Hermetically sealed electronic component

Abstract

A ceramic substrate supports a thin or thick film electronic circuit hermetically enclosed by a vitreous glass covering sealed to the ceramic substrate by a heat fused vitreous sealing glass. The vitreous sealing glass is screened onto the vitreous glass covering in a composition comprising a binder material and a liquifier. The electronic circuit is trimmed by a laser beam directed through the vitreous glass covering as one of the final process steps after completion of those process steps which tend to affect the resistivity of the resistive element; process steps such as high temperature baking and soldering of component parts.

What is claimed is: 
     
       1. A hermetically sealed device comprising: a substrate providing a base for supporting electronic circuitry thereon;   electronic circuitry disposed on said substrate; and   a vitreous glass covering disposed over and hermetically sealing said electronic circuitry with said vitreous glass covering sealed onto said substrate, wherein said vitreous glass covering has a sealing temperature below about 380° C. .Iadd.at pressures above about 100 psi.Iaddend..   
     
     
       2. The invention as claimed in claim 1 wherein said vitreous glass covering has a sealing temperature between about 370° C. and 375° C. 
     
     
       3. A hermetically sealed device comprising: a substrate providing a base for supporting electronic circuitry thereon;   electronic circuitry disposed on said substrate; and   a vitreous glass covering disposed over and hermetically sealing said electronic circuitry with said vitreous glass covering sealed onto said substrate, wherein the coefficient of thermal expansion between said substrate and said vitreous glass covering is within about two millionths (2×10 -6 )°C. .Iadd.wherein said vitreous glass covering has a sealing temperature below about 380° C. at a pressure above about 100 psi.Iaddend..   
     
     
       4. A hermetically sealed device comprising: a substrate providing a base for supporting electronic circuitry thereon;   electronic circuitry disposed on said substrate; and   a vitreous glass covering disposed over and hermetically sealing said electronic circuitry with said vitreous glass covering sealed onto said substrate, wherein said vitreous glass covering is transparent to light at laser frequencies .Iadd.wherein said vitreous glass covering has a sealing temperature below about 380° C. at a pressure above about 100 psi.Iaddend..   
     
     
       5. A hermetically sealed device comprising: a substrate providing a base for supporting electronic circuitry thereon;   electronic circuitry disposed on said substrate; and   a vitreous glass covering disposed over and hermetically sealing said electronic circuitry with said vitreous glass covering sealed onto said substrate, wherein said substrate is selected from a group consisting of alumina, beryllia, steatite, magnesium alumina silicate, titanium dioxide, silicon carbide, and zircon; and said vitreous glass covering is a uniformly dispersed mixture of silica, soda ash, and lime combined with metal oxides from the group consisting of boron, calcium, lead, lithium, titanium, and cerium .Iadd.wherein said vitreous glass covering has a sealing temperature below about 380° C. at a pressure above about 100 psi.Iaddend..   
     
     
       6. A hermetically sealed device comprising: a substrate providing a base for supporting electronic circuitry thereon;   electronic circuitry disposed on said substrate;   a covering disposed over said electronic circuitry; and   a vitreous glass seal disposed around said electronic circuitry fused to said covering and said substrate to hermetically seal said electronic circuitry wherein said vitreous glass seal has a fusion temperature below about 380° C. at pressures above about 100 psi.   
     
     
       7. The invention as claimed in claim 6 wherein said covering is a vitreous glass having a softening temperature at least 50° C. above the fusion temperature of said vitreous glass seal at the same pressure. 
     
     
       8. The invention as claimed in claim 7 wherein the difference in the coefficient of thermal expansion between said vitreous glass covering and said vitreous glass seal is within two millionths (2×10 -6 ) per °C. 
     
     
       9. The invention as claimed in claim 8 wherein said vitreous glass covering is transparent to light at laser frequencies. 
     
