Method of etching a surface of a substrate comprising LiTaO3 and chemically similar materials

Abstract

A method of etching a surface of a substrate comprising lithium tantalate (LiTaO 3 ) and chemically similar materials is disclosed. The method includes contacting the surface with a mixture comprising hydrofluoric acid and sulfuric acid. In addition to its etching action, the mixture is also capable of polishing the thus treated surface.

What is claimed is: 
     
       1. A method of etching a surface of a substrate comprising LiTaO 3 , which comprises contacting the surface with a mixture comprising HF present in an amount ranging from about 42.172 to about 47.535 molal and H 2  SO 4  present in an amount ranging from about 40.173 to about 3.354 molal. 
     
     
       2. A method of treating a body comprising lithium tantalate to obtain a polished surface thereof, which comprises contacting the surface with a mixture comprising HF present in an amount ranging from about 42.172 to about 47.535 molal and H 2  SO 4  present in an amount ranging from about 40.173 to about 3.354 molal. 
     
     
       3. A method of optically examining a substrate comprising LiTaO 3  which comprises treating the substrate with a mixture comprising HF present in an amount ranging from about 42.172 molal to about 47.535 molal and H 2  SO 4  present in an amount ranging from about 40.173 to about 3.354 molal. 
     
     
       4. The method as defined in claim 3 which further comprises directly examining said treated substrate with optical means. .Iadd. 5. A method of etching a surface of a substrate comprising lithium tantalate, which comprises contacting the surface with a mixture comprising HF and H 2  SO 4 . .Iaddend. .Iadd. 6. A method of treating a body comprising lithium tantalate to obtain a polished surface thereof, which comprises contacting the surface with a mixture comprising HF and H 2  SO 4 . .Iaddend. .Iadd. 7. A method of etching a surface of a substrate comprising lithium niobate, which comprises contacting the surface with a mixture comprising HF and H 2  SO 4 ..Iaddend.