Non-stick photoresist laminate

Abstract

A photoresist laminate includes a substrate (such as PET film having a thickness of between about 0.002-0.003 inches) with first and second faces, a first film layer, and a second layer. The first film layer is a photoresist material (radiation sensitive) which is soluble or dispersible in water but which will harden upon sufficient exposure to radiation so as to become substantially insoluble or non-dispersible. The first film layer may be of any conventional photoresist material (e.g. having a thickness of about 0.002-0.009 inches) and is operatively disposed on the substrate first face (either directly connecting it or connected to a membrane support layer which in turn is directly connected to the substrate first face). The second layer is of a material and thickness so that it substantially prevents sticking of the first film layer to other surfaces, while not significantly interfering with the radiation sensitivity thereof. The second layer is on the opposite side of the first film layer from the substrate, and may comprise a mixture of polyvinyl alcohol solution and polyvinyl acetate emulsion, having a thickness of less than 0.0005 inches (e.g. about 0.0001-0.0002 inches). The laminate is used in a method of making a stencil for abrading or etching by exposing the laminate to radiation, processing a laminate by spraying water on the laminate to remove the soluble or dispersible portion, and then using the stencil so formed as a mask on the surface of an object to etch or abrade the surface.

What is claimed is:  
     
       1. A photoresist laminate comprising: 
       a substrate having first and second faces;  
       a first film layer of radiation sensitive material which is soluble or dispersible in water but will harden upon sufficient exposure to radiation so a to become substantially insoluble or non-dispersible, and operatively disposed on said substrate first face;  
       a second layer of a material and thickness so that it substantially prevents or minimizes sticking of said first film layer to other photoresist laminates while not significantly interfering with the radiation sensitivity thereof;  
       said second layer on the opposite side of said first film layer from said substrate;  
       a membrane support layer between and adhering to said substrate and said first film layer and engaging both said substrate and said first film layer; and  
       wherein said first film layer has a thickness of about 0.002-0.009 inches, said substrate has a thickness of about 0.002-0.003 inches, and said second layer has a thickness of about 0.0001-0.0002  0.0005 inches.  
     
     
       2. A photoresist laminate as recited in  claim 1  wherein said second layer comprises a mixture of about 80-98% by weight polyvinyl alcohol solution and about 20-2% by weight polyvinyl acetate emulsion. 
     
     
       3. A photoresist laminate as recited in  claim 1  wherein said laminate is in sheet form, and stacked with other substantially identical laminates so that said second layer of one sheet engages said second face of said substrate of another sheet. 
     
     
       4. A photoresist laminate as recited in  claim 1  wherein said first film layer comprises two clearly different color portions one atop the other.