a linear motor. 
     
     
       80. A method according to  claim 75 , further comprising:
   providing a detecting system which detects a relative relationship between the first object and the second object, wherein the second driving system moves the second movable member based on the detected relationship.     
     
     
       81. A method according to  claim 80 , wherein said detecting system includes an interferometer. 
     
     
       82. A method according to  claim 75 , wherein at least a part of said second driving system is provided on said first movable member. 
     
     
       83. A method according to  claim 75 , further comprising:
   providing a reflective surface disposed on the second movable member; and        providing an interferometer, optically connected to the reflective surface, which is used for detecting positional information of the first object.     
     
     
       84. A method according to  claim 75 , wherein the second driving system moves the second movable member without a weight of the first movable member. 
     
     
       85. A method according to  claim 75 , wherein the exposure beam irradiated onto said first object defines a rectangular illumination area on said first object, said first direction and said second direction are parallel and reverse to one another, said projection system has a reduction magnification, and a scanning speed of said first object is different from a scanning speed of said second object. 
     
     
       86. A method according to  claim 75 , wherein said projection system includes a reflective and refractive optical system. 
     
     
       87. A method according to  claim 76 , wherein said second driving system moves said mask before the pattern area of said mark begins to be illuminated with the exposure beam. 
     
     
       88. A method according to  claim 75 , wherein:
   the second driving system operates to correct a positional relationship between the first object and the second object during a synchronous movement of the first object and the second object.     
     
     
       89. A method of manufacturing a circuitry element with use of a scanning exposure apparatus made by the method as defined in  claim 75 . 
     
     
       90. A method according to  claim 77 , wherein during movement of said mask by said first driving system, said second driving system rotates said mask about a rotation axis passing through a predetermined point in an illumination region of said exposure beam irradiated onto said mask. 
     
     
       91. A method according to  claim 75 , further comprising:
   providing a fourth driving system which moves said second object in a plane which is substantially parallel to a surface of the second object and in a direction which crosses said second direction, at least a part of the fourth driving system being disposed on the other side of the projection system.     
     
     
       92. A method according to  claim 75 , further comprising:
   providing a first measuring device which detects positional information of the first object; and        providing a second measuring device which detects positional information of the second object; and        wherein the second driving system moves the second movable member based on the positional information detected by the first and second measuring devices.     
     
     
       93. A method according to  claim 92 , wherein
   said first measuring device includes a first interferometer system, and said second measuring device includes a second interferometer system.