Acid paint remover

Abstract

Disclosed is an aqueous acidic developing solution for a photoresist comprising an acid having from about 1 to 8 carbon atoms, in an effective combination with a solubilizing solvent for the photoresist.

What is claimed is: 
     
       1. An aqueous acidic developing solution for a photoresist comprising an acid or mixture of acids each having from about 1 to 8 carbon atoms, in an effective combination with a solubilizing solvent for the photoresist. 
     
     
       2. The aqueous developing solution of claim 1 wherein the total acid concentration is from about 0.25% to about 4% by weight based on total weight of aqueous developing solution. 
     
     
       3. The aqueous developing solution of claim 2 wherein the total acid concentration is from about 0.5% to about 1.5% by weight based on total weight of aqueous developing solution. 
     
     
       4. The developing solution of claim 1 wherein the acid is selected from the group consistent of formic acid, acetic acid, hydroxy acetic acid, oxalic acid and di-lactic acid. 
     
     
       5. The developing solution of claim 1 which contains hydroxy acetic acid. 
     
     
       6. The aqueous developing solution of claim 1 wherein the solubilizing solvent for the photoresist is selected from the group consisting of diethylene glycol monobutyl ether, ethylene glycol monobutyl ether, propylene glycol methyl ether, dipropylene glycol methyl ether, propylene glycol t-butyl ether and ethylene glycol phenyl ether. 
     
     
       7. The aqueous developing solution of claim 1 wherein the solubilizing solvent is present in an amount of about 1% to about 5% by weight based on total weight of aqueous developing solution. 
     
     
       8. The aqueous developing solution of claim 7 wherein the solubilizing solvent is present in an amount of about 1% to about 2.5% by weight based on total weight of aqueous developing solution. 
     
     
       9. The aqueous acidic developing solution of claim 1 comprising a mixture of at least two acids, each having from about 1 to 3 carbon atoms, in combination with a solvent. 
     
     
       10. The aqueous developing solution of claim 9 wherein the total acid concentration is from about 0.25% to about 4.0% by weight based on total weight of aqueous developing solution. 
     
     
       11. The aqueous developing solution of claim 10 wherein the total acid concentration is from about 0.5 % to about 1.5% by weight based on total weight of aqueous developing solution. 
     
     
       12. The developing solution of claim 10 wherein the mixture of acids is selected from the group consisting of formic acid, acetic acid, hydroxy acetic acid, oxalic acid and lactic acid. 
     
     
       13. The aqueous developing solution of claim 10 wherein the solubilizing solvent for the photoresist is selected from the group consisting of diethylene glycol monobutyl ether, ethylene glycol monobutyl ether, propylene glycol methyl ether, dipropylene glycol methyl ether, propylene glycol t-butyl ether and ethylene glycol phenyl ether.