USD930796SActiveUtility

Liquid discharge nozzle for semiconductor substrate processing apparatus

29
Assignee: TOKYO ELECTRON LTDPriority: Jun 8, 2020Filed: Aug 3, 2020Granted: Sep 14, 2021
Est. expiryJun 8, 2040(~13.9 yrs left)· nominal 20-yr term from priority
Inventors:Yoshifumi AmanoKazuhiro Aiura
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PatentIndex Score
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Cited by
9
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for a liquid discharge nozzle for semiconductor substrate processing apparatus, as shown and described.

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