USH1974HExpiredUtility
Woven loop press base fabric having high density top layer
Est. expiryAug 11, 2018(expired)· nominal 20-yr term from priority
D21F 1/0054
59
PatentIndex Score
13
Cited by
9
References
12
Claims
Abstract
A papermaker's fabric having a system of primary machine direction yarns which form seaming loops at each end of the fabric and a system of secondary machine direction yarns. A system of cross-machine direction yarns are interwoven with the primary and secondary systems of machine direction yarns in a weave pattern that provides adjacent balancing yarns that maintain the seam loops in substantially vertical alignment.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1. An improved papermaker's fabric of a type having a system of primary machine direction (MD) yarns which form seaming loops at each end of the fabric, the improvement characterized by:
a system of secondary MD yarns that at least equal in number the number of primary MD yarns; and
a system of cross-machine direction yarns (CMD) interwoven with the primary and secondary systems of MD yarns in a weave pattern that provides adjacent balancing yarns that maintain the seam loops in substantially vertical alignment.
2. The fabric according to claim 1 wherein the primary MD yarn system includes stacked lower and middle layer MD yarns and the secondary MD yarn system includes a single layer of upper MD yarns.
3. The fabric according to claim 2 wherein the CMD yarn system includes two sub-systems, the first CMD sub-system yarns weaving exclusively with the upper and middle layer MD yarns and the second CMD sub-system yarns weaving exclusively with the middle and lower layer MD yarns.
4. The fabric according to claim 3 wherein each first CMD sub-system yarn weaves in a repeat pattern of over two, under four, over two and under four relative to the upper and middle layer MD yarns.
5. The fabric according to claim 3 wherein each second CMD sub-system yarn weaves in a repeat pattern of over, between, under, between relative to the stacked pairs of middle and lower layer MD yarns.
6. The fabric according to claim 1 wherein the fabric repeats on sixteen CMD yarns.
7. The fabric according to claim 1 wherein the fabric repeats on thirty-two MD yarns.
8. The fabric of claim 1 wherein the fabric is flat woven.
9. The fabric of claim 1 wherein the fabric is endless woven.
10. The fabric of claim 9 wherein the fabric is woven using a two shuttle loom.
11. The fabric of claim 1 wherein batt material is attached thereto.
12. The fabric according to claim 3 wherein the first CMD sub-system yarns weave in repeat pattern of over one, under one with respect to the middle layer MD yarns.Join the waitlist — get patent alerts
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