     
       10. A hermetically sealed device comprising: a substrate providing a base for supporting electronic circuitry thereon;   electronic circuitry disposed on said substrate; and   a vitreous glass covering disposed over and hermetically sealing said electronic circuitry with said vitreous glass covering sealed onto said substrate, wherein said substrate is a ceramic comprised of material selected from the group consisting of alumina, beryllia, steatite, titanium dioxide, magnesium alumina silicate, silicon carbide, and zircon .Iadd.wherein said vitreous glass covering has a sealing temperature below about 380° C. at a pressure above about 100 psi.Iaddend..   
     
     
       11. The invention as claimed in claim 10 wherein said covering is a ceramic comprised of material selected from the group consisting of alumina, beryllia, steatite, titanium dioxide, magnesium alumina silicate, silicon carbide, and zircon. 
     
     
       12. The invention as claimed in claim 11 wherein said substrate and covering are of the same material and the coefficient of thermal expansion of the material is within about two millionths (2×1 -6 )°C. of the coefficient of thermal expansion of said vitreous glass seal. 
     
     
       13. The invention as claimed in claim 6 wherein said vitreous glass seal is a uniformly dispersed mixture of silica, soda ash, and lime combined with metal oxides from the group consisting of boron, calcium, lead, lithium, titanium, and cerium. 
     
     
       14. The invention as claimed in claim 13 wherein said covering is of the same material as said seal. 
     
     
       15. A hermetically sealed device comprising: a ceramic substrate providing a base for supporting electronic circuitry thereon;   electronic circuitry deposited on said substrate;   a vitreous glass covering disposed over said electronic circuitry; and   a vitreous glass seal disposed around said electronic circuitry fused to said covering and said substrate to hermetically seal said electronic circuitry, said covering being a separate member from said seal.   
     
     
       16. A hermetically sealed device comprising: a ceramic substrate providing a base for supporting electronic circuitry thereon;   electronic circuitry deposited on said substrate;   a vitreous glass covering disposed over said electronic circuitry; and   a vitreous glass seal disposed around said electronic circuitry fused to said covering and said substrate to hermetically seal said electronic circuitry, wherein said vitreous glass seal has a fusion temperature between 370° C. and 375° C. at substantially 200 psi.   
     
     
       17. The invention as claimed in claim 16 wherein said covering is a vitreous glass having a softening temperature above 420° C. at substantially 200 psi. 
     
     
       18. The invention as claimed in claim 17 wherein the difference in the coefficient of thermal expansion between said vitreous glass covering and said vitreous glass seal is within one millionth (1×10 -6 ). 
     
     
       19. The invention as claimed in claim 18 wherein said vitreous glass covering is a borosilicate glass and is transparent to light at laser frequencies. 
     
     
       20. A hermetically sealed device comprising: a ceramic substrate providing a base for supporting electronic circuitry thereon;   electronic circuitry deposited on said substrate;   a vitreous glass covering disposed over said electronic circuitry; and   a vitreous glass seal disposed around said electronic circuitry fused to said covering and said substrate to hermetically seal said electronic circuitry, wherein said substrate is a ceramic comprised of alumina, and has a coefficient of thermal expansion within one millionth (1×10 -6 ) of the coefficient of thermal expansion of said vitreous glass seal and two millionths (2×10 -6 ) of said vitreous glass covering .Iadd.wherein said vitreous glass covering has a sealing temperature below about 380° C. at a pressure above about 100 psi.Iaddend..   
     
     
       21. A hermetically sealed device comprising: a substrate providing a base for supporting electronic circuitry thereon;   a vitreous glass covering disposed over and heremetically sealing said electronic circuitry with said vitreous glass covering sealed onto said substrate, wherein electronic circuitry is a resistive element tending to become unstable at temperatures above 380° C. .Iadd.wherein said vitreous glass covering has a sealing temperature below about 380° C. at a pressure above about 100 psi.Iaddend..   
     
     
       22. The hermetically sealed device as recited in claim 6, wherein electronic circuitry is a resistive element tending to become unstable at temperatures above 380° C. 
     
     
       23. The hermetically sealed device as recited in claim 16, wherein electronic circuitry is a resistive element tending to become unstable at temperatures above 380° C.