USH1285HExpiredUtility

Silver halide photographic emulsion and material

Assignee: FUJI PHOTO FILM CO LTDPriority: Nov 8, 1988Filed: Apr 29, 1991Granted: Feb 1, 1994
Est. expiryNov 8, 2008(expired)· nominal 20-yr term from priority
Inventors:Ichizo Toya
G03C 1/18G03C 1/0051G03C 2001/0153G03C 1/832G03C 2200/43G03C 1/043G03C 2001/0056
44
PatentIndex Score
2
Cited by
8
References
11
Claims

Abstract

A silver halide photographic emulsion is disclosed, comprising silver halide grains containing a first silver halide phase containing at least 3 mol % of silver iodide and having a completely uniform silver iodide distribution, and a second silver halide phase having at least 5 dislocation lines.

Claims

exact text as granted — not AI-modified
What is claimed is: 
     
       1. A method for producing a silver halide photographic emulsion comprising: (a) forming silver halide grain nuclei, and after completion thereof,   (b) growing silver halide grains from said nuclei by forming a first silver halide phase having at least 3 mol percent of silver iodide and a completely uniform silver iodide distribution by adding fine silver halide particles having a silver halide content which is the same as the silver halide content of the first silver halide phase to be obtained, said growing being conducted with no addition of aqueous solutions of silver ions and halide ions,   (c) adding an iodide compound, and   (d) forming a second silver halide phase having at least five dislocation lines.   
     
     
       2. The method of claim 1 wherein the diameter of the fine silver halide particles is 0.1 μm or less. 
     
     
       3. The method of claim 2 wherein the diameter of the fine silver halide particles is 0.06 μm or less. 
     
     
       4. The method of claim 1 wherein a silver halide solvent is used in the formation of said first silver halide phase to increase the dissolution rate of the fine grains. 
     
     
       5. The method of claim 1 wherein the step of growing the silver halide grains is carried out at 50° C. or more. 
     
     
       6. The method of claim 5 wherein the process for growing the silver halide grains is carried out at 60° C. or more. 
     
     
       7. The method of claim 6 wherein the process for growing the silver halide grains is carried out at 70° C. or more. 
     
     
       8. The method of claim 1 wherein the fine silver halide particles are added at a fixed flow rate. 
     
     
       9. The method of claim 8 wherein rate of addition of the fine silver halide particles is increased over time. 
     
     
       10. The method of claim 1, wherein said growing is effected by carrying out Ostwald ripening to dissolve the fine particles and deposit the silver halide on the nuclei. 
     
     
       11. The method of claim 1 wherein the silver halide grains are tabular.

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