USD907593SActiveUtility

Discharge chamber for a plasma processing apparatus

Assignee: HITACHI HIGH TECH CORPPriority: Jan 20, 2017Filed: Jul 18, 2017Granted: Jan 12, 2021

Est. expiryJan 20, 2037(~10.5 yrs left)· nominal 20-yr term from priority

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Claims

exact text as granted — not AI-modified

CLAIM 
     
       The ornamental design for a discharge chamber for a plasma processing apparatus, as shown and described.

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