USD889596SActiveUtility

Gas nozzle for substrate processing apparatus

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Assignee: HITACHI INT ELECTRIC INCPriority: Dec 27, 2017Filed: May 25, 2018Granted: Jul 7, 2020
Est. expiryDec 27, 2037(~11.4 yrs left)· nominal 20-yr term from priority
Inventors:Yusaku OkajimaToru KagayaHiroaki HiramatsuShinya Ebata
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PatentIndex Score
5
Cited by
13
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       We claim the ornamental design for an gas nozzle for substrate processing apparatus, as shown (and described).

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