USRE31473EExpiredUtility

System for fabrication of semiconductor bodies

Priority: Feb 7, 1977Filed: Mar 2, 1982Granted: Dec 27, 1983
Est. expiryFeb 7, 1997(expired)· nominal 20-yr term from priority
B22F 9/08C30B 11/00C30B 29/60C30B 29/06C30B 29/08
44
PatentIndex Score
24
Cited by
11
References
1
Claims

Abstract

A system and method is provided for forming semiconductor tear-drop shaped bodies having minimal grain boundaries. Semiconductor material is melted in a capillary tube at the top of a tower, and forced under gas pressure through a nozzle. Separate semiconductor bodies are formed. They are passed through a free fall path over which a predetermined temperature gradient controls solidification of the bodies. The resultant bodies are tear-drop semiconductor bodies of near uniform size with minimal grain boundaries.

Claims

exact text as granted — not AI-modified
What is claimed is:  .[.1. A system for fabricating small semiconductor bodies, which comprises: 
     
        the top and hour-glass shape therebelow.  8. The combination set forth in claim 7, wherein said free fall path is of a length and the temperature is at levels therealong to slowly solidify said bodies.  .[.9. The combination set forth in claim 6 said capillary tube has a gas port and the upper end of said tube has a gas conduit leading thereto for selective flow of inert gas into said capillary tube and said elongated tube..].

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